Kang; Wenbing

Patent Applications and Registrations

Patent applications and USPTO patent grants for Kang; Wenbing.The latest application filed is for "composition for coating over a photoresist pattern comprising a lactam".

Company Profile

2.4.6

Kang; Wenbing - Kakegawa N/A JP
- Kakegawa JP
Kang; Wenbing - Shizuoka JP
Kang; Wenbing - Ogasa-gun JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Resist pattern formating method Grant 8,618,002 - Kang , et al. December 31, 2	2013-12-31
Resist pattern formating method Grant 08618002 -	2013-12-31
Composition for Coating over a Photoresist Pattern Comprising a Lactam App 20120219919 - Thiyagarajan; Muthiah ; et al.	2012-08-30
Positive-working photoimageable bottom antireflective coating Grant 8,039,202 - Sui , et al. October 18, 2	2011-10-18
Resist Pattern Formating Method App 20110241173 - Kang; Wenbing ; et al.	2011-10-06
Substrate Treating Solution And Method Employing The Same For Treating A Resist Substrate App 20110165523 - Wang; Xiaowei ; et al.	2011-07-07
Composition for coating over a photoresist pattern comprising a lactam Grant 7,923,200 - Thiyagarajan , et al. April 12, 2	2011-04-12
Composition for Coating over a Photoresist Pattern Comprising a Lactam App 20080248427 - Thiyagarajan; Muthiah ; et al.	2008-10-09
Positive -Working Photoimageable Bottom Antireflective Coating App 20080090184 - Sui; Yu ; et al.	2008-04-17
Positive-working photoimageable bottom antireflective coating App 20050214674 - Sui, Yu ; et al.	2005-09-29

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