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name:-0.020401000976562
name:-0.0093770027160645
name:-0.00055098533630371
Kanazawa; Hidehiro Patent Filings

Kanazawa; Hidehiro

Patent Applications and Registrations

Patent applications and USPTO patent grants for Kanazawa; Hidehiro.The latest application filed is for "multilayer film reflector".

Company Profile
0.9.15
  • Kanazawa; Hidehiro - Tokyo JP
  • Kanazawa; Hidehiro - Kanagawa JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Multilayer Film Reflector
App 20090252977 - Matsumoto; Seiken ;   et al.
2009-10-08
Optical Element For X-ray
App 20090148695 - Miura; Takayuki ;   et al.
2009-06-11
Multilayer film reflector for soft X-rays and manufacturing method thereof
Grant 7,342,715 - Imai , et al. March 11, 2
2008-03-11
Optical thin film and mirror using the same
Grant 7,286,637 - Imai , et al. October 23, 2
2007-10-23
Optical Element Having Multilayer Film, And Exposure Apparatus Having The Optical Element
App 20070171327 - Matsumodo; Seiken ;   et al.
2007-07-26
Sputtering apparatus
Grant 7,229,532 - Ando , et al. June 12, 2
2007-06-12
X-ray multi-layer mirror and x-ray exposure apparatus
Grant 7,162,009 - Kanazawa , et al. January 9, 2
2007-01-09
Optical thin film and mirror using the same
App 20060221474 - Imai; Kyoko ;   et al.
2006-10-05
Optical element with antireflection film
Grant 7,116,473 - Kanazawa , et al. October 3, 2
2006-10-03
Optical element with antireflection film
App 20060109545 - Kanazawa; Hidehiro ;   et al.
2006-05-25
Method for forming thin films
Grant 7,041,391 - Ando , et al. May 9, 2
2006-05-09
Antireflection film and optical element having the same
Grant 7,035,000 - Kanazawa , et al. April 25, 2
2006-04-25
Antireflection film and optical element having the same
App 20050219684 - Kanazawa, Hidehiro ;   et al.
2005-10-06
Multilayer film reflector for soft X-rays and manufacturing method thereof
App 20050213199 - Imai, Kyoko ;   et al.
2005-09-29
Antireflection film and optical element having the same
Grant 6,947,209 - Kanazawa , et al. September 20, 2
2005-09-20
X-ray total reflection mirror and X-ray exposure apparatus
App 20050117233 - Kanazawa, Hidehiro ;   et al.
2005-06-02
X-ray multi-layer mirror and x-ray exposure apparatus
App 20050031071 - Kanazawa, Hidehiro ;   et al.
2005-02-10
Sputtering apparatus
App 20040216992 - Ando, Kenji ;   et al.
2004-11-04
Antireflection film and optical element having the same
App 20030218798 - Kanazawa, Hidehiro ;   et al.
2003-11-27
Optical element for use in exposure apparatus and rinsing method therefor
App 20020148981 - Biro, Ryuji ;   et al.
2002-10-17
Method for forming thin films
App 20020139661 - Ando, Kenji ;   et al.
2002-10-03
Thin film production process and optical device
Grant 6,458,253 - Ando , et al. October 1, 2
2002-10-01
Thin film production process and optical device
App 20010031543 - Ando, Kenji ;   et al.
2001-10-18
Method For Forming Thin Films
App 20010008207 - ANDO, KENJI ;   et al.
2001-07-19

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