Kanou; Gaku

Patent Applications and Registrations

Patent applications and USPTO patent grants for Kanou; Gaku.The latest application filed is for "high purity cobalt chloride and manufacturing method therefor".

Company Profile

1.9.9

Kanou; Gaku - Ibaraki JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
High purity cobalt chloride and manufacturing method therefor Grant 10,337,109 - Kanou	2019-07-02
Copper chloride, CVD raw material, copper wiring film, and method for producing copper chloride Grant 10,266,952 - Kanou , et al.	2019-04-23
High Purity Cobalt Chloride And Manufacturing Method Therefor App 20180312984 - Kanou; Gaku	2018-11-01
Copper Chloride, Cvd Raw Material, Copper Wiring Film, And Method For Producing Copper Chloride App 20170101718 - KANOU; GAKU ; et al.	2017-04-13
Copper or copper alloy, bonding wire, method of producing the copper, method of producing the copper alloy, and method of producing the bonding wire Grant 9,597,754 - Kanou March 21, 2	2017-03-21
Low .alpha.-dose tin or tin alloy, and method for producing same Grant 9,394,590 - Kanou July 19, 2	2016-07-19
High Purity Cobalt Chloride And Manufacturing Method Therefor App 20160168728 - Kanou; Gaku	2016-06-16
High-purity lanthanum, sputtering target comprising high-purity lanthanum, and metal gate film mainly comprising high-purity lanthanum Grant 8,980,169 - Takahata , et al. March 17, 2	2015-03-17
Copper Or Copper Reduced In Alpha Ray Emission, And Bonding Wire Obtained From The Copper Or Copper Alloy As Raw Material App 20140010705 - Kanou; Gaku	2014-01-09
Low alpha-Dose Tin or Tin Alloy, and Method for Producing Same App 20130028786 - Kanou; Gaku	2013-01-31
High-purity Ru alloy target, process for producing the same, and sputtered film Grant 7,871,564 - Kanou , et al. January 18, 2	2011-01-18
High-Purity Lanthanum, Sputtering Target Comprising High-Purity Lanthanum, and Metal Gate Film Mainly Comprising High-Purity Lanthanum App 20100272596 - Takahata; Masahiro ; et al.	2010-10-28
High-Purity Ru Alloy Target, Process for Producing the Same, and Sputtered Film App 20090280025 - Kanou; Gaku ; et al.	2009-11-12

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