loadpatents
Patent applications and USPTO patent grants for Kasama; Yoshiko.The latest application filed is for "semiconductor device and process for producing the same".
Patent | Date |
---|---|
Method of manufacturing a semiconductor device Grant 8,293,653 - Nakayama , et al. October 23, 2 | 2012-10-23 |
Semiconductor Device And Process For Producing The Same App 20100330799 - HAMANAKA; Nobuaki ;   et al. | 2010-12-30 |
Method of Manufacturing a semiconductor device App 20100221912 - Nakayama; Tomoo ;   et al. | 2010-09-02 |
Cleaning solution for semiconductor substrate Grant 7,312,186 - Takashima , et al. December 25, 2 | 2007-12-25 |
Washing liquid composition for semiconductor substrate Grant 7,138,362 - Abe , et al. November 21, 2 | 2006-11-21 |
Preparation process for semiconductor device Grant 6,949,465 - Aoki , et al. September 27, 2 | 2005-09-27 |
Method of manufacturing semiconductor device and apparatus for cleaning substrate Grant 6,890,391 - Aoki , et al. May 10, 2 | 2005-05-10 |
Photoresist residue remover composition Grant 6,787,293 - Oowada , et al. September 7, 2 | 2004-09-07 |
Cleaning solution for semiconductor substrate App 20040161933 - Takashima, Masayuki ;   et al. | 2004-08-19 |
Liquid composition for cleaning hydrophobic substrate and cleaning method therewith App 20040116315 - Aoki, Hidemitsu ;   et al. | 2004-06-17 |
Method of manufacturing semiconductor device and apparatus for cleaning substrate App 20040074526 - Aoki, Hidemitsu ;   et al. | 2004-04-22 |
Photoresist residue remover composition App 20040002020 - Oowada, Takuo ;   et al. | 2004-01-01 |
Washing liquid composition for semiconductor substrate App 20030171233 - Abe, Yumiko ;   et al. | 2003-09-11 |
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