loadpatents
name:-0.026159048080444
name:-0.023710966110229
name:-0.00064182281494141
Kats; Semyon L. Patent Filings

Kats; Semyon L.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Kats; Semyon L..The latest application filed is for "substrate support having fluid channel".

Company Profile
0.12.12
  • Kats; Semyon L. - San Francisco CA US
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Cathode with inner and outer electrodes at different heights
Grant 8,607,731 - Hoffman , et al. December 17, 2
2013-12-17
Substrate Support Having Fluid Channel
App 20110024047 - NGUYEN; Andrew ;   et al.
2011-02-03
Substrate support having heat transfer system
Grant 7,768,765 - Nguyen , et al. August 3, 2
2010-08-03
Methods And Apparatus For Improving Flow Uniformity In A Process Chamber
App 20100081284 - BALAKRISHNA; AJIT ;   et al.
2010-04-01
Electrostatic chuck having textured contact surface
Grant 7,672,110 - Sun , et al. March 2, 2
2010-03-02
Cathode With Inner And Outer Electrodes At Different Heights
App 20090314433 - Hoffman; Daniel J. ;   et al.
2009-12-24
Low temperature aerosol deposition of a plasma resistive layer
Grant 7,479,464 - Sun , et al. January 20, 2
2009-01-20
Low Temperature Aerosol Deposition Of A Plasma Resistive Layer
App 20080108225 - SUN; JENNIFER Y. ;   et al.
2008-05-08
Substrate Support Having Heat Transfer System
App 20070165356 - Nguyen; Andrew ;   et al.
2007-07-19
Substrate support having heat transfer system
Grant 7,221,553 - Nguyen , et al. May 22, 2
2007-05-22
Electrostatic chuck having textured contact surface
App 20070047170 - Sun; Jennifer Y. ;   et al.
2007-03-01
Substrate support having heat transfer system
App 20040212947 - Nguyen, Andrew ;   et al.
2004-10-28
Electrostatic chuck having dielectric member with stacked layers and manufacture
App 20040190215 - Weldon, Edwin C. ;   et al.
2004-09-30
Electrostatic chuck having composite dielectric layer and method of manufacture
Grant 6,721,162 - Weldon , et al. April 13, 2
2004-04-13
Cathode pedestal for a plasma etch reactor
App 20040040664 - Yang, Jang Gyoo ;   et al.
2004-03-04
Electrostatic chuck having heater and method
Grant 6,538,872 - Wang , et al. March 25, 2
2003-03-25
Electrostatic chuck bonded to base with a bond layer and method
Grant 6,490,146 - Wang , et al. December 3, 2
2002-12-03
Electrostatic chuck having improved electrical connector and method
Grant 6,462,928 - Shamouilian , et al. October 8, 2
2002-10-08
Electrostatic chuck having composite dielectric layer and method of manufacture
App 20020135969 - Weldon, Edwin C. ;   et al.
2002-09-26
Electrostatic chuck bonded to base with a bond layer and method
App 20020075624 - Wang, You ;   et al.
2002-06-20
Electrostatic Chuck Having Composite Base And Method
App 20020036881 - SHAMOUILIAN, SHAMOUIL ;   et al.
2002-03-28
Electrostatic chuck having gas cavity and method
Grant 6,310,755 - Kholodenko , et al. October 30, 2
2001-10-30
Electrostatic chuck having improved gas conduits
Grant 6,108,189 - Weldon , et al. August 22, 2
2000-08-22

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