KANEKO; Hideo

Patent Applications and Registrations

Patent applications and USPTO patent grants for KANEKO; Hideo.The latest application filed is for "reflective mask blank and reflective mask".

Company Profile

5.65.66

KANEKO; Hideo - Joetsu-shi JP
Kaneko; Hideo - Joetsu JP
Kaneko; Hideo - Niigata JP
Kaneko; Hideo - Jyoetsu JP
- Joetsu JP
KANEKO; Hideo - Tokyo JP
Kaneko; Hideo - Niigata-ken JP
Kaneko; Hideo - Gifu JP
Kaneko; Hideo - Nakakubiki-gun JP
Kaneko; Hideo - Kubiki-mura JP
Kaneko; Hideo - Kyoto JP
Kaneko, Hideo - Kobe-shi JP
Kaneko; Hideo - Kanagawa-ken JP
Kaneko; Hideo - Yokohama JP
Kaneko; Hideo - Kobe JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Reflective Mask Blank, And Method For Manufacturing Thereof App 20220283491 - TERASAWA; Tsuneo ; et al.	2022-09-08
Reflective Mask Blank And Reflective Mask App 20220283492 - MIMURA; Shohei ; et al.	2022-09-08
Method of manufacturing reflective mask blank, reflective mask blank, and method of manufacturing reflective mask Grant 11,415,874 - Terasawa , et al. August 16, 2	2022-08-16
Photomask blank and method for preparing photomask Grant 11,327,393 - Kosaka , et al. May 10, 2	2022-05-10
Substrate With Multilayer Reflection Film For Euv Mask Blank, Manufacturing Method Thereof, And Euv Mask Blank App 20220075254 - INAZUKI; Yukio ; et al.	2022-03-10
Substrate With Multilayer Reflection Film For Euv Mask Blank, Manufacturing Method Thereof, And Euv Mask Blank App 20220075255 - INAZUKI; Yukio ; et al.	2022-03-10
Substrate Defect Inspection Method And Substrate Defect Inspection Apparatus App 20220065797 - TERASAWA; Tsuneo ; et al.	2022-03-03
Photomask Blank, And Manufacturing Method Thereof App 20210405520 - SASAMOTO; Kouhei ; et al.	2021-12-30
Substrate with Film for Reflective Mask Blank, and Reflective Mask Blank App 20210333702 - TERASAWA; Tsuneo ; et al.	2021-10-28
Photomask blank, photomask blank making method, and photomask making method Grant 11,073,756 - Kosaka , et al. July 27, 2	2021-07-27
Halftone phase shift mask blank and halftone phase shift mask Grant 10,989,999 - Inazuki , et al. April 27, 2	2021-04-27
Method Of Manufacturing Reflective Mask Blank, Reflective Mask Blank, And Method Of Manufacturing Reflective Mask App 20210080819 - TERASAWA; Tsuneo ; et al.	2021-03-18
Halftone phase shift photomask blank, making method, and halftone phase shift photomask Grant 10,859,904 - Kosaka , et al. December 8, 2	2020-12-08
Photomask Blank And Method For Preparing Photomask App 20200264502 - KOSAKA; Takuro ; et al.	2020-08-20
Halftone Phase Shift Photomask Blank, Making Method, And Halftone Phase Shift Photomask App 20200249561 - Kind Code	2020-08-06
Photomask blank and method for preparing photomask Grant 10,678,125 - Kosaka , et al.	2020-06-09
Halftone phase shift photomask blank, making method, and halftone phase shift photomask Grant 10,670,957 - Kosaka , et al.	2020-06-02
Photomask blank, method for manufacturing photomask, and mask pattern formation method Grant 10,585,345 - Irie , et al.	2020-03-10
Halftone Phase Shift Mask Blank And Halftone Phase Shift Mask App 20200026181 - INAZUKI; Yukio ; et al.	2020-01-23
Mask blank and making method Grant 10,488,750 - Inazuki , et al. Nov	2019-11-26
Halftone phase shift mask blank and halftone phase shift mask Grant 10,466,583 - Inazuki , et al. No	2019-11-05
Halftone phase shift photomask blank and making method Grant 10,459,333 - Kosaka , et al. Oc	2019-10-29
Halftone phase shift mask blank and halftone phase shift mask Grant 10,372,030 - Sasamoto , et al.	2019-08-06
Halftone Phase Shift Photomask Blank And Making Method App 20190064650 - KOSAKA; Takuro ; et al.	2019-02-28
Photomask Blank, Photomask Blank Making Method, And Photomask Making Method App 20190033703 - KOSAKA; Takuro ; et al.	2019-01-31
Halftone phase shift photomask blank and making method Grant 10,146,122 - Kosaka , et al. De	2018-12-04
Photomask Blank, Method For Manufacturing Photomask, And Mask Pattern Formation Method App 20180267398 - IRIE; Shigeo ; et al.	2018-09-20
Halftone Phase Shift Mask Blank And Halftone Phase Shift Mask App 20180088457 - INAZUKI; Yukio ; et al.	2018-03-29
Halftone Phase Shift Photomask Blank, Making Method, And Halftone Phase Shift Photomask App 20180088456 - KOSAKA; Takuro ; et al.	2018-03-29
Silicon target for sputtering film formation and method for forming silicon-containing thin film Grant 9,812,300 - Yoshikawa , et al. November 7, 2	2017-11-07
Designing of photomask blank and photomask blank Grant 9,798,229 - Sasamoto , et al. October 24, 2	2017-10-24
Photomask Blank And Method For Preparing Photomask App 20170255095 - KOSAKA; Takuro ; et al.	2017-09-07
Halftone Phase Shift Photomask Blank And Making Method App 20170212417 - KOSAKA; Takuro ; et al.	2017-07-27
Photomask blank and method for manufacturing photomask blank Grant 9,709,885 - Inazuki , et al. July 18, 2	2017-07-18
Halftone phase shift photomask blank and making method Grant 9,645,485 - Kosaka , et al. May 9, 2	2017-05-09
Photomask Blank And Method For Manufacturing Photomask Blank App 20170023855 - INAZUKI; Yukio ; et al.	2017-01-26
Photomask blank Grant 9,541,823 - Sasamoto , et al. January 10, 2	2017-01-10
Photomask blank and method for manufacturing photomask blank Grant 9,488,906 - Inazuki , et al. November 8, 2	2016-11-08
Halftone Phase Shift Mask Blank And Halftone Phase Shift Mask App 20160291452 - SASAMOTO; Kouhei ; et al.	2016-10-06
Mask Blank And Making Method App 20160266485 - INAZUKI; Yukio ; et al.	2016-09-15
Method for manufacturing photomask blank Grant 9,400,422 - Yoshii , et al. July 26, 2	2016-07-26
Halftone phase shift photomask blank, halftone phase shift photomask and pattern exposure method Grant 9,366,951 - Inazuki , et al. June 14, 2	2016-06-14
Halftone Phase Shift Photomask Blank And Making Method App 20160033858 - KOSAKA; Takuro ; et al.	2016-02-04
Designing Of Photomask Blank And Photomask Blank App 20160033859 - SASAMOTO; Kouhei ; et al.	2016-02-04
Photomask making method, photomask blank and dry etching method Grant 9,164,374 - Igarashi , et al. October 20, 2	2015-10-20
Photomask Blank App 20150160549 - SASAMOTO; Kouhei ; et al.	2015-06-11
Halftone Phase Shift Photomask Blank, Halftone Phase Shift Photomask And Pattern Exposure Method App 20150125785 - INAZUKI; Yukio ; et al.	2015-05-07
Evaluation of etching conditions for pattern-forming film Grant 8,992,788 - Igarashi , et al. March 31, 2	2015-03-31
Method For Manufacturing Photomask Blank App 20150086909 - YOSHII; Takashi ; et al.	2015-03-26
Photomask Blank And Method For Manufacturing Photomask Blank App 20150086908 - INAZUKI; Yukio ; et al.	2015-03-26
Binary photomask blank and binary photomask making method Grant 8,980,503 - Yoshikawa , et al. March 17, 2	2015-03-17
Etching method and photomask blank processing method Grant 08920666 -	2014-12-30
Etching method and photomask blank processing method Grant 8,920,666 - Igarashi , et al. December 30, 2	2014-12-30
Silicon Target For Sputtering Film Formation And Method For Forming Silicon-containing Thin Film App 20140318948 - YOSHIKAWA; Hiroki ; et al.	2014-10-30
Photomask blank, processing method, and etching method Grant 8,858,814 - Watanabe , et al. October 14, 2	2014-10-14
Light pattern exposure method, halftone phase shift mask, and halftone phase shift mask blank Grant 8,753,786 - Yoshikawa , et al. June 17, 2	2014-06-17
Light pattern exposure method, photomask, and photomask blank Grant 8,753,787 - Yoshikawa , et al. June 17, 2	2014-06-17
Sputtering Target Material, Silicon-containing Film Forming Method, And Photomask Blank App 20140110256 - KANEKO; Hideo ; et al.	2014-04-24
Sputtering target material, silicon-containing film forming method, and photomask blank Grant 8,647,795 - Kaneko , et al. February 11, 2	2014-02-11
Photomask blank and making method, photomask, light pattern exposure method, and design method of transition metal/silicon base material film Grant 8,475,978 - Yoshikawa , et al. July 2, 2	2013-07-02
Evaluation Of Etching Conditions For Pattern-forming Film App 20130126471 - IGARASHI; Shinichi ; et al.	2013-05-23
Light Pattern Exposure Method, Halftone Phase Shift Mask, And Halftone Phase Shift Mask Blank App 20130130159 - YOSHIKAWA; Hiroki ; et al.	2013-05-23
Light Pattern Exposure Method, Photomask, And Photomask Blank App 20130130160 - YOSHIKAWA; Hiroki ; et al.	2013-05-23
Evaluation For Etch Mask Film App 20130132014 - IGARASHI; Shinichi ; et al.	2013-05-23
Method for inspecting and judging photomask blank or intermediate thereof Grant 8,417,018 - Inazuki , et al. April 9, 2	2013-04-09
Photomask Making Method, Photomask Blank And Dry Etching Method App 20130034806 - IGARASHI; Shinichi ; et al.	2013-02-07
Copper Alloy Wrought Material, Copper Alloy Part, And Method Of Producing A Copper Alloy Wrought Material App 20130028784 - TAKAHASHI; Isao ; et al.	2013-01-31
Photomask making method Grant 8,309,277 - Igarashi , et al. November 13, 2	2012-11-13
Photomask making method, photomask blank and dry etching method Grant 8,304,146 - Igarashi , et al. November 6, 2	2012-11-06
Silicon Target For Sputtering Film Formation And Method For Forming Silicon-containing Thin Film App 20120138453 - YOSHIKAWA; Hiroki ; et al.	2012-06-07
Method for inspecting photomask blank or intermediate thereof, method for determining dosage of high-energy radiation, and method for manufacturing photomask blank Grant 8,168,351 - Inazuki , et al. May 1, 2	2012-05-01
Sputtering Target Material, Silicon-containing Film Forming Method, And Photomask Blank App 20120100467 - KANEKO; Hideo ; et al.	2012-04-26
Photomask blank and photomask Grant 8,148,036 - Inazuki , et al. April 3, 2	2012-04-03
Photomask Blank And Making Method, Photomask, Light Pattern Exposure Method, And Design Method Of Transition Metal/silicon Base Material Film App 20120064438 - YOSHIKAWA; Hiroki ; et al.	2012-03-15
Binary Photomask Blank And Binary Photomask Making Method App 20120034551 - Yoshikawa; Hiroki ; et al.	2012-02-09
Photomask Making Method App 20100316942 - IGARASHI; Shinichi ; et al.	2010-12-16
Etching Method And Photomask Blank Processing Method App 20100291478 - IGARASHI; Shinichi ; et al.	2010-11-18
Method For Inspecting And Judging Photomask Blank Or Intermediate Thereof App 20100246932 - INAZUKI; Yukio ; et al.	2010-09-30
Method For Inspecting Photomask Blank Or Intermediate Thereof, Method For Determining Dosage Of High-energy Radiation, And Method For Manufacturing Photomask Blank App 20100248091 - INAZUKI; Yukio ; et al.	2010-09-30
Photomask Blank And Photomask App 20100248090 - INAZUKI; Yukio ; et al.	2010-09-30
Photomask Making Method, Photomask Blank And Dry Etching Method App 20100176087 - Igarashi; Shinichi ; et al.	2010-07-15
Photomask blank, photomask, and method of manufacture Grant 7,736,824 - Yoshikawa , et al. June 15, 2	2010-06-15
Fabrication method of photomask-blank Grant 7,632,609 - Fukushima , et al. December 15, 2	2009-12-15
Preparation of photomask blank and photomask Grant 7,514,185 - Fukushima , et al. April 7, 2	2009-04-07
Photomask Blank, Photomask, And Method Of Manufacture App 20080090159 - Yoshikawa; Hiroki ; et al.	2008-04-17
Method of producing phase shift mask blank, method of producing phase shift mask, phase shift mask blank, and phase shift mask Grant 7,344,806 - Yoshikawa , et al. March 18, 2	2008-03-18
Photomask blank, photomask, and method of manufacture Grant 7,329,474 - Yoshikawa , et al. February 12, 2	2008-02-12
Photo mask blank and photo mask Grant 7,264,908 - Kaneko , et al. September 4, 2	2007-09-04
Method for detecting gene specifying allergic predisposition App 20070148642 - Kondo; Naomi ; et al.	2007-06-28
Fabrication method of photomask-blank App 20070092807 - Fukushima; Noriyasu ; et al.	2007-04-26
Methods of manufacturing photomask blank and photomask Grant 7,195,846 - Kaneko , et al. March 27, 2	2007-03-27
Phase shift mask blank, phase shift mask, and method of manufacture Grant 7,179,567 - Inazuki , et al. February 20, 2	2007-02-20
Phase shift mask blank and method of manufacture Grant 7,037,625 - Kaneko , et al. May 2, 2	2006-05-02
Preparation of photomask blank and photomask App 20050260505 - Fukushima, Noriyasu ; et al.	2005-11-24
Photo mask blank and photo mask App 20040229136 - Kaneko, Hideo ; et al.	2004-11-18
Photomask blank, photomask, and method of manufacture App 20040197679 - Yoshikawa, Hiroki ; et al.	2004-10-07
Method of producing phase shift mask blank, method of producing phase shift mask, phase shift mask blank, and phase shift mask App 20040191646 - Yoshikawa, Hiroki ; et al.	2004-09-30
Methods of manufacturing photomask blank and photomask App 20040110073 - Kaneko, Hideo ; et al.	2004-06-10
Photomask blank, photomask and method of manufacture Grant 6,733,930 - Shinagawa , et al. May 11, 2	2004-05-11
Photomask blank and photomask Grant 6,727,027 - Tsukamoto , et al. April 27, 2	2004-04-27
Phase shift mask blank, phase shift mask, and method of manufacture App 20030235767 - Inazuki, Yukio ; et al.	2003-12-25
Magnetron sputtering system and photomask blank production method based on the same Grant 6,666,957 - Watanabe , et al. December 23, 2	2003-12-23
Phase shift mask blank, phase shift mask, and methods of manufacture Grant 6,641,958 - Inazuki , et al. November 4, 2	2003-11-04
Method for safety evaluation of chemical compound using recombinant yeast expressing human cytochrome P450 Grant 6,620,593 - Hayashi , et al. September 16, 2	2003-09-16
Phase shift mask blank, phase shift mask, and method of manufacture App 20030025216 - Inazuki, Yukio ; et al.	2003-02-06
Phase shift mask blank and method of manufacture App 20030008219 - Kaneko, Hideo ; et al.	2003-01-09
Photomask blank, photomask and method of manufacture Grant 6,503,669 - Kaneko , et al. January 7, 2	2003-01-07
Triphenylmethane derivatives and use thereof App 20020156301 - Kaneko, Hideo ; et al.	2002-10-24
Photomask blank, photomask and method of manufacture App 20020136966 - Shinagawa, Tsutomu ; et al.	2002-09-26
Magnetron sputtering system and photomask blank production method based on the same App 20020125127 - Watanabe, Masataka ; et al.	2002-09-12
Photomask blank and photomask App 20020115003 - Tsukamoto, Tetsushi ; et al.	2002-08-22
Phase shift mask blank, phase shift mask, and methods of manufacture App 20020039690 - Inazuki, Yukio ; et al.	2002-04-04
Phase shift mask blank, phase shift mask, and methods of manufacture App 20020025478 - Inazuki, Yukio ; et al.	2002-02-28
Photomask blank and photomask App 20010044054 - Kaneko, Hideo ; et al.	2001-11-22
Phase shift mask and method of manufacture App 20010028982 - Okazaki, Satoshi ; et al.	2001-10-11
Photomask blank, photomask and method of manufacture App 20010019801 - Kaneko, Hideo ; et al.	2001-09-06
Phase shift mask blank, phase shift mask, and method of manufacture App 20010007731 - Inazuki, Yukio ; et al.	2001-07-12
Magnetic recording medium Grant 5,591,502 - Kaneko , et al. January 7, 1	1997-01-07
Magnetic recording medium Grant 5,582,897 - Kaneko , et al. December 10, 1	1996-12-10
Fuel cell power generation system Grant 4,923,768 - Kaneko , et al. May 8, 1	1990-05-08
Iron-chromium-base spinodal decomposition-type magnetic (hard or semi-hard) alloy Grant 4,695,333 - Inoue , et al. September 22, 1	1987-09-22
Labor saving apparatus for continuous casting facility Grant 4,632,173 - Kaneko , et al. December 30, 1	1986-12-30
Horizontal continuous casting installation Grant 4,601,327 - Kaneko , et al. July 22, 1	1986-07-22
Horizontal continuous casting method Grant 4,495,982 - Kaneko , et al. January 29, 1	1985-01-29
High-permeability magnetic material Grant 4,146,391 - Inoue , et al. March 27, 1	1979-03-27
Method Of Making A Magnetic Body Grant 3,860,458 - Inoue , et al. January 14, 1	1975-01-14

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