Kasuya; Kei

Patent Applications and Registrations

Patent applications and USPTO patent grants for Kasuya; Kei.The latest application filed is for "photosensitive resin composition, method for producing patterned cured film, semiconductor element and electronic device".

Company Profile

0.5.6

Kasuya; Kei - Hitachi JP
Kasuya; Kei - Ibaraki JP
KASUYA; Kei - Hitachi-shi Ibaraki

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Photosensitive resin composition, method for producing patterned cured film, semiconductor element and electronic device Grant 9,633,848 - Aoki , et al. April 25, 2	2017-04-25
Photosensitive resin composition, method for manufacturing patterned cured film, and electronic component Grant 9,395,626 - Tanimoto , et al. July 19, 2	2016-07-19
Photosensitive Resin Composition, Method For Producing Patterned Cured Film, Semiconductor Element And Electronic Device App 20150325431 - AOKI; Yu ; et al.	2015-11-12
Photosensitive Resin Composition, Method For Manufacturing Patterned Cured Film, And Electronic Component App 20140322635 - Tanimoto; Akitoshi ; et al.	2014-10-30
Positive photosensitive resin composition, method of creating resist pattern, and electronic component Grant 8,836,089 - Tanimoto , et al. September 16, 2	2014-09-16
Positive Photosensitive Resin Composition, Method Of Creating Resist Pattern, And Electronic Component App 20130168859 - Tanimoto; Akitoshi ; et al.	2013-07-04
Radiation-sensitive composition, method of forming silica-based coating film, silica-based coating film, apparatus and member having silica-based coating film and photosensitizing agent for insulating film Grant 8,158,981 - Abe , et al. April 17, 2	2012-04-17
Photosensitive Resin Composition, Method For Forming Silica Coating Film, And Apparatus And Member Each Comprising Silica Coating Film App 20120021190 - Aoki; Yousuke ; et al.	2012-01-26
Radiation-sensitive Composition, Method Of Forming Silica-based Coating Film, Silica-based Coating Film, Apparatus And Member Having Silica-based Coating Film And Photosensitizing Agent For Insulating Film App 20100102321 - Abe; Kouichi ; et al.	2010-04-29

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