Katnani; Ahmad D.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Katnani; Ahmad D..The latest application filed is for "heat sink method, system, and program product".

Company Profile

0.17.2

Katnani; Ahmad D. - Poughkeepsie NY

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Liner protection in deep trench etching Grant 8,030,157 - Hichri , et al. October 4, 2	2011-10-04
Heat sink Grant 7,856,341 - Carlson , et al. December 21, 2	2010-12-21
Heat Sink Method, System, And Program Product App 20090210190 - Carlson; Brian L. ; et al.	2009-08-20
Low "K" factor hybrid photoresist Grant 6,440,635 - Holmes , et al. August 27, 2	2002-08-27
Positive photoresists containing crosslinked polymers App 20020012869 - Adams, Timothy G. ; et al.	2002-01-31
Integrated circuit chip produced by using frequency doubling hybrid photoresist Grant 6,313,492 - Hakey , et al. November 6, 2	2001-11-06
Irradiation sensitive positive-tone resists using polymers containing two acid sensitive protecting groups Grant 6,303,263 - Chen , et al. October 16, 2	2001-10-16
Photoresist system and process for aerial image enhancement Grant 6,245,492 - Huang , et al. June 12, 2	2001-06-12
Resist composition and process of forming a patterned resist layer on a substrate Grant 6,210,856 - Lin , et al. April 3, 2	2001-04-03
Optimization of space width for hybrid photoresist Grant 6,200,726 - Chen , et al. March 13, 2	2001-03-13
Radiation sensitive silicon-containing resists Grant 6,187,505 - Lin , et al. February 13, 2	2001-02-13
Frequency doubling hybrid photoresist having negative and positive tone components and method of preparing the same Grant 6,114,082 - Hakey , et al. September 5, 2	2000-09-05
Approach to formulating irradiation sensitive positive resists Grant 6,103,447 - Chen , et al. August 15, 2	2000-08-15
Silsesquioxane polymers, method of synthesis, photoresist composition, and multilayer lithographic method Grant 6,087,064 - Lin , et al. July 11, 2	2000-07-11
E-beam application to mask making using new improved KRS resist system Grant 6,043,003 - Bucchignano , et al. March 28, 2	2000-03-28
E-beam application to mask making using new improved KRS resist system Grant 6,037,097 - Bucchignano , et al. March 14, 2	2000-03-14
Methods for preparing photoresist compositions Grant 5,919,597 - Sinta , et al. July 6, 1	1999-07-06
Acid scavengers for use in chemically amplified photoresists Grant 5,609,989 - Bantu , et al. March 11, 1	1997-03-11
Crosslinkable aqueous developable photoresist compositions and method for use thereof Grant 5,296,332 - Sachdev , et al. March 22, 1	1994-03-22

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