Patent | Date |
---|
Substrate processing system with tandem source activation for CVD Grant 11,434,567 - LaVoie , et al. September 6, 2 | 2022-09-06 |
Gapfill Of Variable Aspect Ratio Features With A Composite Peald And Pecvd Method App 20220059348 - Kang; Hu ;   et al. | 2022-02-24 |
Dynamic Precursor Dosing For Atomic Layer Deposition App 20220033967 - Kumar; Purushottam ;   et al. | 2022-02-03 |
Dynamic precursor dosing for atomic layer deposition Grant 11,180,850 - Kumar , et al. November 23, 2 | 2021-11-23 |
Ultrathin Atomic Layer Deposition Film Accuracy Thickness Control App 20210343520 - Qian; Jun ;   et al. | 2021-11-04 |
Gapfill of variable aspect ratio features with a composite PEALD and PECVD method Grant 11,133,180 - Kang , et al. September 28, 2 | 2021-09-28 |
Systems and methods for suppressing parasitic plasma and reducing within-wafer non-uniformity Grant 11,127,567 - Kang , et al. September 21, 2 | 2021-09-21 |
Ultrathin atomic layer deposition film accuracy thickness control Grant 11,101,129 - Qian , et al. August 24, 2 | 2021-08-24 |
Systems And Methods For Suppressing Parasitic Plasma And Reducing Within-wafer Non-uniformity App 20200335304 - Kang; Hu ;   et al. | 2020-10-22 |
Methods for depositing films on sensitive substrates Grant 10,741,458 - Kang , et al. A | 2020-08-11 |
Low volume showerhead with porous baffle Grant 10,741,365 - Chandrasekharan , et al. A | 2020-08-11 |
Substrate Processing System With Tandem Source Activation For Cvd App 20200199747 - LAVOIE; Adrien ;   et al. | 2020-06-25 |
Systems and methods for suppressing parasitic plasma and reducing within-wafer non-uniformity Grant 10,665,429 - Kang , et al. | 2020-05-26 |
Ultrathin Atomic Layer Deposition Film Accuracy Thickness Control App 20200152446 - Qian; Jun ;   et al. | 2020-05-14 |
Multi-cycle Ald Process For Film Uniformity And Thickness Profile Modulation App 20200087786 - Kumar; Purushottam ;   et al. | 2020-03-19 |
Single ALD cycle thickness control in multi-station substrate deposition systems Grant 10,577,691 - Nowak , et al. | 2020-03-03 |
Tandem source activation for CVD of films Grant 10,577,688 - LaVoie , et al. | 2020-03-03 |
Ultrathin atomic layer deposition film accuracy thickness control Grant 10,566,187 - Qian , et al. Feb | 2020-02-18 |
Multi-cycle ALD process for film uniformity and thickness profile modulation Grant 10,526,701 - Kumar , et al. J | 2020-01-07 |
Hardware and process for film uniformity improvement Grant 10,526,700 - Kumar , et al. J | 2020-01-07 |
Ultrathin Atomic Layer Deposition Film Accuracy Thickness Control App 20190378710 - Qian; Jun ;   et al. | 2019-12-12 |
Gapfill Of Variable Aspect Ratio Features With A Composite Peald And Pecvd Method App 20190311897 - Kang; Hu ;   et al. | 2019-10-10 |
Methods and apparatuses for showerhead backside parasitic plasma suppression in a secondary purge enabled ALD system Grant 10,407,773 - LaVoie , et al. Sept | 2019-09-10 |
Low volume showerhead with faceplate holes for improved flow uniformity Grant 10,378,107 - Chandrasekharan , et al. A | 2019-08-13 |
Gapfill of variable aspect ratio features with a composite PEALD and PECVD method Grant 10,361,076 - Kang , et al. | 2019-07-23 |
Hardware And Process For Film Uniformity Improvement App 20190040528 - Kumar; Purushottam ;   et al. | 2019-02-07 |
Dynamic Precursor Dosing For Atomic Layer Deposition App 20190024233 - Kumar; Purushottam ;   et al. | 2019-01-24 |
Hardware and process for film uniformity improvement Grant 10,100,407 - Kumar , et al. October 16, 2 | 2018-10-16 |
Dynamic precursor dosing for atomic layer deposition Grant 10,094,018 - Kumar , et al. October 9, 2 | 2018-10-09 |
Methods For Depositing Films On Sensitive Substrates App 20180247875 - Kang; Hu ;   et al. | 2018-08-30 |
Methods for depositing films on sensitive substrates Grant 10,008,428 - Kang , et al. June 26, 2 | 2018-06-26 |
Systems and methods for vapor delivery in a substrate processing system Grant 9,970,108 - Qian , et al. May 15, 2 | 2018-05-15 |
Inhibitor plasma mediated atomic layer deposition for seamless feature fill Grant 9,966,299 - Tang , et al. May 8, 2 | 2018-05-08 |
Systems And Methods For Suppressing Parasitic Plasma And Reducing Within-wafer Non-uniformity App 20180068833 - Kang; Hu ;   et al. | 2018-03-08 |
Systems and methods for removing particles from a substrate processing chamber using RF plasma cycling and purging Grant 9,899,195 - Kang , et al. February 20, 2 | 2018-02-20 |
Variable temperature hardware and methods for reduction of wafer backside deposition Grant 9,870,917 - Kang , et al. January 16, 2 | 2018-01-16 |
Single Ald Cycle Thickness Control In Multi-station Substrate Deposition Systems App 20180010250 - Nowak; Romuald ;   et al. | 2018-01-11 |
Dynamic Precursor Dosing For Atomic Layer Deposition App 20170362705 - Kumar; Purushottam ;   et al. | 2017-12-21 |
Tandem Source Activation For Cvd Of Films App 20170327947 - LaVoie; Adrien ;   et al. | 2017-11-16 |
Gapfill Of Variable Aspect Ratio Features With A Composite Peald And Pecvd Method App 20170323786 - Kang; Hu ;   et al. | 2017-11-09 |
Methods For Depositing Films On Sensitive Substrates App 20170316988 - Kang; Hu ;   et al. | 2017-11-02 |
Chamber Undercoat Preparation Method For Low Temperature Ald Films App 20170314128 - Kang; Hu ;   et al. | 2017-11-02 |
Single ALD cycle thickness control in multi-station substrate deposition systems Grant 9,797,042 - Nowak , et al. October 24, 2 | 2017-10-24 |
Systems and methods for suppressing parasitic plasma and reducing within-wafer non-uniformity Grant 9,793,096 - Kang , et al. October 17, 2 | 2017-10-17 |
Gapfill of variable aspect ratio features with a composite PEALD and PECVD method Grant 9,793,110 - Kang , et al. October 17, 2 | 2017-10-17 |
Methods for depositing films on sensitive substrates Grant 9,786,570 - Kang , et al. October 10, 2 | 2017-10-10 |
Chamber undercoat preparation method for low temperature ALD films Grant 9,745,658 - Kang , et al. August 29, 2 | 2017-08-29 |
Tandem source activation for CVD of films Grant 9,738,972 - LaVoie , et al. August 22, 2 | 2017-08-22 |
Variable Temperature Hardware And Methods For Reduction Of Wafer Backside Deposition App 20170178898 - Kang; Hu ;   et al. | 2017-06-22 |
Methods for depositing silicon oxide Grant 9,685,320 - Kang , et al. June 20, 2 | 2017-06-20 |
Methods And Apparatuses For Showerhead Backside Parasitic Plasma Suppression In A Secondary Purge Enabled Ald System App 20170167017 - LaVoie; Adrien ;   et al. | 2017-06-15 |
Method for RF compensation in plasma assisted atomic layer deposition Grant 9,624,578 - Qian , et al. April 18, 2 | 2017-04-18 |
Methods and apparatuses for showerhead backside parasitic plasma suppression in a secondary purge enabled ALD system Grant 9,617,638 - LaVoie , et al. April 11, 2 | 2017-04-11 |
Dynamic Precursor Dosing For Atomic Layer Deposition App 20170096735 - Kumar; Purushottam ;   et al. | 2017-04-06 |
Multi-cycle Ald Process For Film Uniformity And Thickness Profile Modulation App 20170009346 - Kumar; Purushottam ;   et al. | 2017-01-12 |
Systems And Methods For Removing Particles From A Substrate Processing Chamber Using Rf Plasma Cycling And Purging App 20170011893 - Kang; Hu ;   et al. | 2017-01-12 |
Low Volume Showerhead With Faceplate Holes For Improved Flow Uniformity App 20160340782 - Chandrasekharan; Ramesh ;   et al. | 2016-11-24 |
Inhibitor Plasma Mediated Atomic Layer Deposition For Seamless Feature Fill App 20160329238 - Tang; Wei ;   et al. | 2016-11-10 |
Methods Of Modulating Residual Stress In Thin Films App 20160329206 - Kumar; Purushottam ;   et al. | 2016-11-10 |
Systems and methods for removing particles from a substrate processing chamber using RF plasma cycling and purging Grant 9,478,408 - Kang , et al. October 25, 2 | 2016-10-25 |
Ultrathin Atomic Layer Deposition Film Accuracy Thickness Control App 20160276148 - Qian; Jun ;   et al. | 2016-09-22 |
Inhibitor plasma mediated atomic layer deposition for seamless feature fill Grant 9,425,078 - Tang , et al. August 23, 2 | 2016-08-23 |
Hardware And Process For Film Uniformity Improvement App 20160177443 - Kumar; Purushottam ;   et al. | 2016-06-23 |
Methods For Depositing Silicon Oxide App 20160163539 - Kang; Hu ;   et al. | 2016-06-09 |
Methods For Depositing Films On Sensitive Substrates App 20160155676 - Kang; Hu ;   et al. | 2016-06-02 |
Sub-saturated atomic layer deposition and conformal film deposition Grant 9,355,839 - Swaminathan , et al. May 31, 2 | 2016-05-31 |
Gapfill Of Variable Aspect Ratio Features With A Composite Peald And Pecvd Method App 20160118246 - Kang; Hu ;   et al. | 2016-04-28 |
Method And Apparatus For Rf Compensation In Plasma Assisted Atomic Layer Deposition App 20160090650 - Qian; Jun ;   et al. | 2016-03-31 |
Systems and Methods for Suppressing Parasitic Plasma and Reducing Within-Wafer Non-Uniformity App 20160079036 - Kang; Hu ;   et al. | 2016-03-17 |
Methods for depositing films on sensitive substrates Grant 9,287,113 - Kang , et al. March 15, 2 | 2016-03-15 |
Fill On Demand Ampoule App 20160052651 - Nguyen; Tuan ;   et al. | 2016-02-25 |
Methods And Apparatuses For Stable Deposition Rate Control In Low Temperature Ald Systems By Showerhead Active Heating And/or Pedestal Cooling App 20160056032 - Baldasseroni; Chloe ;   et al. | 2016-02-25 |
Gapfill of variable aspect ratio features with a composite PEALD and PECVD method Grant 9,257,274 - Kang , et al. February 9, 2 | 2016-02-09 |
Methods And Apparatuses For Showerhead Backside Parasitic Plasma Suppression In A Secondary Purge Enabled Ald System App 20160035566 - LaVoie; Adrien ;   et al. | 2016-02-04 |
Systems And Methods For Vapor Delivery App 20160032453 - Qian; Jun ;   et al. | 2016-02-04 |
Methods For Depositing Silicon Oxide App 20160020092 - Kang; Hu ;   et al. | 2016-01-21 |
Plasma activated conformal film deposition Grant 9,230,800 - LaVoie , et al. January 5, 2 | 2016-01-05 |
Tandem Source Activation For Cvd Of Films App 20150368797 - LaVoie; Adrien ;   et al. | 2015-12-24 |
Systems And Methods For Removing Particles From A Substrate Processing Chamber Using Rf Plasma Cycling And Purging App 20150354059 - Kang; Hu ;   et al. | 2015-12-10 |
Single Ald Cycle Thickness Control In Multi-station Substrate Deposition Systems App 20150332912 - Nowak; Romuald ;   et al. | 2015-11-19 |
Low Volume Showerhead With Porous Baffle App 20150315706 - Chandrasekharan; Ramesh ;   et al. | 2015-11-05 |
Tandem source activation for cyclical deposition of films Grant 9,145,607 - LaVoie , et al. September 29, 2 | 2015-09-29 |
Rf Cycle Purging To Reduce Surface Roughness In Metal Oxide And Metal Nitride Films App 20150247238 - Pasquale; Frank L. ;   et al. | 2015-09-03 |
Inhibitor Plasma Mediated Atomic Layer Deposition For Seamless Feature Fill App 20150243545 - Tang; Wei ;   et al. | 2015-08-27 |
Chamber Undercoat Preparation Method For Low Temperature Ald Films App 20150147482 - Kang; Hu ;   et al. | 2015-05-28 |
Tandem Source Activation For Cyclical Deposition Of Films App 20150110968 - LaVoie; Adrien ;   et al. | 2015-04-23 |
Systems For Modulating Step Coverage During Conformal Film Deposition App 20150107513 - Swaminathan; Shankar ;   et al. | 2015-04-23 |
Methods for modulating step coverage during conformal film deposition Grant 8,956,704 - Swaminathan , et al. February 17, 2 | 2015-02-17 |
Plasma Activated Conformal Film Deposition App 20140209562 - LaVoie; Adrien ;   et al. | 2014-07-31 |
Methods For Depositing Films On Sensitive Substrates App 20140141542 - Kang; Hu ;   et al. | 2014-05-22 |
Plasma activated conformal film deposition Grant 8,728,956 - LaVoie , et al. May 20, 2 | 2014-05-20 |
Sub-saturated Atomic Layer Deposition And Conformal Film Deposition App 20140120737 - Swaminathan; Shankar ;   et al. | 2014-05-01 |
Gapfill Of Variable Aspect Ratio Features With A Composite Peald And Pecvd Method App 20140106574 - Kang; Hu ;   et al. | 2014-04-17 |
Plasma-activated Deposition Of Conformal Films App 20130319329 - Li; Ming ;   et al. | 2013-12-05 |
Systems And Methods For Modulating Step Coverage During Conformal Film Deposition App 20130309415 - Swaminathan; Shankar ;   et al. | 2013-11-21 |
Plasma-activated deposition of conformal films Grant 8,524,612 - Li , et al. September 3, 2 | 2013-09-03 |
Twisted .pi.-electron system chromophore compounds with very large molecular hyperpolarizabilities and related compositions and devices Grant 8,349,222 - Marks , et al. January 8, 2 | 2013-01-08 |
Plasma-activated Deposition Of Conformal Films App 20120077349 - Li; Ming ;   et al. | 2012-03-29 |
Plasma-activated deposition of conformal films Grant 8,101,531 - Li , et al. January 24, 2 | 2012-01-24 |
Twisted Pi-Electron System Chromophore Compounds with Very Large Molecular Hyperpolarizabilities and Related Compositions and Devices App 20110278512 - Marks; Tobin J. ;   et al. | 2011-11-17 |
Plasma Activated Conformal Film Deposition App 20110256726 - LaVoie; Adrien ;   et al. | 2011-10-20 |
Twisted .pi.-electron system chromophore compounds with very large molecular hyperpolarizabilities and related compositions and devices Grant 7,968,016 - Marks , et al. June 28, 2 | 2011-06-28 |
Twisted .pi.-electron system chromophore compounds with very large molecular hyperpolarizabilities and related compositions and devices Grant 7,824,582 - Marks , et al. November 2, 2 | 2010-11-02 |
Twisted Pi-electron System Chromophore Compounds With Very Large Molecular Hyperpolarizabilities And Related Compositions And Devices App 20100273919 - Marks; Tobin J. ;   et al. | 2010-10-28 |
Twisted pi-electron system chromophore compounds with very large molecular hyperpolarizabilities and related compositions and devices App 20060237368 - Marks; Tobin J. ;   et al. | 2006-10-26 |