KASAHARA; Kazuki

Patent Applications and Registrations

Patent applications and USPTO patent grants for KASAHARA; Kazuki.The latest application filed is for "radiation-sensitive resin composition and resist pattern-forming method".

Company Profile

2.14.21

KASAHARA; Kazuki - Tokyo JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Radiation-sensitive Resin Composition And Resist Pattern-forming Method App 20210318613 - NISHIKORI; Katsuaki ; et al.	2021-10-14
Radiation-sensitive Resin Composition And Resist Pattern-forming Method App 20200393761 - NISHIKORI; Katsuaki ; et al.	2020-12-17
Radiation-sensitive Composition And Pattern-forming Method App 20190094691 - KASAHARA; Kazuki	2019-03-28
Radiation-sensitive Composition And Pattern-forming Method App 20190033713 - KASAHARA; Kazuki ; et al.	2019-01-31
Radiation-sensitive Composition And Pattern-forming Method App 20180356725 - KASAHARA; Kazuki	2018-12-13
Radiation-sensitive composition and pattern-forming method Grant 10,120,277 - Kasahara , et al. November 6, 2	2018-11-06
Radiation-sensitive composition and pattern-forming method Grant 10,108,088 - Kasahara October 23, 2	2018-10-23
Radiation-sensitive resin composition, method for forming resist pattern, polymer and polymerizable compound Grant 10,048,586 - Asano , et al. August 14, 2	2018-08-14
Radiation-sensitive Composition And Pattern-forming Method App 20170242336 - KASAHARA; Kazuki	2017-08-24
Radiation-sensitive Composition And Pattern-forming Method App 20170242337 - KASAHARA; KAZUKI ; et al.	2017-08-24
Radiation-sensitive resin composition, method for forming resist pattern, polymer and polymerizable compound Grant 9,513,548 - Asano , et al. December 6, 2	2016-12-06
Radiation-sensitive Resin Composition, Method For Forming Resist Pattern, Polymer And Polymerizable Compound App 20160179003 - ASANO; Yuusuke ; et al.	2016-06-23
Photoresist composition and resist pattern-forming method Grant 9,329,474 - Kasahara , et al. May 3, 2	2016-05-03
Radiation-sensitive resin composition Grant 9,104,102 - Matsuda , et al. August 11, 2	2015-08-11
Resist pattern-forming method, resist pattern-forming radiation-sensitive resin composition, and resist film Grant 9,046,765 - Nakashima , et al. June 2, 2	2015-06-02
Radiation-sensitive resin composition and compound Grant 8,968,980 - Maruyama , et al. March 3, 2	2015-03-03
Radiation-sensitive Resin Composition, Method For Forming Resist Pattern, Polymer And Polymerizable Compound App 20140212813 - ASANO; Yuusuke ; et al.	2014-07-31
Radiation-sensitive resin composition, method for forming resist pattern, polymer and polymerizable compound Grant 8,728,706 - Asano , et al. May 20, 2	2014-05-20
Resist Pattern-forming Method, Resist Pattern-forming Radiation-sensitive Resin Composition, And Resist Film App 20140023968 - NAKASHIMA; Hiromitsu ; et al.	2014-01-23
Radiation-sensitive resin composition and resist film formed using the same Grant 8,609,319 - Kimura , et al. December 17, 2	2013-12-17
Photoresist Composition And Resist Pattern-forming Method App 20130280657 - KASAHARA; Kazuki ; et al.	2013-10-24
Radiation-sensitive Resin Composition And Pattern-forming Method App 20130216948 - KASAHARA; Kazuki ; et al.	2013-08-22
Radiation-sensitive Resin Composition App 20130095428 - KASAHARA; Kazuki ; et al.	2013-04-18
Radiation-sensitive Resin Composition App 20120295198 - MATSUDA; Yasuhiko ; et al.	2012-11-22
Radiation-sensitive Resin Composition, Method For Forming Resist Pattern, Polymer And Polymerizable Compound App 20120237875 - ASANO; Yuusuke ; et al.	2012-09-20
Radiation-sensitive Resin Composition App 20120183902 - Nakagawa; Hiroki ; et al.	2012-07-19
Radiation-sensitive Resin Composition And Resist Film Formed Using The Same App 20120082935 - Kimura; Toru ; et al.	2012-04-05
Radiation-sensitive Resin Composition And Compound App 20120045719 - Maruyama; Ken ; et al.	2012-02-23
Radiation-sensitive Resin Composition And Polymer App 20110223537 - Ebata; Takuma ; et al.	2011-09-15
Radiation-sensitive Resin Composition, And Resist Pattern Formation Method App 20110212401 - NISHIMURA; Yukio ; et al.	2011-09-01
Radiation-sensitive Resin Composition And Polymer App 20110014569 - KASAHARA; Kazuki ; et al.	2011-01-20

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