Kanai; Saburo
Patent Applications and Registrations
Patent applications and USPTO patent grants for Kanai; Saburo.The latest application filed is for "plasma processing apparatus and plasma processing method".
Company Profile
0.17.29
- Kanai; Saburo - Hikari-shi JP
- Kanai; Saburo - Hikari JP
- Kanai; Saburo - Kudamatsu JP
Patent Activity
| Patent | Date |
|---|---|
| Plasma Processing Apparatus And Plasma Processing Method App 20100140224 - Kanai; Saburo ; et al. | 2010-06-10 |
| Plasma Processing Apparatus And Plasma Processing Method App 20090289035 - Kanai; Saburo ; et al. | 2009-11-26 |
| Plasma processing apparatus Grant 7,565,879 - Kanai , et al. July 28, 2 | 2009-07-28 |
| Wafer processing apparatus capable of controlling wafer temperature App 20070240825 - Kanno; Seiichiro ; et al. | 2007-10-18 |
| Plasma processing method Grant 7,208,422 - Kanai , et al. April 24, 2 | 2007-04-24 |
| Plasma treatment method App 20060060300 - Takahashi; Kazue ; et al. | 2006-03-23 |
| Wafer processing apparatus capable of controlling wafer temperature App 20060042757 - Kanno; Seiichiro ; et al. | 2006-03-02 |
| Plasma etching apparatus and plasma etching method App 20050236109 - Masuda, Toshio ; et al. | 2005-10-27 |
| Plasma processing apparatus App 20050064717 - Kanai, Saburo ; et al. | 2005-03-24 |
| Plasma processing method App 20050039683 - Kanai, Saburo ; et al. | 2005-02-24 |
| Plasma processing apparatus and method Grant 6,846,363 - Kazumi , et al. January 25, 2 | 2005-01-25 |
| Plasma processing apparatus and method Grant 6,833,051 - Kazumi , et al. December 21, 2 | 2004-12-21 |
| Plasma etching apparatus and plasma etching method Grant 6,815,365 - Masuda , et al. November 9, 2 | 2004-11-09 |
| Plasma etching apparatus App 20040045675 - Masuda, Toshio ; et al. | 2004-03-11 |
| Plasma etching apparatus and plasma etching method App 20040016508 - Masuda, Toshio ; et al. | 2004-01-29 |
| Plasma etching apparatus and plasma etching method App 20040009617 - Masuda, Toshio ; et al. | 2004-01-15 |
| Plasma etching apparatus App 20030203640 - Masuda, Toshio ; et al. | 2003-10-30 |
| Plasma treatment method App 20030060054 - Takahashi, Kazue ; et al. | 2003-03-27 |
| Semiconductor wafer processing apparatus and method App 20030029572 - Kanno, Seiichiro ; et al. | 2003-02-13 |
| Semiconductor Wafer Processing Apparatus And Method App 20030030960 - Kanno, Seiichiro ; et al. | 2003-02-13 |
| Plasma etching apparatus and plasma etching method App 20030024646 - Masuda, Toshio ; et al. | 2003-02-06 |
| Plasma processing apparatus and method App 20020134510 - Kazumi, Hideyuki ; et al. | 2002-09-26 |
| Plasma processing apparatus and method App 20020124963 - Kazumi, Hideyuki ; et al. | 2002-09-12 |
| Plasma Etching Apparatus And Plasma Etching Method App 20020119670 - MASUDA, TOSHIO ; et al. | 2002-08-29 |
| Plasma processing apparatus and method App 20020084035 - Kazumi, Hideyuki ; et al. | 2002-07-04 |
| Plasma etching apparatus and plasma etching method App 20020043338 - Masuda, Toshio ; et al. | 2002-04-18 |
| Plasma etching apparatus and plasma etching method App 20020042206 - Masuda, Toshio ; et al. | 2002-04-11 |
| Plasma Etching Apparatus And Plasma Etching Method App 20020005252 - MASUDA, TOSHIO ; et al. | 2002-01-17 |
| Plasma processing apparatus and method App 20010042595 - Kazumi, Hideyuki ; et al. | 2001-11-22 |
| Plasma processing apparatus and method App 20010040009 - Kazumi, Hideyuki ; et al. | 2001-11-15 |
| Plasma processing apparatus App 20010037857 - Kazumi, Hideyuki ; et al. | 2001-11-08 |
| Plasma processing apparatus and method App 20010037861 - Kazumi, Hideyuki ; et al. | 2001-11-08 |
| Electrostatic chuck, and method of and apparatus for processing sample using the chuck App 20010019472 - Kanno, Seiichiro ; et al. | 2001-09-06 |
| Electrostatically attracting electrode and a method of manufacture thereof App 20010009497 - Takahasi, Kazue ; et al. | 2001-07-26 |
| Plasma treatment device Grant 6,245,202 - Edamura , et al. June 12, 2 | 2001-06-12 |
| Vacuum treatment system and its stage Grant 6,235,146 - Kadotani , et al. May 22, 2 | 2001-05-22 |
| Plasma processing apparatus and method Grant 6,180,019 - Kazumi , et al. January 30, 2 | 2001-01-30 |
| Plasma processing apparatus and plasma processing method Grant 6,171,438 - Masuda , et al. January 9, 2 | 2001-01-09 |
| Electrostatic chuck, and method of and apparatus for processing sample Grant 5,946,184 - Kanno , et al. August 31, 1 | 1999-08-31 |
| Plasma processing apparatus and plasma processing method in which a part of the processing chamber is formed using a pre-fluorinated material of aluminum Grant 5,895,586 - Kaji , et al. April 20, 1 | 1999-04-20 |
| Plasma processing apparatus and plasma processing method Grant 5,874,012 - Kanai , et al. February 23, 1 | 1999-02-23 |
| Microwave plasma processing method and apparatus Grant 5,804,033 - Kanai , et al. September 8, 1 | 1998-09-08 |
| Semiconductor device manufacturing apparatus and method with optical monitoring of state of processing chamber Grant 5,536,359 - Kawada , et al. July 16, 1 | 1996-07-16 |
| Microwave plasma processing apparatus Grant 5,520,771 - Kanai , et al. May 28, 1 | 1996-05-28 |
| Microwave plasma generating method and apparatus Grant 5,276,386 - Watanabe , et al. January 4, 1 | 1994-01-04 |
| Microwave plasma processing method and apparatus Grant 4,971,651 - Watanabe , et al. November 20, 1 | 1990-11-20 |
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