| Patent | Date |
|---|
Metal Cut Patterning And Etching To Minimize Interlayer Dielectric Layer Loss
App 20220005698 - Chung; Kisup ; et al. | 2022-01-06 |
Metal cut patterning and etching to minimize interlayer dielectric layer loss
Grant 11,133,189 - Chung , et al. September 28, 2 | 2021-09-28 |
Multi-channel overlay metrology
Grant 11,054,250 - Muthinti , et al. July 6, 2 | 2021-07-06 |
FinFET gate cut after dummy gate removal
Grant 11,024,715 - Sporre , et al. June 1, 2 | 2021-06-01 |
Nanosheet single gate (SG) and extra gate (EG) field effect transistor (FET) co-integration
Grant 10,741,660 - Loubet , et al. A | 2020-08-11 |
Metal cut patterning and etching to minimize interlayer dielectric layer loss
Grant 10,734,234 - Chung , et al. | 2020-08-04 |
Finfet Gate Cut After Dummy Gate Removal
App 20200243648 - Sporre; John R. ; et al. | 2020-07-30 |
Gate cut in RMG
Grant 10,692,990 - Bao , et al. | 2020-06-23 |
Gate cut in RMG
Grant 10,644,129 - Bao , et al. | 2020-05-05 |
Gate cut using selective deposition to prevent oxide loss
Grant 10,622,482 - Greene , et al. | 2020-04-14 |
FinFET gate cut after dummy gate removal
Grant 10,600,868 - Sporre , et al. | 2020-03-24 |
Gate Cut In Rmg
App 20200044052 - Bao; Ruqiang ; et al. | 2020-02-06 |
Gate Cut In Rmg
App 20200044051 - Bao; Ruqiang ; et al. | 2020-02-06 |
Gate cut in RMG
Grant 10,553,700 - Bao , et al. Fe | 2020-02-04 |
Nanosheet Single Gate (sg) And Extra Gate (eg) Field Effect Transistor (fet) Co-integration
App 20190378906 - Loubet; Nicolas J. ; et al. | 2019-12-12 |
Gate cut in replacement metal gate process
Grant 10,504,798 - Xie , et al. Dec | 2019-12-10 |
Gate Cut In Rmg
App 20190371912 - Bao; Ruqiang ; et al. | 2019-12-05 |
Multi-channel Overlay Metrology
App 20190316900 - Muthinti; Gangadhara Raja ; et al. | 2019-10-17 |
Gate Cut Using Selective Deposition To Prevent Oxide Loss
App 20190259665 - Greene; Andrew M. ; et al. | 2019-08-22 |
Gate Cut In Replacement Metal Gate Process
App 20190252268 - Xie; Ruilong ; et al. | 2019-08-15 |
Gate cut using selective deposition to prevent oxide loss
Grant 10,347,540 - Greene , et al. July 9, 2 | 2019-07-09 |
Stoplayer
App 20190206864 - He; Hong ; et al. | 2019-07-04 |
Metal Cut Patterning And Etching To Minimize Interlayer Dielectric Layer Loss
App 20190198327 - Chung; Kisup ; et al. | 2019-06-27 |
Finfet Gate Cut After Dummy Gate Removal
App 20190189517 - Sporre; John R. ; et al. | 2019-06-20 |
Metal Cut Patterning And Etching To Minimize Interlayer Dielectric Layer Loss
App 20190189452 - Chung; Kisup ; et al. | 2019-06-20 |
Gate Cut Using Selective Deposition To Prevent Oxide Loss
App 20190189782 - Greene; Andrew M. ; et al. | 2019-06-20 |
FinFET gate cut after dummy gate removal
Grant 10,229,854 - Sporre , et al. | 2019-03-12 |
Phase shifted gas delivery for high throughput and cost effectiveness associated with atomic layer etching and atomic layer deposition
Grant 10,167,558 - Lie , et al. J | 2019-01-01 |
Stop Layer Through Ion Implantation For Etch Stop
App 20170148790 - HE; Hong ; et al. | 2017-05-25 |
Stop layer through ion implantation for etch stop
Grant 9,627,263 - He , et al. April 18, 2 | 2017-04-18 |
Advanced high-k gate stack patterning and structure containing a patterned high-k gate stack
Grant 7,820,552 - Kanakasabapathy , et al. October 26, 2 | 2010-10-26 |
ADVANCED HIGH-k GATE STACK PATTERNING AND STRUCTURE CONTAINING A PATTERNED HIGH-k GATE STACK
App 20080224238 - Kanakasabapathy; Siva ; et al. | 2008-09-18 |
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