| Patent | Date |
|---|
Planar substrate edge contact with open volume equalization pathways and side containment
Grant 11,443,975 - Breiling , et al. September 13, 2 | 2022-09-13 |
Variable Cycle And Time Rf Activation Method For Film Thickness Matching In A Multi-station Deposition System
App 20220154336 - Karim; Ishtak ; et al. | 2022-05-19 |
Dynamic Precursor Dosing For Atomic Layer Deposition
App 20220033967 - Kumar; Purushottam ; et al. | 2022-02-03 |
Line Bending Control For Memory Applications
App 20220028864 - BUTAIL; Gorun ; et al. | 2022-01-27 |
Dynamic precursor dosing for atomic layer deposition
Grant 11,180,850 - Kumar , et al. November 23, 2 | 2021-11-23 |
Method Of Improving Deposition Induced Cd Imbalance Using Spatially Selective Ashing Of Carbon Based Film
App 20210202250 - KARIM; Ishtak ; et al. | 2021-07-01 |
Method of improving deposition induced CD imbalance using spatially selective ashing of carbon based film
Grant 10,978,302 - Karim , et al. April 13, 2 | 2021-04-13 |
Electrostatic Chuck With Seal Surface
App 20210013080 - Breiling; Patrick G. ; et al. | 2021-01-14 |
Planar Substrate Edge Contact With Open Volume Equalization Pathways And Side Containment
App 20200227304 - Breiling; Patrick ; et al. | 2020-07-16 |
Minimization of carbon loss in ALD SiO2 deposition on hardmask films
Grant 10,692,717 - Agnew , et al. | 2020-06-23 |
Selective atomic layer deposition with post-dose treatment
Grant 10,679,848 - Kumar , et al. | 2020-06-09 |
Conical wafer centering and holding device for semiconductor processing
Grant 10,655,224 - Agarwal , et al. | 2020-05-19 |
Planar substrate edge contact with open volume equalization pathways and side containment
Grant 10,622,243 - Breiling , et al. | 2020-04-14 |
Minimization of Carbon Loss in ALD SiO2 Deposition on Hardmask Films
App 20200027718 - Agnew; Douglas Walter ; et al. | 2020-01-23 |
Minimization of carbon loss in ALD SiO2 deposition on hardmask films
Grant 10,340,136 - Agnew , et al. | 2019-07-02 |
Method Of Improving Deposition Induced Cd Imbalance Using Spatially Selective Ashing Of Carbon Based Film
App 20190164757 - KARIM; Ishtak ; et al. | 2019-05-30 |
Showerhead curtain gas method and system for film profile modulation
Grant 10,202,691 - Karim , et al. Feb | 2019-02-12 |
Dynamic Precursor Dosing For Atomic Layer Deposition
App 20190024233 - Kumar; Purushottam ; et al. | 2019-01-24 |
Systems and methods for detection of plasma instability by electrical measurement
Grant 10,128,160 - Sakiyama , et al. November 13, 2 | 2018-11-13 |
Selective Atomic Layer Deposition With Post-dose Treatment
App 20180323057 - Kumar; Purushottam ; et al. | 2018-11-08 |
Dynamic precursor dosing for atomic layer deposition
Grant 10,094,018 - Kumar , et al. October 9, 2 | 2018-10-09 |
High dry etch rate materials for semiconductor patterning applications
Grant 10,074,543 - Mahorowala , et al. September 11, 2 | 2018-09-11 |
Selective atomic layer deposition with post-dose treatment
Grant 10,062,563 - Kumar , et al. August 28, 2 | 2018-08-28 |
Selective atomic layer deposition for gapfill using sacrificial underlayer
Grant 10,037,884 - Ou , et al. July 31, 2 | 2018-07-31 |
Conical Wafer Centering And Holding Device For Semiconductor Processing
App 20180171473 - Agarwal; Pulkit ; et al. | 2018-06-21 |
Systems and methods for frequency modulation of radiofrequency power supply for controlling plasma instability
Grant 9,997,422 - Karim , et al. June 12, 2 | 2018-06-12 |
Systems and methods for using electrical asymmetry effect to control plasma process space in semiconductor fabrication
Grant 9,941,113 - Keil , et al. April 10, 2 | 2018-04-10 |
Systems and Methods for Detection of Plasma Instability by Electrical Measurement
App 20180076100 - Sakiyama; Yukinori ; et al. | 2018-03-15 |
High Dry Etch Rate Materials For Semiconductor Patterning Applications
App 20180061650 - Mahorowala; Arpan ; et al. | 2018-03-01 |
Selective Atomic Layer Deposition For Gapfill Using Sacrificial Underlayer
App 20180061628 - Ou; Fung Suong ; et al. | 2018-03-01 |
Variable temperature hardware and methods for reduction of wafer backside deposition
Grant 9,870,917 - Kang , et al. January 16, 2 | 2018-01-16 |
Selective Atomic Layer Deposition With Post-dose Treatment
App 20180005814 - Kumar; Purushottam ; et al. | 2018-01-04 |
Dynamic Precursor Dosing For Atomic Layer Deposition
App 20170362705 - Kumar; Purushottam ; et al. | 2017-12-21 |
Showerhead Curtain Gas Method And System For Film Profile Modulation
App 20170362713 - Karim; Ishtak ; et al. | 2017-12-21 |
Systems and methods for detection of plasma instability by electrical measurement
Grant 9,824,941 - Sakiyama , et al. November 21, 2 | 2017-11-21 |
Systems and Methods for Using Electrical Asymmetry Effect to Control Plasma Process Space in Semiconductor Fabrication
App 20170330744 - Keil; Douglas ; et al. | 2017-11-16 |
Variable Cycle And Time Rf Activation Method For Film Thickness Matching In A Multi-station Deposition System
App 20170314129 - Karim; Ishtak ; et al. | 2017-11-02 |
Showerhead curtain gas method and system for film profile modulation
Grant 9,738,977 - Karim , et al. August 22, 2 | 2017-08-22 |
Variable Temperature Hardware And Methods For Reduction Of Wafer Backside Deposition
App 20170178898 - Kang; Hu ; et al. | 2017-06-22 |
Systems and Methods for Frequency Modulation of Radiofrequency Power Supply for Controlling Plasma Instability
App 20170141002 - Karim; Ishtak ; et al. | 2017-05-18 |
Systems and Methods for Detection of Plasma Instability by Electrical Measurement
App 20170141000 - Sakiyama; Yukinori ; et al. | 2017-05-18 |
Systems and methods for using electrical asymmetry effect to control plasma process space in semiconductor fabrication
Grant 9,644,271 - Keil , et al. May 9, 2 | 2017-05-09 |
Dynamic Precursor Dosing For Atomic Layer Deposition
App 20170096735 - Kumar; Purushottam ; et al. | 2017-04-06 |
Method and apparatus to deposit pure titanium thin film at low temperature using titanium tetraiodide precursor
Grant 9,478,438 - Thombare , et al. October 25, 2 | 2016-10-25 |
Method to tune TiO.sub.x stoichiometry using atomic layer deposited Ti film to minimize contact resistance for TiO.sub.x/Ti based MIS contact scheme for CMOS
Grant 9,478,411 - Thombare , et al. October 25, 2 | 2016-10-25 |
Method To Tune Tiox Stoichiometry Using Atomic Layer Deposited Ti Film To Minimize Contact Resistance For Tiox/ti Based Mis Contact Scheme For Cmos
App 20160056037 - Thombare; Shruti Vivek ; et al. | 2016-02-25 |
Method And Apparatus To Deposit Pure Titanium Thin Film At Low Temperature Using Titanium Tetraiodide Precursor
App 20160056053 - Thombare; Shruti Vivek ; et al. | 2016-02-25 |
Apparatus And Method For Uniform Irradiation Using Secondary Irradiant Energy From A Single Light Source
App 20150163860 - Burkhart; Vincent E. ; et al. | 2015-06-11 |
Plasma Process Etch-to-deposition Ratio Modulation Via Ground Surface Design
App 20140127912 - Wu; Liqi ; et al. | 2014-05-08 |
Creation Of Off-axis Null Magnetic Field Locus For Improved Uniformity In Plasma Deposition And Etching
App 20130206725 - Leeser; Karl ; et al. | 2013-08-15 |
Magnetic lensing to improve deposition uniformity in a physical vapor deposition (PVD) process
Grant 8,343,318 - Leeser , et al. January 1, 2 | 2013-01-01 |
Creation Of Magnetic Field (vector Potential) Well For Improved Plasma Deposition And Resputtering Uniformity
App 20120228125 - Wu; Liqi ; et al. | 2012-09-13 |
Creation Of Magnetic Field (vector Potential) Well For Improved Plasma Deposition And Resputtering Uniformity
App 20120070589 - Wu; Liqi ; et al. | 2012-03-22 |
Magnetic Lensing To Improve Deposition Uniformity In A Physical Vapor Deposition (pvd) Process
App 20110233050 - Leeser; Karl ; et al. | 2011-09-29 |
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