loadpatents
Patent applications and USPTO patent grants for Kanemura; Rui.The latest application filed is for "substrate processing apparatus".
Patent | Date |
---|---|
Film forming method and substrate processing apparatus Grant 11,251,034 - Hayashi , et al. February 15, 2 | 2022-02-15 |
Method for forming semiconductor film and film forming device Grant 11,114,297 - Kanemura , et al. September 7, 2 | 2021-09-07 |
Film forming method and film forming apparatus Grant 11,101,131 - Kanemura , et al. August 24, 2 | 2021-08-24 |
Substrate Processing Apparatus App 20200312677 - TAKEZAWA; Yoshihiro ;   et al. | 2020-10-01 |
Film Forming Method and Film Forming Apparatus App 20200308696 - KANEMURA; Rui ;   et al. | 2020-10-01 |
Exhaust Device, Processing System, And Processing Method App 20200248305 - Kind Code | 2020-08-06 |
Method for Forming Semiconductor Film and Film Forming Device App 20200168455 - KANEMURA; Rui ;   et al. | 2020-05-28 |
Film Forming Method And Film Forming Apparatus App 20200058504 - KANEMURA; Rui ;   et al. | 2020-02-20 |
Film Forming Method And Film Forming Apparatus App 20200058499 - KANEMURA; Rui ;   et al. | 2020-02-20 |
Film Forming Method And Substrate Processing Apparatus App 20190259599 - HAYASHI; Hiroyuki ;   et al. | 2019-08-22 |
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