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Patent applications and USPTO patent grants for Karino; Toshikazu.The latest application filed is for "substrate transferring mechanism".
Patent | Date |
---|---|
Substrate transferring mechanism Grant 6,143,083 - Yonemitsu , et al. November 7, 2 | 2000-11-07 |
Substrate processing apparatus with a processing chamber, transfer chamber, intermediate holding chamber, and an atmospheric pressure section Grant 6,066,210 - Yonemitsu , et al. May 23, 2 | 2000-05-23 |
Substrate processing apparatus Grant 5,788,447 - Yonemitsu , et al. August 4, 1 | 1998-08-04 |
Semiconductor wafer reaction furnace with wafer transfer means Grant 5,387,265 - Kakizaki , et al. February 7, 1 | 1995-02-07 |
Wafer transfer mechanism in vertical CVD diffusion apparatus Grant 5,217,340 - Harada , et al. June 8, 1 | 1993-06-08 |
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