Katayama; Mami

Patent Applications and Registrations

Patent applications and USPTO patent grants for Katayama; Mami.The latest application filed is for "photosensitive resin composition, pattern forming material comprising the photosensitive resin composition, and pattern forming method and article using the photosensitive resin composition".

Company Profile

0.5.4

Katayama; Mami - Tokyo-to JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Photosensitive resin composition, pattern forming material comprising the photosensitive resin composition, and pattern forming method and article using the photosensitive resin composition Grant 8,778,596 - Katayama , et al. July 15, 2	2014-07-15
Base generator, photosensitive resin composition, pattern forming material comprising the photosensitive resin composition, pattern forming method using the photosensitive resin composition and products comprising the same Grant 8,697,332 - Katayama , et al. April 15, 2	2014-04-15
Photosensitive Resin Composition, Pattern Forming Material Comprising The Photosensitive Resin Composition, And Pattern Forming Method And Article Using The Photosensitive Resin Composition App 20130309607 - KATAYAMA; Mami ; et al.	2013-11-21
Base generator Grant 8,476,444 - Katayama , et al. July 2, 2	2013-07-02
Base Generator, Photosensitive Resin Composition, Pattern Forming Material Comprising The Photosensitive Resin Composition, Pattern Forming Method Using The Photosensitive Resin Composition And Products Comprising The Same App 20120183751 - Katayama; Mami ; et al.	2012-07-19
Base Generator, Photosensitive Resin Composition, Pattern Forming Material Comprising The Photosensitive Resin Composition, Pattern Forming Method Using The Photosensitive Resin Composition And Products Comprising The Same App 20120070781 - Katayama; Mami ; et al.	2012-03-22
Base Generator, Photosensitive Resin Composition, Pattern Forming Material Comprising The Photosensitive Resin Composition, And Pattern Forming Method And Article Using The Photosensitive Resin Composition App 20110086311 - Katayama; Mami ; et al.	2011-04-14

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