name:-0.073009967803955
name:-0.053950071334839
name:-0.02159595489502
Kang; Hu Patent Filings

Kang; Hu

Patent Applications and Registrations

Patent applications and USPTO patent grants for Kang; Hu.The latest application filed is for "gapfill of variable aspect ratio features with a composite peald and pecvd method".

Company Profile
19.48.59
  • Kang; Hu - Tualatin OR
  • Kang; Hu - Evanston IL
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Trademarks
Patent Activity
PatentDate
Substrate processing system with tandem source activation for CVD
Grant 11,434,567 - LaVoie , et al. September 6, 2
2022-09-06
Gapfill Of Variable Aspect Ratio Features With A Composite Peald And Pecvd Method
App 20220059348 - Kang; Hu ;   et al.
2022-02-24
Dynamic Precursor Dosing For Atomic Layer Deposition
App 20220033967 - Kumar; Purushottam ;   et al.
2022-02-03
Dynamic precursor dosing for atomic layer deposition
Grant 11,180,850 - Kumar , et al. November 23, 2
2021-11-23
Ultrathin Atomic Layer Deposition Film Accuracy Thickness Control
App 20210343520 - Qian; Jun ;   et al.
2021-11-04
Gapfill of variable aspect ratio features with a composite PEALD and PECVD method
Grant 11,133,180 - Kang , et al. September 28, 2
2021-09-28
Systems and methods for suppressing parasitic plasma and reducing within-wafer non-uniformity
Grant 11,127,567 - Kang , et al. September 21, 2
2021-09-21
Ultrathin atomic layer deposition film accuracy thickness control
Grant 11,101,129 - Qian , et al. August 24, 2
2021-08-24
Systems And Methods For Suppressing Parasitic Plasma And Reducing Within-wafer Non-uniformity
App 20200335304 - Kang; Hu ;   et al.
2020-10-22
Methods for depositing films on sensitive substrates
Grant 10,741,458 - Kang , et al. A
2020-08-11
Low volume showerhead with porous baffle
Grant 10,741,365 - Chandrasekharan , et al. A
2020-08-11
Substrate Processing System With Tandem Source Activation For Cvd
App 20200199747 - LAVOIE; Adrien ;   et al.
2020-06-25
Systems and methods for suppressing parasitic plasma and reducing within-wafer non-uniformity
Grant 10,665,429 - Kang , et al.
2020-05-26
Ultrathin Atomic Layer Deposition Film Accuracy Thickness Control
App 20200152446 - Qian; Jun ;   et al.
2020-05-14
Multi-cycle Ald Process For Film Uniformity And Thickness Profile Modulation
App 20200087786 - Kumar; Purushottam ;   et al.
2020-03-19
Single ALD cycle thickness control in multi-station substrate deposition systems
Grant 10,577,691 - Nowak , et al.
2020-03-03
Tandem source activation for CVD of films
Grant 10,577,688 - LaVoie , et al.
2020-03-03
Ultrathin atomic layer deposition film accuracy thickness control
Grant 10,566,187 - Qian , et al. Feb
2020-02-18
Multi-cycle ALD process for film uniformity and thickness profile modulation
Grant 10,526,701 - Kumar , et al. J
2020-01-07
Hardware and process for film uniformity improvement
Grant 10,526,700 - Kumar , et al. J
2020-01-07
Ultrathin Atomic Layer Deposition Film Accuracy Thickness Control
App 20190378710 - Qian; Jun ;   et al.
2019-12-12
Gapfill Of Variable Aspect Ratio Features With A Composite Peald And Pecvd Method
App 20190311897 - Kang; Hu ;   et al.
2019-10-10
Methods and apparatuses for showerhead backside parasitic plasma suppression in a secondary purge enabled ALD system
Grant 10,407,773 - LaVoie , et al. Sept
2019-09-10
Low volume showerhead with faceplate holes for improved flow uniformity
Grant 10,378,107 - Chandrasekharan , et al. A
2019-08-13
Gapfill of variable aspect ratio features with a composite PEALD and PECVD method
Grant 10,361,076 - Kang , et al.
2019-07-23
Hardware And Process For Film Uniformity Improvement
App 20190040528 - Kumar; Purushottam ;   et al.
2019-02-07
Dynamic Precursor Dosing For Atomic Layer Deposition
App 20190024233 - Kumar; Purushottam ;   et al.
2019-01-24
Hardware and process for film uniformity improvement
Grant 10,100,407 - Kumar , et al. October 16, 2
2018-10-16
Dynamic precursor dosing for atomic layer deposition
Grant 10,094,018 - Kumar , et al. October 9, 2
2018-10-09
Methods For Depositing Films On Sensitive Substrates
App 20180247875 - Kang; Hu ;   et al.
2018-08-30
Methods for depositing films on sensitive substrates
Grant 10,008,428 - Kang , et al. June 26, 2
2018-06-26
Systems and methods for vapor delivery in a substrate processing system
Grant 9,970,108 - Qian , et al. May 15, 2
2018-05-15
Inhibitor plasma mediated atomic layer deposition for seamless feature fill
Grant 9,966,299 - Tang , et al. May 8, 2
2018-05-08
Systems And Methods For Suppressing Parasitic Plasma And Reducing Within-wafer Non-uniformity
App 20180068833 - Kang; Hu ;   et al.
2018-03-08
Systems and methods for removing particles from a substrate processing chamber using RF plasma cycling and purging
Grant 9,899,195 - Kang , et al. February 20, 2
2018-02-20
Variable temperature hardware and methods for reduction of wafer backside deposition
Grant 9,870,917 - Kang , et al. January 16, 2
2018-01-16
Single Ald Cycle Thickness Control In Multi-station Substrate Deposition Systems
App 20180010250 - Nowak; Romuald ;   et al.
2018-01-11
Dynamic Precursor Dosing For Atomic Layer Deposition
App 20170362705 - Kumar; Purushottam ;   et al.
2017-12-21
Tandem Source Activation For Cvd Of Films
App 20170327947 - LaVoie; Adrien ;   et al.
2017-11-16
Gapfill Of Variable Aspect Ratio Features With A Composite Peald And Pecvd Method
App 20170323786 - Kang; Hu ;   et al.
2017-11-09
Methods For Depositing Films On Sensitive Substrates
App 20170316988 - Kang; Hu ;   et al.
2017-11-02
Chamber Undercoat Preparation Method For Low Temperature Ald Films
App 20170314128 - Kang; Hu ;   et al.
2017-11-02
Single ALD cycle thickness control in multi-station substrate deposition systems
Grant 9,797,042 - Nowak , et al. October 24, 2
2017-10-24
Systems and methods for suppressing parasitic plasma and reducing within-wafer non-uniformity
Grant 9,793,096 - Kang , et al. October 17, 2
2017-10-17
Gapfill of variable aspect ratio features with a composite PEALD and PECVD method
Grant 9,793,110 - Kang , et al. October 17, 2
2017-10-17
Methods for depositing films on sensitive substrates
Grant 9,786,570 - Kang , et al. October 10, 2
2017-10-10
Chamber undercoat preparation method for low temperature ALD films
Grant 9,745,658 - Kang , et al. August 29, 2
2017-08-29
Tandem source activation for CVD of films
Grant 9,738,972 - LaVoie , et al. August 22, 2
2017-08-22
Variable Temperature Hardware And Methods For Reduction Of Wafer Backside Deposition
App 20170178898 - Kang; Hu ;   et al.
2017-06-22
Methods for depositing silicon oxide
Grant 9,685,320 - Kang , et al. June 20, 2
2017-06-20
Methods And Apparatuses For Showerhead Backside Parasitic Plasma Suppression In A Secondary Purge Enabled Ald System
App 20170167017 - LaVoie; Adrien ;   et al.
2017-06-15
Method for RF compensation in plasma assisted atomic layer deposition
Grant 9,624,578 - Qian , et al. April 18, 2
2017-04-18
Methods and apparatuses for showerhead backside parasitic plasma suppression in a secondary purge enabled ALD system
Grant 9,617,638 - LaVoie , et al. April 11, 2
2017-04-11
Dynamic Precursor Dosing For Atomic Layer Deposition
App 20170096735 - Kumar; Purushottam ;   et al.
2017-04-06
Multi-cycle Ald Process For Film Uniformity And Thickness Profile Modulation
App 20170009346 - Kumar; Purushottam ;   et al.
2017-01-12
Systems And Methods For Removing Particles From A Substrate Processing Chamber Using Rf Plasma Cycling And Purging
App 20170011893 - Kang; Hu ;   et al.
2017-01-12
Low Volume Showerhead With Faceplate Holes For Improved Flow Uniformity
App 20160340782 - Chandrasekharan; Ramesh ;   et al.
2016-11-24
Inhibitor Plasma Mediated Atomic Layer Deposition For Seamless Feature Fill
App 20160329238 - Tang; Wei ;   et al.
2016-11-10
Methods Of Modulating Residual Stress In Thin Films
App 20160329206 - Kumar; Purushottam ;   et al.
2016-11-10
Systems and methods for removing particles from a substrate processing chamber using RF plasma cycling and purging
Grant 9,478,408 - Kang , et al. October 25, 2
2016-10-25
Ultrathin Atomic Layer Deposition Film Accuracy Thickness Control
App 20160276148 - Qian; Jun ;   et al.
2016-09-22
Inhibitor plasma mediated atomic layer deposition for seamless feature fill
Grant 9,425,078 - Tang , et al. August 23, 2
2016-08-23
Hardware And Process For Film Uniformity Improvement
App 20160177443 - Kumar; Purushottam ;   et al.
2016-06-23
Methods For Depositing Silicon Oxide
App 20160163539 - Kang; Hu ;   et al.
2016-06-09
Methods For Depositing Films On Sensitive Substrates
App 20160155676 - Kang; Hu ;   et al.
2016-06-02
Sub-saturated atomic layer deposition and conformal film deposition
Grant 9,355,839 - Swaminathan , et al. May 31, 2
2016-05-31
Gapfill Of Variable Aspect Ratio Features With A Composite Peald And Pecvd Method
App 20160118246 - Kang; Hu ;   et al.
2016-04-28
Method And Apparatus For Rf Compensation In Plasma Assisted Atomic Layer Deposition
App 20160090650 - Qian; Jun ;   et al.
2016-03-31
Systems and Methods for Suppressing Parasitic Plasma and Reducing Within-Wafer Non-Uniformity
App 20160079036 - Kang; Hu ;   et al.
2016-03-17
Methods for depositing films on sensitive substrates
Grant 9,287,113 - Kang , et al. March 15, 2
2016-03-15
Fill On Demand Ampoule
App 20160052651 - Nguyen; Tuan ;   et al.
2016-02-25
Methods And Apparatuses For Stable Deposition Rate Control In Low Temperature Ald Systems By Showerhead Active Heating And/or Pedestal Cooling
App 20160056032 - Baldasseroni; Chloe ;   et al.
2016-02-25
Gapfill of variable aspect ratio features with a composite PEALD and PECVD method
Grant 9,257,274 - Kang , et al. February 9, 2
2016-02-09
Methods And Apparatuses For Showerhead Backside Parasitic Plasma Suppression In A Secondary Purge Enabled Ald System
App 20160035566 - LaVoie; Adrien ;   et al.
2016-02-04
Systems And Methods For Vapor Delivery
App 20160032453 - Qian; Jun ;   et al.
2016-02-04
Methods For Depositing Silicon Oxide
App 20160020092 - Kang; Hu ;   et al.
2016-01-21
Plasma activated conformal film deposition
Grant 9,230,800 - LaVoie , et al. January 5, 2
2016-01-05
Tandem Source Activation For Cvd Of Films
App 20150368797 - LaVoie; Adrien ;   et al.
2015-12-24
Systems And Methods For Removing Particles From A Substrate Processing Chamber Using Rf Plasma Cycling And Purging
App 20150354059 - Kang; Hu ;   et al.
2015-12-10
Single Ald Cycle Thickness Control In Multi-station Substrate Deposition Systems
App 20150332912 - Nowak; Romuald ;   et al.
2015-11-19
Low Volume Showerhead With Porous Baffle
App 20150315706 - Chandrasekharan; Ramesh ;   et al.
2015-11-05
Tandem source activation for cyclical deposition of films
Grant 9,145,607 - LaVoie , et al. September 29, 2
2015-09-29
Rf Cycle Purging To Reduce Surface Roughness In Metal Oxide And Metal Nitride Films
App 20150247238 - Pasquale; Frank L. ;   et al.
2015-09-03
Inhibitor Plasma Mediated Atomic Layer Deposition For Seamless Feature Fill
App 20150243545 - Tang; Wei ;   et al.
2015-08-27
Chamber Undercoat Preparation Method For Low Temperature Ald Films
App 20150147482 - Kang; Hu ;   et al.
2015-05-28
Tandem Source Activation For Cyclical Deposition Of Films
App 20150110968 - LaVoie; Adrien ;   et al.
2015-04-23
Systems For Modulating Step Coverage During Conformal Film Deposition
App 20150107513 - Swaminathan; Shankar ;   et al.
2015-04-23
Methods for modulating step coverage during conformal film deposition
Grant 8,956,704 - Swaminathan , et al. February 17, 2
2015-02-17
Plasma Activated Conformal Film Deposition
App 20140209562 - LaVoie; Adrien ;   et al.
2014-07-31
Methods For Depositing Films On Sensitive Substrates
App 20140141542 - Kang; Hu ;   et al.
2014-05-22
Plasma activated conformal film deposition
Grant 8,728,956 - LaVoie , et al. May 20, 2
2014-05-20
Sub-saturated Atomic Layer Deposition And Conformal Film Deposition
App 20140120737 - Swaminathan; Shankar ;   et al.
2014-05-01
Gapfill Of Variable Aspect Ratio Features With A Composite Peald And Pecvd Method
App 20140106574 - Kang; Hu ;   et al.
2014-04-17
Plasma-activated Deposition Of Conformal Films
App 20130319329 - Li; Ming ;   et al.
2013-12-05
Systems And Methods For Modulating Step Coverage During Conformal Film Deposition
App 20130309415 - Swaminathan; Shankar ;   et al.
2013-11-21
Plasma-activated deposition of conformal films
Grant 8,524,612 - Li , et al. September 3, 2
2013-09-03
Twisted .pi.-electron system chromophore compounds with very large molecular hyperpolarizabilities and related compositions and devices
Grant 8,349,222 - Marks , et al. January 8, 2
2013-01-08
Plasma-activated Deposition Of Conformal Films
App 20120077349 - Li; Ming ;   et al.
2012-03-29
Plasma-activated deposition of conformal films
Grant 8,101,531 - Li , et al. January 24, 2
2012-01-24
Twisted Pi-Electron System Chromophore Compounds with Very Large Molecular Hyperpolarizabilities and Related Compositions and Devices
App 20110278512 - Marks; Tobin J. ;   et al.
2011-11-17
Plasma Activated Conformal Film Deposition
App 20110256726 - LaVoie; Adrien ;   et al.
2011-10-20
Twisted .pi.-electron system chromophore compounds with very large molecular hyperpolarizabilities and related compositions and devices
Grant 7,968,016 - Marks , et al. June 28, 2
2011-06-28
Twisted .pi.-electron system chromophore compounds with very large molecular hyperpolarizabilities and related compositions and devices
Grant 7,824,582 - Marks , et al. November 2, 2
2010-11-02
Twisted Pi-electron System Chromophore Compounds With Very Large Molecular Hyperpolarizabilities And Related Compositions And Devices
App 20100273919 - Marks; Tobin J. ;   et al.
2010-10-28
Twisted pi-electron system chromophore compounds with very large molecular hyperpolarizabilities and related compositions and devices
App 20060237368 - Marks; Tobin J. ;   et al.
2006-10-26

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