loadpatents
Patent applications and USPTO patent grants for Kau; Kuo-Chang.The latest application filed is for "mask cleaning".
Patent | Date |
---|---|
Mask Cleaning App 20220179326 - Chang; Shu-Hao ;   et al. | 2022-06-09 |
Mask cleaning Grant 11,256,179 - Chang , et al. February 22, 2 | 2022-02-22 |
Material composition and methods thereof Grant 10,825,684 - Chang , et al. November 3, 2 | 2020-11-03 |
Semiconductor integrated circuit fabrication with pattern-reversing process Grant 10,685,846 - Chien , et al. | 2020-06-16 |
Mask Cleaning App 20200050118 - Chang; Shu-Hao ;   et al. | 2020-02-13 |
Lithography patterning with a gas phase resist Grant 10,514,610 - Chang , et al. Dec | 2019-12-24 |
Mask cleaning Grant 10,459,352 - Chang , et al. Oc | 2019-10-29 |
Lithography Patterning with a Gas Phase Resist App 20180314167 - Chang; Shu-Hao ;   et al. | 2018-11-01 |
Lithography patterning with a gas phase resist Grant 10,018,920 - Chang , et al. July 10, 2 | 2018-07-10 |
Material Composition And Methods Thereof App 20170271150 - CHANG; Shu-Hao ;   et al. | 2017-09-21 |
Lithography Patterning with a Gas Phase Resist App 20170256418 - CHANG; SHU-HAO ;   et al. | 2017-09-07 |
System and method for photomask particle detection Grant 9,607,833 - Chien , et al. March 28, 2 | 2017-03-28 |
Mask Cleaning App 20170060005 - Chang; Shu-Hao ;   et al. | 2017-03-02 |
Method of patterning a material layer Grant 9,570,302 - Chang , et al. February 14, 2 | 2017-02-14 |
System And Method For Photomask Particle Detection App 20160225610 - Chien; Shang-Chieh ;   et al. | 2016-08-04 |
Semiconductor Integrated Circuit Fabrication With Pattern-Reversing Process App 20150332922 - Chien; Ming-Chin ;   et al. | 2015-11-19 |
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