loadpatents
name:-0.068264007568359
name:-0.03394889831543
name:-0.0020759105682373
Karuppiah; Lakshmanan Patent Filings

Karuppiah; Lakshmanan

Patent Applications and Registrations

Patent applications and USPTO patent grants for Karuppiah; Lakshmanan.The latest application filed is for "in-situ metrology and process control".

Company Profile
1.43.72
  • Karuppiah; Lakshmanan - San Jose CA
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
In-Situ Metrology And Process Control
App 20220181179 - Krishnamurthy; Ramesh ;   et al.
2022-06-09
In-situ metrology and process control
Grant 11,289,352 - Krishnamurthy , et al. March 29, 2
2022-03-29
In-Situ Metrology And Process Control
App 20200335369 - Krishnamurthy; Ramesh ;   et al.
2020-10-22
Systems and methods for substrate polishing end point detection using improved friction measurement
Grant 9,862,070 - Chang , et al. January 9, 2
2018-01-09
Methods and apparatus for post-chemical mechanical planarization substrate cleaning
Grant 9,711,381 - Ko , et al. July 18, 2
2017-07-18
Disk-brush cleaner module with fluid jet
Grant 9,646,859 - Chen , et al. May 9, 2
2017-05-09
Feedback control using detection of clearance and adjustment for uniform topography
Grant 9,472,475 - Xu , et al. October 18, 2
2016-10-18
Semiconductor device processing tools and methods for patterning substrates
Grant 9,431,267 - Trivedi , et al. August 30, 2
2016-08-30
Feedback control of polishing using optical detection of clearance
Grant 9,073,169 - Xu , et al. July 7, 2
2015-07-07
Systems and methods for substrate polishing end point detection using improved friction measurement
Grant 9,061,394 - Chang , et al. June 23, 2
2015-06-23
Apparatus And Methods For Brush And Pad Conditioning
App 20140360976 - KO; Sen-Hou ;   et al.
2014-12-11
Spectrographic monitoring of a substrate during processing using index values
Grant 8,874,250 - David , et al. October 28, 2
2014-10-28
Apparatus and methods for brush and pad conditioning
Grant 8,813,293 - Ko , et al. August 26, 2
2014-08-26
Methods And Apparatus For Post-chemical Mechanical Planarization Substrate Cleaning
App 20140209239 - Ko; Sen-Hou ;   et al.
2014-07-31
Cryogenic Liquid Cleaning Apparatus And Methods
App 20140196749 - Tang; Jianshe ;   et al.
2014-07-17
Semiconductor Device Processing Tools And Methods For Patterning Substrates
App 20140154887 - Trivedi; Mayur ;   et al.
2014-06-05
Spectrographic Monitoring Of A Substrate During Processing Using Index Values
App 20140039660 - David; Jeffrey Drue ;   et al.
2014-02-06
In-line wafer thickness sensing
Grant 8,628,376 - Sin , et al. January 14, 2
2014-01-14
Chemical planarization of copper wafer polishing
Grant 8,586,481 - Wang , et al. November 19, 2
2013-11-19
Methods And Apparatus For Active Substrate Precession During Chemical Mechanical Polishing
App 20130288577 - Chen; Hung ;   et al.
2013-10-31
Spectrographic monitoring of a substrate during processing using index values
Grant 8,554,351 - David , et al. October 8, 2
2013-10-08
Apparatus And Methods For Brush And Pad Conditioning
App 20130247314 - KO; Sen-Hou ;   et al.
2013-09-26
Feedback Control Using Detection Of Clearance And Adjustment For Uniform Topography
App 20130224890 - Xu; Kun ;   et al.
2013-08-29
Cleaning Module And Process For Particle Reduction
App 20130185884 - Ko; Sen-Hou ;   et al.
2013-07-25
Slurry For Cobalt Applications
App 20130186850 - Wang; You ;   et al.
2013-07-25
Slurry For Planarizing Photoresist
App 20130189843 - Wang; You ;   et al.
2013-07-25
Apparatus and methods for brush and pad conditioning
Grant 8,458,843 - Ko , et al. June 11, 2
2013-06-11
Systems And Methods For Substrate Polishing End Point Detection Using Improved Friction Measurement
App 20130122782 - Chang; Shou-Sung ;   et al.
2013-05-16
Systems And Methods For Substrate Polishing End Point Detection Using Improved Friction Measurement
App 20130122788 - Chang; Shou-Sung ;   et al.
2013-05-16
Brush Box Module For Chemical Mechanical Polishing Cleaner
App 20130111678 - Chen; Hui ;   et al.
2013-05-09
Wafer edge characterization by successive radius measurements
Grant 8,337,278 - Palou-Rivera , et al. December 25, 2
2012-12-25
Spectrographic Monitoring Of A Substrate During Processing Using Index Values
App 20120323355 - David; Jeffrey Drue ;   et al.
2012-12-20
Spectrographic monitoring of a substrate during processing using index values
Grant 8,260,446 - David , et al. September 4, 2
2012-09-04
Roller assembly for a brush cleaning device in a cleaning module
Grant 8,250,695 - Karuppiah , et al. August 28, 2
2012-08-28
Polishing System Having A Track
App 20120208438 - YILMAZ; ALPAY ;   et al.
2012-08-16
Process sequence to achieve global planarity using a combination of fixed abrasive and high selectivity slurry for pre-metal dielectric CMP applications
Grant 8,211,325 - Diao , et al. July 3, 2
2012-07-03
Dishing and defect control of chemical mechanical polishing using real-time adjustable additive delivery
Grant 8,210,900 - Tu , et al. July 3, 2
2012-07-03
Polishing system having a track
Grant 8,172,643 - Yilmaz , et al. May 8, 2
2012-05-08
Feedback Control of Polishing Using Optical Detection of Clearance
App 20120064801 - Xu; Kun ;   et al.
2012-03-15
Determining Physical Property of Substrate
App 20110294400 - Ravid; Abraham ;   et al.
2011-12-01
Chemical Planarization Of Copper Wafer Polishing
App 20110294293 - Wang; You ;   et al.
2011-12-01
Disk-brush Cleaner Module With Fluid Jet
App 20110265816 - Chen; Hui ;   et al.
2011-11-03
Determining physical property of substrate
Grant 8,014,004 - Ravid , et al. September 6, 2
2011-09-06
High throughput measurement system
Grant 7,952,708 - Ravid , et al. May 31, 2
2011-05-31
Apparatus And Methods For Brush And Pad Conditioning
App 20110094537 - Ko; Sen-Hou ;   et al.
2011-04-28
Roller Assembly For A Brush Cleaning Device In A Cleaning Module
App 20110079245 - Karuppiah; Lakshmanan ;   et al.
2011-04-07
Smart conditioner rinse station
Grant 7,914,363 - Yilmaz , et al. March 29, 2
2011-03-29
Methods And Apparatus For Generating A Library Of Spectra
App 20110046918 - Ravid; Abraham ;   et al.
2011-02-24
Methods and apparatus for generating a library of spectra
Grant 7,840,375 - Ravid , et al. November 23, 2
2010-11-23
Process Sequence To Achieve Global Planarity Using A Combination Of Fixed Abrasive And High Selectivity Slurry For Pre-metal Dielectric Cmp Applications
App 20100285666 - DIAO; JIE ;   et al.
2010-11-11
Determining Physical Property of Substrate
App 20100261413 - Ravid; Abraham ;   et al.
2010-10-14
Spectrographic Monitoring Of A Substrate During Processing Using Index Values
App 20100217430 - David; Jeffrey Drue ;   et al.
2010-08-26
Substrate thickness measuring during polishing
Grant 7,774,086 - David , et al. August 10, 2
2010-08-10
Determining physical property of substrate
Grant 7,746,485 - Ravid , et al. June 29, 2
2010-06-29
In-Line Wafer Thickness Sensing
App 20100120333 - Sin; Garrett H. ;   et al.
2010-05-13
Dishing And Defect Control Of Chemical Mechanical Polishing Using Real-time Adjustable Additive Delivery
App 20100112903 - TU; WEN-CHIANG ;   et al.
2010-05-06
Smart Conditioner Rinse Station
App 20100029178 - Yilmaz; Alpay ;   et al.
2010-02-04
Pad Properties Using Nanoparticle Additives
App 20090278081 - M'Saad; Hichem ;   et al.
2009-11-12
Polishing System With Three Headed Carousel
App 20090280727 - KARUPPIAH; LAKSHMANAN ;   et al.
2009-11-12
Smart conditioner rinse station
Grant 7,611,400 - Yilmaz , et al. November 3, 2
2009-11-03
Polishing System Having A Track
App 20090258574 - Yilmaz; Alpay ;   et al.
2009-10-15
Wafer Edge Characterization By Successive Radius Measurements
App 20090149115 - Palou-Rivera; Ignacio ;   et al.
2009-06-11
Conductive pad design modification for better wafer-pad contact
Grant 7,520,968 - Mavliev , et al. April 21, 2
2009-04-21
Electrochemical method for Ecmp polishing pad conditioning
Grant 7,504,018 - Wang , et al. March 17, 2
2009-03-17
Substrate Thickness Measuring During Polishing
App 20090036026 - David; Jeffrey Drue ;   et al.
2009-02-05
Determining Physical Property of Substrate
App 20090033942 - Ravid; Abraham ;   et al.
2009-02-05
Determining physical property of substrate
Grant 7,444,198 - Ravid , et al. October 28, 2
2008-10-28
Methods And Apparatus For Generating A Library Of Spectra
App 20080243433 - Ravid; Abraham ;   et al.
2008-10-02
High Throughput Measurement System
App 20080239308 - Ravid; Abraham ;   et al.
2008-10-02
Method and apparatus for electroprocessing a substrate with edge profile control
Grant 7,422,982 - Wang , et al. September 9, 2
2008-09-09
Substrate thickness measuring during polishing
Grant 7,409,260 - David , et al. August 5, 2
2008-08-05
Platen Assembly For Electrochemical Mechanical Processing
App 20080146121 - Ozgun; Omer ;   et al.
2008-06-19
Determining Physical Property Of Substrate
App 20080146120 - Ravid; Abraham ;   et al.
2008-06-19
Detection Of Clearance Of Polysilicon Residue
App 20080138988 - David; Jeffrey Drue ;   et al.
2008-06-12
Conductive pad with ion exchange membrane for electrochemical mechanical polishing
Grant 7,344,432 - Chen , et al. March 18, 2
2008-03-18
Apparatus For Electroprocessing A Substrate With Edge Profile Control
App 20080035474 - Wang; You ;   et al.
2008-02-14
Method for conditioning a polishing pad
App 20080020682 - Jia; Renhe ;   et al.
2008-01-24
Method and apparatus for electroprocessing a substrate with edge profile control
App 20080014709 - Wang; You ;   et al.
2008-01-17
Conditioning Disk Having Uniform Structures
App 20080014845 - Yilmaz; Alpay ;   et al.
2008-01-17
Abrasive Composition For Electrochemical Mechanical Polishing
App 20070254485 - Mao; Daxin ;   et al.
2007-11-01
Process for high copper removal rate with good planarization and surface finish
App 20070235344 - Jia; Renhe ;   et al.
2007-10-11
Substrate Thickness Measuring During Polishing
App 20070224915 - David; Jeffrey Drue ;   et al.
2007-09-27
Smart Conditioner Rinse Station
App 20070207704 - YILMAZ; ALPAY ;   et al.
2007-09-06
Method and apparatus for foam removal in an electrochemical mechanical substrate polishing process
App 20070181442 - Jia; Renhe ;   et al.
2007-08-09
Methods for electrochemical processing with pre-biased cells
App 20070158207 - Diao; Jie ;   et al.
2007-07-12
Apparatus and a method for electrochemical mechanical processing with fluid flow assist elements
App 20070151867 - Hu; Yongqi ;   et al.
2007-07-05
Voltage Mode Current Control
App 20070108066 - Tsai; Stan D. ;   et al.
2007-05-17
Electrochemical Method For Ecmp Polishing Pad Conditioning
App 20070095677 - Wang; You ;   et al.
2007-05-03
Conductive Pad With Ion Exchange Membrane For Electrochemical Mechanical Polishing
App 20070099552 - Chen; Liang-Yuh ;   et al.
2007-05-03
Smart conditioner rinse station
Grant 7,210,981 - Yilmaz , et al. May 1, 2
2007-05-01
Smart conditioner rinse station
App 20060270322 - Yilmaz; Alpay ;   et al.
2006-11-30
Process and composition for electrochemical mechanical polishing
App 20060249395 - Wang; You ;   et al.
2006-11-09
Process and composition for electrochemical mechanical polishing
App 20060249394 - Jia; Renhe ;   et al.
2006-11-09
Tungsten electroprocessing
App 20060196778 - Jia; Renhe ;   et al.
2006-09-07
Platen assembly utilizing magnetic slip ring
App 20060154569 - Doyle; Terry ;   et al.
2006-07-13
Conductive pad design modification for better wafer-pad contact
App 20060073768 - Mavliev; Rashid A. ;   et al.
2006-04-06
Methods and systems for exchanging messages in a controller for a substrate processing system
App 20040142563 - Fontarensky, Pierre ;   et al.
2004-07-22

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