| Patent | Date |
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Liquid crystal cured layer, production method therefor, optical film, polarizing plate, and display device
Grant 11,447,700 - Saito , et al. September 20, 2 | 2022-09-20 |
Resist underlayer film forming composition containing silicone having cyclic amino group
Grant 11,392,037 - Nakajima , et al. July 19, 2 | 2022-07-19 |
Charge Transporting Composition
App 20210296588 - MURAKAJI; Haruka ; et al. | 2021-09-23 |
Liquid Crystal Cured Layer, Production Method Therefor, Optical Film, Polarizing Plate, And Display Device
App 20210214614 - SAITO; Masakazu ; et al. | 2021-07-15 |
Non-aqueous Ink Composition
App 20200216696 - KANNO; Yuta ; et al. | 2020-07-09 |
Retardation material-forming resin composition, orientation material, and retardation material
Grant 10,590,219 - Yukawa , et al. | 2020-03-17 |
Cured film formation composition, orientation material, and retardation material
Grant 10,570,248 - Ito , et al. Feb | 2020-02-25 |
Liquid crystal alignment agent for photo-alignment, aligning member, and retardation member
Grant 10,428,274 - Ito , et al. October 1, 2 | 2019-10-01 |
Resist underlayer film forming composition containing silicon having ester group
Grant 10,372,039 - Kanno , et al. | 2019-08-06 |
Retardation Material-forming Resin Composition, Orientation Material, And Retardation Material
App 20180355087 - YUKAWA; Shojiro ; et al. | 2018-12-13 |
Cured film formation composition, orientation material and retardation material
Grant 10,100,201 - Ito , et al. October 16, 2 | 2018-10-16 |
Retardation material-forming resin composition, orientation material, and retardation material
Grant 10,081,693 - Yukawa , et al. September 25, 2 | 2018-09-25 |
Resist underlayer film forming composition containing silicon containing cyclic organic group having hetero atom
Grant 10,079,146 - Kanno , et al. September 18, 2 | 2018-09-18 |
Liquid Crystal Alignment Agent For Photo-alignment, Aligning Member, And Retardation Member
App 20180119016 - ITO; Jun ; et al. | 2018-05-03 |
Cured Film Formation Composition, Orientation Material, And Retardation Material
App 20180112032 - ITO; Jun ; et al. | 2018-04-26 |
Silicon-containing resist underlayer film forming composition having urea group
Grant 9,760,006 - Nakajima , et al. September 12, 2 | 2017-09-12 |
Cured Film Formation Composition, Orientation Material And Retardation Material
App 20160369105 - ITO; Jun ; et al. | 2016-12-22 |
Retardation Material-forming Resin Composition, Orientation Material, And Retardation Material
App 20160369025 - YUKAWA; Shojiro ; et al. | 2016-12-22 |
Silicon-containing resist underlayer film-forming composition having sulfone structure
Grant 9,524,871 - Nakajima , et al. December 20, 2 | 2016-12-20 |
Resist underlayer film forming composition containing silicon having sulfone structure and amine structure
Grant 9,494,862 - Kanno , et al. November 15, 2 | 2016-11-15 |
Composition for forming resist underlayer film, containing silicon that bears diketone-structure-containing organic group
Grant 9,291,900 - Kanno , et al. March 22, 2 | 2016-03-22 |
Composition for forming silicon-containing resist underlayer film having cyclic diester group
Grant 9,290,623 - Kanno , et al. March 22, 2 | 2016-03-22 |
Resist underlayer film forming composition containing silicon having sulfide bond
Grant 9,217,921 - Kanno , et al. December 22, 2 | 2015-12-22 |
Silicon-containing composition for formation of resist underlayer film, which contains organic group containing protected aliphatic alcohol
Grant 9,196,484 - Takeda , et al. November 24, 2 | 2015-11-24 |
Composition For Forming Silicon-containing Resist Underlayer Film Having Cyclic Diester Group
App 20150322212 - KANNO; Yuta ; et al. | 2015-11-12 |
Resist Underlayer Film Forming Composition Containing Silicon Having Ester Group
App 20150316849 - KANNO; Yuta ; et al. | 2015-11-05 |
Resist Underlayer Film Forming Composition Containing Silicon Containing Cyclic Organic Group Having Hetero Atom
App 20150249012 - Kanno; Yuta ; et al. | 2015-09-03 |
Thin film forming composition for lithography containing titanium and silicon
Grant 9,093,279 - Nakajima , et al. July 28, 2 | 2015-07-28 |
Resist Underlayer Film Forming Composition Containing Silicon Having Sulfone Structure And Amine Structure
App 20150159045 - Kanno; Yuta ; et al. | 2015-06-11 |
Resist underlayer film forming composition containing silicon having nitrogen-containing ring
Grant 9,023,588 - Nakajima , et al. May 5, 2 | 2015-05-05 |
Method For Manufacturing Semiconductor Device Using Silicon-containing Resist Underlayer Film Forming Composition For Solvent Development
App 20140377957 - Takeda; Satoshi ; et al. | 2014-12-25 |
Silicon-containing resist underlayer film forming composition having fluorine-based additive
Grant 8,877,425 - Kanno , et al. November 4, 2 | 2014-11-04 |
Resist underlayer film forming composition containing silicone having onium group
Grant 8,864,894 - Shibayama , et al. October 21, 2 | 2014-10-21 |
Resist underlayer film forming composition containing silicon having anion group
Grant 8,835,093 - Shibayama , et al. September 16, 2 | 2014-09-16 |
Silicon-containing composition having sulfonamide group for forming resist underlayer film
Grant 8,828,879 - Kanno , et al. September 9, 2 | 2014-09-09 |
Resist underlayer film forming composition containing silicon having anion group
Grant 8,815,494 - Shibayama , et al. August 26, 2 | 2014-08-26 |
Silicon-containing Resist Underlayer Film-forming Composition Having Sulfone Structure
App 20140170855 - Nakajima; Makoto ; et al. | 2014-06-19 |
Thin Film Forming Composition For Lithography Containing Titanium And Silicon
App 20140120730 - Nakajima; Makoto ; et al. | 2014-05-01 |
Composition For Forming Resist Underlayer Film, Containing Silicon That Bears Diketone-structure-containing Organic Group
App 20130302991 - Kanno; Yuta ; et al. | 2013-11-14 |
Silicon-containing Resist Underlayer Film Forming Composition Having Fluorine-based Additive
App 20130224957 - Kanno; Yuta ; et al. | 2013-08-29 |
Silicon-containing Composition For Formation Of Resist Underlayer Film, Which Contains Organic Group Containing Protected Aliphatic Alcohol
App 20130183830 - Takeda; Satoshi ; et al. | 2013-07-18 |
Resist underlayer film forming composition containing polymer having nitrogen-containing silyl group
Grant 8,426,112 - Nakajima , et al. April 23, 2 | 2013-04-23 |
Resist Underlayer Film Forming Composition Containing Silicon Having Anion Group
App 20130078814 - SHIBAYAMA; Wataru ; et al. | 2013-03-28 |
Resist Underlayer Film Forming Composition Containing Silicon Having Nitrogen-containing Ring
App 20120315765 - Nakajima; Makoto ; et al. | 2012-12-13 |
Silicon-containing Composition Having Sulfonamide Group For Forming Resist Underlayer Film
App 20120178261 - Kanno; Yuta ; et al. | 2012-07-12 |
Resist Underlayer Film Forming Composition Containing Silicon Having Sulfide Bond
App 20120070994 - Kanno; Yuta ; et al. | 2012-03-22 |
Resist Underlayer Film Forming Composition Containing Silicon Having Anion Group
App 20110287369 - Shibayama; Wataru ; et al. | 2011-11-24 |
Resist Underlayer Film Forming Composition Containing Silicone Having Onium Group
App 20110143149 - Shibayama; Wataru ; et al. | 2011-06-16 |
Resist Underlayer Film Forming Composition Containing Silicone Having Cyclic Amino Group
App 20100330505 - NAKAJIMA; Makoto ; et al. | 2010-12-30 |
Resist Underlayer Film Forming Composition Containing Polymer Having Nitrogen-containing Silyl Group
App 20100304305 - Nakajima; Makoto ; et al. | 2010-12-02 |
Silicon-containing Resist Underlayer Film Forming Composition Having Urea Group
App 20100291487 - Nakajima; Makoto ; et al. | 2010-11-18 |
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