KAMIMURA; Sou

Patent Applications and Registrations

Patent applications and USPTO patent grants for KAMIMURA; Sou.The latest application filed is for "composition for forming underlayer film, resist pattern forming method, and manufacturing method of electronic device".

Company Profile

1.38.39

KAMIMURA; Sou - Shizuoka JP
Kamimura; Sou - Shizuoka-ken JP
Kamimura; Sou - Haibara-gun JP
Kamimura; Sou - Shizouka JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Composition For Forming Underlayer Film, Resist Pattern Forming Method, And Manufacturing Method Of Electronic Device App 20220252985 - FUKUHARA; Toshiaki ; et al.	2022-08-11
Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition and resist film Grant 10,248,019 - Kataoka , et al.	2019-04-02
Pattern forming method and resist composition Grant 10,126,653 - Iwato , et al. November 13, 2	2018-11-13
Method of forming pattern and developer for use in the method Grant 9,897,922 - Enomoto , et al. February 20, 2	2018-02-20
Pattern forming method and actinic-ray- or radiation-sensitive resin composition Grant 9,760,003 - Iwato , et al. September 12, 2	2017-09-12
Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the same Grant 9,709,892 - Kataoka , et al. July 18, 2	2017-07-18
Method Of Forming Pattern App 20170102618 - KATO; Keita ; et al.	2017-04-13
Pattern forming method and resist composition Grant 9,551,935 - Kato , et al. January 24, 2	2017-01-24
Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method for manufacturing electronic device, and electronic device Grant 9,513,547 - Kamimura , et al. December 6, 2	2016-12-06
Method Of Forming Pattern And Developer For Use In The Method App 20160349620 - ENOMOTO; Yuichiro ; et al.	2016-12-01
Method of forming pattern and developer for use in the method Grant 9,482,958 - Enomoto , et al. November 1, 2	2016-11-01
Active Lightray-sensitive Or Radiation-sensitive Resin Composition And Pattern Forming Method App 20160223905 - OU; Keiyu ; et al.	2016-08-04
Pattern Forming Method, Actinic Ray-sensitive Or Radiation-sensitive Resin Composition For Organic Solvent Development Used Therefor And Method Of Manufacturing The Same, Method Of Manufacturing Electronic Device, And Electronic Device App 20160004156 - SUGIYAMA; Shinichi ; et al.	2016-01-07
Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition and resist film Grant 9,223,219 - Enomoto , et al. December 29, 2	2015-12-29
Method Of Forming Pattern And Developer For Use In The Method App 20150293454 - ENOMOTO; Yuichiro ; et al.	2015-10-15
Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method for manufacturing electronic device, and electronic device Grant 9,128,376 - Kato , et al. September 8, 2	2015-09-08
Pattern forming method, chemical amplification resist composition and resist film Grant 9,116,437 - Enomoto , et al. August 25, 2	2015-08-25
Method of forming pattern and developer for use in the method Grant 9,097,973 - Enomoto , et al. August 4, 2	2015-08-04
Pattern Forming Method, Actinic Ray-sensitive Or Radiation-sensitive Resin Composition, Resist Film, Method For Manufacturing Electronic Device, And Electronic Device App 20150147699 - KAMIMURA; Sou ; et al.	2015-05-28
Pattern forming method, chemical amplification resist composition and resist film Grant 8,999,621 - Enomoto , et al. April 7, 2	2015-04-07
Method of forming pattern and developer for use in the method Grant 8,871,642 - Enomoto , et al. October 28, 2	2014-10-28
Negative pattern forming method and resist pattern Grant 8,859,192 - Kato , et al. October 14, 2	2014-10-14
Pattern Forming Method, Actinic Ray-sensitive Or Radiation-sensitive Resin Composition, Resist Film, Method For Manufacturing Electronic Device, And Electronic Device App 20140248556 - KATO; Keita ; et al.	2014-09-04
Pattern forming method, pattern, chemical amplification resist composition and resist film Grant 8,808,965 - Iwato , et al. August 19, 2	2014-08-19
Pattern forming method, chemical amplification resist composition and resist film Grant 8,753,802 - Kato , et al. June 17, 2	2014-06-17
Method Of Forming Pattern App 20140127629 - KATO; Keita ; et al.	2014-05-08
Pattern forming method using developer containing organic solvent and rinsing solution for use in the pattern forming method Grant 8,709,704 - Kamimura , et al. April 29, 2	2014-04-29
Method of forming pattern Grant 8,663,907 - Kato , et al. March 4, 2	2014-03-04
Negative Pattern Forming Method And Resist Pattern App 20130266777 - KATO; Keita ; et al.	2013-10-10
Positive resist composition, pattern forming method using the composition, and compound for use in the composition Grant 8,507,174 - Takahashi , et al. August 13, 2	2013-08-13
Pattern Forming Method, Actinic Ray-sensitive Or Radiation-sensitive Resin Composition And Resist Film App 20130122427 - KATAOKA; Shohei ; et al.	2013-05-16
Method Of Forming Pattern And Developer For Use In The Method App 20130113082 - Enomoto; Yuichiro ; et al.	2013-05-09
Method Of Forming Pattern App 20130101812 - Kamimura; Sou ; et al.	2013-04-25
Pattern Forming Method, Chemical Amplification Resist Composition And Resist Film App 20130045365 - KATO; Keita ; et al.	2013-02-21
Pattern Forming Method And Actinic-ray- Or Radiation-senstive Resin Composition App 20130040096 - Iwato; Kaoru ; et al.	2013-02-14
Actinic-ray- Or Radiation-sensitive Resin Composition And Method Of Forming Pattern Using The Same App 20130017377 - Kataoka; Shohei ; et al.	2013-01-17
Pattern Forming Method And Resist Composition App 20130011785 - Kato; Keita ; et al.	2013-01-10
Pattern Forming Method, Chemical Amplification Resist Composition And Resist Film App 20120322007 - Kato; Keita ; et al.	2012-12-20
Pattern Forming Method And Resist Composition App 20120321855 - Iwato; Kaoru ; et al.	2012-12-20
Pattern Forming Method, Pattern, Chemical Amplification Resist Composition And Resist Film App 20120288691 - Iwato; Kaoru ; et al.	2012-11-15
Pattern Forming Method, Actinic Ray-sensitive Or Radiation-sensitive Resin Composition And Resist Film App 20120282548 - Enomoto; Yuichiro ; et al.	2012-11-08
Pattern Forming Method, Chemical Amplification Resist Composition And Resist Film App 20120148957 - Enomoto; Yuichiro ; et al.	2012-06-14
Pattern Forming Method, Chemical Amplification Resist Composition And Resist Film App 20120058427 - Enomoto; Yuichiro ; et al.	2012-03-08
Method Of Forming Pattern App 20120052449 - KATO; Keita ; et al.	2012-03-01
Resist composition containing novel sulfonium compound, pattern-forming method using the resist composition, and novel sulfonium compound Grant 8,110,333 - Kamimura , et al. February 7, 2	2012-02-07
Method Of Forming Pattern And Organic Processing Liquid For Use In The Method App 20120028196 - KAMIMURA; Sou ; et al.	2012-02-02
Resist composition and pattern forming method using the same Grant 8,092,976 - Kamimura , et al. January 10, 2	2012-01-10
Method Of Forming Pattern And Developer For Use In The Method App 20120003591 - ENOMOTO; Yuichiro ; et al.	2012-01-05
Resist Composition For Negative-tone Development And Pattern Forming Method Using The Same App 20110311914 - Kamimura; Sou ; et al.	2011-12-22
Pattern Forming Method Using Developer Containing Organic Solvent And Rinsing Solution For Use In The Pattern Forming Method App 20110229832 - Kamimura; Sou ; et al.	2011-09-22
Positive Resist Composition, Pattern Forming Method Using The Composition, And Compound For Use In The Composition App 20110183258 - Takahashi; Hidenori ; et al.	2011-07-28
Resist composition and pattern forming method using the same Grant 7,718,344 - Kamimura , et al. May 18, 2	2010-05-18
Resist composition and pattern-forming method using same Grant 7,695,892 - Kamimura , et al. April 13, 2	2010-04-13
Surface Treating Agent For Resist Pattern Formation, Resist Composition, Method Of Treating Surface Of Resist Pattern Therewith And Method Of Forming Resist Pattern App 20100028803 - SUGIMOTO; Naoya ; et al.	2010-02-04
Positive resist composition and pattern formation method using the same Grant 7,615,330 - Kamimura , et al. November 10, 2	2009-11-10
Resist Composition Containing Novel Sulfonium Compound, Pattern-forming Method Using The Resist Composition, And Novel Sulfonium Compound App 20090042124 - KAMIMURA; Sou ; et al.	2009-02-12
Resist Composition And Pattern-forming Method Using Same App 20080241737 - Kamimura; Sou ; et al.	2008-10-02
Resist Composition And Pattern Forming Method Using The Same App 20080085468 - KAMIMURA; Sou ; et al.	2008-04-10
Resist Composition And Pattern Forming Method Using The Same App 20080081282 - Kamimura; Sou ; et al.	2008-04-03
Positive resist composition and pattern formation method using the same App 20070224540 - Kamimura; Sou ; et al.	2007-09-27

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