Kawahara; Kazuyoshi

Patent Applications and Registrations

Patent applications and USPTO patent grants for Kawahara; Kazuyoshi.The latest application filed is for "method for correcting mask pattern, photomask, method for fabricating photomask, electron beam writing method for fabricating photomask, exposure method, semiconductor device, and method for fabricating semiconductor device".

Company Profile

0.6.6

Kawahara; Kazuyoshi - Kanagawa JP
Kawahara; Kazuyoshi - Tokyo JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method for correcting mask pattern, photomask, method for fabricating photomask, electron beam writing method for fabricating photomask, exposure method, semiconductor device, and method for fabricating semiconductor device Grant 7,799,510 - Ogawa , et al. September 21, 2	2010-09-21
Method for correcting mask pattern, photomask, method for fabricating photomask, electron beam writing method for fabricating photomask, exposure method, semiconductor device, and method for fabricating semiconductor device Grant 7,767,364 - Ogawa , et al. August 3, 2	2010-08-03
Method For Correcting Mask Pattern, Photomask, Method For Fabricating Photomask, Electron Beam Writing Method For Fabricating Photomask, Exposure Method, Semiconductor Device, And Method For Fabricating Semiconductor Device App 20100038798 - Ogawa; Kazuhisa ; et al.	2010-02-18
Method of forming exposure mask pattern, exposure mask pattern, and method of producing semiconductor device Grant 7,384,710 - Ogawa , et al. June 10, 2	2008-06-10
Composition for nkt cell activation App 20060269524 - Kumazawa; Yoshio ; et al.	2006-11-30
Mask pattern correction apparatus and mask pattern correction method and mask preparation method and method of production of a semiconductor device Grant 7,139,996 - Ohnuma , et al. November 21, 2	2006-11-21
Method for correcting mask pattern, photomask, method for fabricating photomask, electron beam writing method for fabricating photomask, exposure method, semiconductor device, and method for fabricating semiconductor device App 20060134532 - Ogawa; Kazuhisa ; et al.	2006-06-22
Exposure mask pattern forming method, exposure mask pattern, and semiconductor device manufacturing method App 20050147893 - Ogawa, Kazuhisa ; et al.	2005-07-07
Sphingoglycolipid Grant 6,723,704 - Kawahara , et al. April 20, 2	2004-04-20
Mask pattern correction apparatus, mask pattern correction method, mask manufacturing method, and semiconductor device manufacturing method App 20040073885 - Ohnuma, Hidetoshi ; et al.	2004-04-15
Sphingoglycolipid App 20020037291 - Kawahara, Kazuyoshi ; et al.	2002-03-28
Glycosphingolipids Grant 5,672,693 - Kawahara September 30, 1	1997-09-30

uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.

While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.

All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.