Katsuki; Jiro
Patent Applications and Registrations
Patent applications and USPTO patent grants for Katsuki; Jiro.The latest application filed is for "substrate processing method and substrate processing apparatus".
- Katsuki; Jiro - Yamanashi JP
- Katsuki; Jiro - Nirasaki JP
- Katsuki; Jiro - Yamanashi-Ken JP
- Katsuki; Jiro - Kofu JP
| Patent | Date |
|---|---|
| Substrate processing method and substrate processing apparatus Grant 10,622,205 - Takahashi , et al. | 2020-04-14 |
| Substrate Processing Method And Substrate Processing Apparatus App 20160236244 - TAKAHASHI; Hiroyuki ; et al. | 2016-08-18 |
| Method of measuring nitrogen concentration, method of forming silicon oxynitride film, and method of manufacturing semiconductor device. Grant 7,842,621 - Katsuki , et al. November 30, 2 | 2010-11-30 |
| Method Of Measuring Nitrogen Content, Method Of Forming Silicon Oxynitride Film And Process For Producing Semiconductor Device App 20090253221 - Katsuki; Jiro ; et al. | 2009-10-08 |
| Treatment apparatus Grant 5,728,276 - Katsuki , et al. March 17, 1 | 1998-03-17 |
| Processing apparatus with collimator exchange device Grant 5,624,536 - Wada , et al. April 29, 1 | 1997-04-29 |
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