Kawano; Baiei

Patent Applications and Registrations

Patent applications and USPTO patent grants for Kawano; Baiei.The latest application filed is for "dual-chamber plasma processing apparatus".

Company Profile

0.5.6

Kawano; Baiei - Tama JP
Kawano; Baiei - Tokyo JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Apparatus and method for forming thin film using upstream and downstream exhaust mechanisms Grant 7,408,225 - Shinriki , et al. August 5, 2	2008-08-05
Dual-chamber plasma processing apparatus Grant 7,381,291 - Tobe , et al. June 3, 2	2008-06-03
Semiconductor-processing apparatus provided with susceptor and placing block Grant 7,276,123 - Shimizu , et al. October 2, 2	2007-10-02
Thin-film deposition apparatus Grant 7,267,725 - Kawano September 11, 2	2007-09-11
Dual-chamber plasma processing apparatus App 20060021701 - Tobe; Yasuhiro ; et al.	2006-02-02
Apparatus and method for forming thin film using upstream and downstream exhaust mechanisms App 20050208217 - Shinriki, Hiroshi ; et al.	2005-09-22
Method of film deposition using single-wafer-processing type CVD Grant 6,921,556 - Shimizu , et al. July 26, 2	2005-07-26
Apparatus for single-wafer-processing type CVD App 20050098111 - Shimizu, Akira ; et al.	2005-05-12
Semiconductor-processing apparatus provided with susceptor and placing block App 20050022737 - Shimizu, Akira ; et al.	2005-02-03
Thin-film deposition apparatus App 20040221808 - Kawano, Baiei	2004-11-11
Apparatus and method for single-wafer-processing type CVD App 20040071874 - Shimizu, Akira ; et al.	2004-04-15

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