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Patent applications and USPTO patent grants for KASAHARA; Masatoshi.The latest application filed is for "substrate processing apparatus and substrate processing method".
Patent | Date |
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Substrate Processing Apparatus And Substrate Processing Method App 20220037167 - YABUTA; Takashi ;   et al. | 2022-02-03 |
Substrate Processing Method And Substrate Processing Apparatus App 20210098271 - KAMIMURA; Fumihiro ;   et al. | 2021-04-01 |
Process liquid changing method and substrate processing apparatus Grant 9,278,768 - Kasahara , et al. March 8, 2 | 2016-03-08 |
Process Liquid Changing Method And Substrate Processing Apparatus App 20130220478 - KASAHARA; Masatoshi ;   et al. | 2013-08-29 |
Electrode plate for plasma etching Grant 5,324,411 - Ichishima , et al. June 28, 1 | 1994-06-28 |
Ink droplet expelling apparatus Grant 4,672,398 - Kuwabara , et al. June 9, 1 | 1987-06-09 |
Ink jet printing apparatus Grant 4,424,520 - Matsuda , et al. January 3, 1 | 1984-01-03 |
Drop jet apparatus Grant 4,364,070 - Matsuda , et al. December 14, 1 | 1982-12-14 |
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