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Patent applications and USPTO patent grants for Kaminishi; Masahiko.The latest application filed is for "method of detoxifying exhaust pipe and film forming apparatus".
Patent | Date |
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Nozzle and substrate processing apparatus using same Grant 10,472,719 - Wamura , et al. Nov | 2019-11-12 |
Method of detoxifying exhaust pipe and film forming apparatus Grant 10,053,776 - Wamura , et al. August 21, 2 | 2018-08-21 |
Substrate processing method and substrate processing apparatus Grant 9,929,008 - Wamura , et al. March 27, 2 | 2018-03-27 |
Method Of Detoxifying Exhaust Pipe And Film Forming Apparatus App 20160220953 - Wamura; Yu ;   et al. | 2016-08-04 |
Nozzle And Substrate Processing Apparatus Using Same App 20160138158 - WAMURA; Yu ;   et al. | 2016-05-19 |
Substrate Processing Method And Substrate Processing Apparatus App 20160111278 - WAMURA; Yu ;   et al. | 2016-04-21 |
Film deposition method Grant 9,252,043 - Ikegawa , et al. February 2, 2 | 2016-02-02 |
Method of depositing a film using a turntable apparatus Grant 8,987,147 - Ikegawa , et al. March 24, 2 | 2015-03-24 |
Film deposition method Grant 8,980,371 - Ikegawa , et al. March 17, 2 | 2015-03-17 |
Film deposition method Grant 8,962,495 - Ikegawa , et al. February 24, 2 | 2015-02-24 |
Apparatus and method of forming thin film including adsorption step and reaction step Grant 8,778,812 - Furuya , et al. July 15, 2 | 2014-07-15 |
Method Of Depositing A Film App 20140179121 - IKEGAWA; Hiroaki ;   et al. | 2014-06-26 |
Film Deposition Method, Storage Medium, And Film Deposition Apparatus App 20140147591 - IKEGAWA; Hiroaki ;   et al. | 2014-05-29 |
Film Deposition Method App 20140011353 - IKEGAWA; Hiroaki ;   et al. | 2014-01-09 |
Film Deposition Method App 20130337658 - Ikegawa; Hiroaki ;   et al. | 2013-12-19 |
Film Deposition Method App 20130164945 - FURUYA; Haruhiko ;   et al. | 2013-06-27 |
Thermal processing apparatus, method for regulating temperature of thermal processing apparatus, and program Grant 8,354,135 - Takenaga , et al. January 15, 2 | 2013-01-15 |
Film formation method and apparatus for semiconductor process Grant 7,637,268 - Kato , et al. December 29, 2 | 2009-12-29 |
Thermal Processing Apparatus, Method For Regulating Temperature Of Thermal Processing Apparatus, And Program App 20090232967 - TAKENAGA; Yuichi ;   et al. | 2009-09-17 |
Film formation method and apparatus for semiconductor process App 20060288935 - Kato; Hitoshi ;   et al. | 2006-12-28 |
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