Kaminsky; Oded
Patent Applications and Registrations
Patent applications and USPTO patent grants for Kaminsky; Oded.The latest application filed is for "focus metrology and targets which utilize transformations based on aerial images of the targets".
- Kaminsky; Oded - Givat Shemuel IL
| Patent | Date |
|---|---|
| Method of analyzing and utilizing landscapes to reduce or eliminate inaccuracy in overlay optical metrology Grant 10,831,108 - Marciano , et al. November 10, 2 | 2020-11-10 |
| Focus metrology and targets which utilize transformations based on aerial images of the targets Grant 10,197,922 - Gutman , et al. Fe | 2019-02-05 |
| Focus Metrology and Targets Which Utilize Transformations Based on Aerial Images of the Targets App 20170212427 - Gutman; Nadav ; et al. | 2017-07-27 |
| Methods Of Analyzing And Utilizing Landscapes To Reduce Or Eliminate Inaccuracy In Overlay Optical Metrology App 20160313658 - Marciano; Tal ; et al. | 2016-10-27 |
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