Kang; Young-Seog

Patent Applications and Registrations

Patent applications and USPTO patent grants for Kang; Young-Seog.The latest application filed is for "pattern matching method in manufacturing semiconductor memory devices".

Company Profile

0.6.8

Kang; Young-Seog - Gyeonggi-do KR
Kang; Young-Seog - Yongin-si KR
Kang; Young-Seog - Yongin KR
Kang, Young-Seog - Yongin-city KR

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Pattern matching method in manufacturing semiconductor memory devices Grant 8,229,205 - Hyon , et al. July 24, 2	2012-07-24
System and method correcting optical proximity effect using pattern configuration dependent OPC models Grant 7,900,170 - Suh , et al. March 1, 2	2011-03-01
Pattern Matching Method In Manufacturing Semiconductor Memory Devices App 20090103799 - Hyon; Chan-Kyeong ; et al.	2009-04-23
Method of fabricating photo mask Grant 7,475,383 - Suh , et al. January 6, 2	2009-01-06
Global matching methods used to fabricate semiconductor devices App 20080187211 - Hyon; Chan-Kyeong ; et al.	2008-08-07
Photomask for forming photoresist patterns repeating in two dimensions and method of fabricating the same Grant 7,361,433 - Hwang , et al. April 22, 2	2008-04-22
Mask for photolithography and method of fabricating photoresist pattern using the same App 20080020297 - Kim; Chang-hwan ; et al.	2008-01-24
Method of fabricating photo mask App 20070162887 - Suh; Sung-Soo ; et al.	2007-07-12
Optical proximity correction system and methods thereof App 20070094635 - Suh; Sung-Soo ; et al.	2007-04-26
Optical system for providing a hexapole illumination and method of forming a photoresist pattern on a substrate using the same Grant 7,139,064 - Nam , et al. November 21, 2	2006-11-21
Method of designing phase grating pattern providing modified illumination optimum for producing a target pattern and method of manufacturing a photo mask system comprising the phase grating pattern Grant 6,911,286 - Kang , et al. June 28, 2	2005-06-28
Optical system for providing a hexapole illumination and method of forming a photoresist pattern on a substrate using the same App 20050105072 - Nam, Dong-Seok ; et al.	2005-05-19
Photomask for forming photoresist patterns repeating in two dimensions and method of fabricating the same App 20050003278 - Hwang, Chan ; et al.	2005-01-06
Method of designing phase grating pattern providing modified illumination optimum for producing a target pattern and method of manufacturing a photo mask system comprising the phase grating pattern App 20040013950 - Kang, Young-Seog ; et al.	2004-01-22

uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.

While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.

All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.