Patent | Date |
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CMOS devices with Schottky source and drain regions Grant 9,673,105 - Ko , et al. June 6, 2 | 2017-06-06 |
CMOS Devices with Schottky Source and Drain Regions App 20140094008 - Ko; Chih-Hsin ;   et al. | 2014-04-03 |
MOS devices having elevated source/drain regions Grant 8,569,837 - Ko , et al. October 29, 2 | 2013-10-29 |
CMOS devices with Schottky source and drain regions Grant 8,426,298 - Ko , et al. April 23, 2 | 2013-04-23 |
Semiconductor device and a method of fabricating the device Grant 8,154,107 - Ke , et al. April 10, 2 | 2012-04-10 |
Isolation spacer for thin SOI devices Grant 8,084,305 - Ko , et al. December 27, 2 | 2011-12-27 |
Dual metal silicides for lowering contact resistance Grant 8,039,284 - Ke , et al. October 18, 2 | 2011-10-18 |
Contact barrier structure and manufacturing methods Grant 8,030,210 - Wang , et al. October 4, 2 | 2011-10-04 |
CMOS Devices with Schottky Source and Drain Regions App 20110223727 - Ko; Chih-Hsin ;   et al. | 2011-09-15 |
Metal stress memorization technology Grant 7,985,652 - Ke , et al. July 26, 2 | 2011-07-26 |
Semiconductor structure having selective silicide-induced stress and a method of producing same Grant 7,875,959 - Ke , et al. January 25, 2 | 2011-01-25 |
BiCMOS performance enhancement by mechanical uniaxial strain and methods of manufacture Grant 7,803,718 - Ko , et al. September 28, 2 | 2010-09-28 |
Contact Barrier Structure and Manufacturing Methods App 20100167485 - Wang; Ching-Ya ;   et al. | 2010-07-01 |
Shallow trench isolation structure for semiconductor device Grant 7,745,904 - Ko , et al. June 29, 2 | 2010-06-29 |
Hybrid Schottky source-drain CMOS for high mobility and low barrier Grant 7,737,532 - Ke , et al. June 15, 2 | 2010-06-15 |
Contact barrier structure and manufacturing methods Grant 7,709,903 - Wang , et al. May 4, 2 | 2010-05-04 |
Isolation spacer for thin SOI devices Grant 7,582,934 - Ko , et al. September 1, 2 | 2009-09-01 |
Transistors with stressed channels Grant 7,569,896 - Ko , et al. August 4, 2 | 2009-08-04 |
System and method for forming a semiconductor device source/drain contact Grant 7,538,398 - Ke , et al. May 26, 2 | 2009-05-26 |
BiCMOS Performance Enhancement by Mechanical Uniaxial Strain and Methods of Manufacture App 20090117695 - Ko; Chih-Hsin ;   et al. | 2009-05-07 |
MOS transistors with selectively strained channels Grant 7,511,348 - Ko , et al. March 31, 2 | 2009-03-31 |
Metal Stress Memorization Technology App 20090075442 - Ke; Chung-Hu ;   et al. | 2009-03-19 |
System and Method for Forming a Semiconductor Device Source/Drain Contact App 20080315321 - Ke; Chung-Hu ;   et al. | 2008-12-25 |
BiCMOS performance enhancement by mechanical uniaxial strain and methods of manufacture Grant 7,466,008 - Ko , et al. December 16, 2 | 2008-12-16 |
Transistor mobility improvement by adjusting stress in shallow trench isolation Grant 7,465,620 - Ko , et al. December 16, 2 | 2008-12-16 |
Contact barrier structure and manufacturing methods App 20080290421 - Wang; Ching-Ya ;   et al. | 2008-11-27 |
MOS devices having elevated source/drain regions App 20080277735 - Ko; Chih-Hsin ;   et al. | 2008-11-13 |
BiCMOS performance enhancement by mechanical uniaxial strain and methods of manufacture App 20080224227 - Ko; Chih-Hsin ;   et al. | 2008-09-18 |
MOS transistors with selectively strained channels App 20080224225 - Ko; Chih-Hsin ;   et al. | 2008-09-18 |
CMOS devices with schottky source and drain regions App 20080191285 - Ko; Chih-Hsin ;   et al. | 2008-08-14 |
Semiconductor device and a method of fabricating the device App 20080185659 - Ke; Chung-Hu ;   et al. | 2008-08-07 |
High performance semiconductor devices fabricated with strain-induced processes and methods for making same Grant 7,394,136 - Ke , et al. July 1, 2 | 2008-07-01 |
Isolation Spacer For Thin Soi Devices App 20080142888 - KO; Chih-Hsin ;   et al. | 2008-06-19 |
Isolation Spacer For Thin Soi Devices App 20080145982 - KO; Chih-Hsin ;   et al. | 2008-06-19 |
Dual metal silicides for lowering contact resistance App 20080145984 - Ke; Chung-Hu ;   et al. | 2008-06-19 |
Isolation spacer for thin SOI devices Grant 7,358,571 - Ko , et al. April 15, 2 | 2008-04-15 |
Diffusion topography engineering for high performance CMOS fabrication Grant 7,355,262 - Ko , et al. April 8, 2 | 2008-04-08 |
Transistors with stressed channels and methods of manufacture App 20070267694 - Ko; Chih-Hsin ;   et al. | 2007-11-22 |
Shallow trench isolation structure for semiconductor device App 20070235835 - Ko; Chih-Hsin ;   et al. | 2007-10-11 |
Diffusion topography engineering for high performance CMOS fabrication App 20070215936 - Ko; Chih-Hsin ;   et al. | 2007-09-20 |
Method of forming a shallow trench isolation structure Grant 7,238,564 - Ko , et al. July 3, 2 | 2007-07-03 |
Transistor mobility improvement by adjusting stress in shallow trench isolation App 20070132035 - Ko; Chih-Hsin ;   et al. | 2007-06-14 |
Transistor mobility improvement by adjusting stress in shallow trench isolation Grant 7,190,036 - Ko , et al. March 13, 2 | 2007-03-13 |
Hybrid Schottky source-drain CMOS for high mobility and low barrier App 20070052027 - Ke; Chung-Hu ;   et al. | 2007-03-08 |
Semiconductor structure having selective silicide-induced stress and a method of producing same App 20070045849 - Ke; Chung-Hu ;   et al. | 2007-03-01 |
High performance CMOS with metal-gate and Schottky source/drain Grant 7,176,537 - Lee , et al. February 13, 2 | 2007-02-13 |
High performance CMOS with metal-gate and Schottky source/drain App 20060273409 - Lee; Wen-Chin ;   et al. | 2006-12-07 |
Semiconductor structure having a strained region and a method of fabricating same App 20060208336 - Lee; Wen-Chin ;   et al. | 2006-09-21 |
Method of forming a shallow trench isolation structure App 20060205164 - Ko; Chih-Hsin ;   et al. | 2006-09-14 |
Thermal anneal process for strained-Si devices Grant 7,098,119 - Ke , et al. August 29, 2 | 2006-08-29 |
Capacitor-less 1T-DRAM cell with Schottky source and drain App 20060125121 - Ko; Chih-Hsin ;   et al. | 2006-06-15 |
Transistor mobility by adjusting stress in shallow trench isolation App 20060121688 - Ko; Chih-Hsin ;   et al. | 2006-06-08 |
Self-aligned gated p-i-n diode for ultra-fast switching App 20060091490 - Chen; Hung-Wei ;   et al. | 2006-05-04 |
Isolation spacer for thin SOI devices App 20060081928 - Ko; Chih-Hsin ;   et al. | 2006-04-20 |
High performance semiconductor devices fabricated with strain-induced processes and methods for making same App 20050263828 - Ke, Chung-Hu ;   et al. | 2005-12-01 |
Thermal anneal process for strained-Si devices App 20050253166 - Ke, Chung-Hu ;   et al. | 2005-11-17 |
Strained channel on insulator device App 20050233552 - Ke, Chung-Hu ;   et al. | 2005-10-20 |
Isolation structure with nitrogen-containing liner and methods of manufacture App 20050224907 - Ko, Chih-Hsin ;   et al. | 2005-10-13 |
High performance semiconductor devices fabricated with strain-induced processes and methods for making same Grant 6,949,443 - Ke , et al. September 27, 2 | 2005-09-27 |
Strained silicon structure App 20050194658 - Ke, Chung-Hu ;   et al. | 2005-09-08 |
Heterostructure resistor and method of forming the same App 20050127400 - Yeo, Yee-Chia ;   et al. | 2005-06-16 |
High performance semiconductor devices fabricated with strain-induced processes and methods for making same App 20050079677 - Ke, Chung-Hu ;   et al. | 2005-04-14 |