Kambara; Hiromitsu
Patent Applications and Registrations
Patent applications and USPTO patent grants for Kambara; Hiromitsu.The latest application filed is for "pattern enhancement using a gas cluster ion beam".
- Kambara; Hiromitsu - Miyagi JP
- Kambara; Hiromitsu - Austin TX
| Patent | Date |
|---|---|
| Pattern enhancement using a gas cluster ion beam Grant 11,450,506 - Dobashi , et al. September 20, 2 | 2022-09-20 |
| Pattern Enhancement Using a Gas Cluster Ion Beam App 20220277924 - Dobashi; Kazuya ; et al. | 2022-09-01 |
| Pattern Enhancement Using a Gas Cluster Ion Beam App 20210335568 - Dobashi; Kazuya ; et al. | 2021-10-28 |
| Method and system for etching a high-k dielectric material Grant 7,709,397 - Chen , et al. May 4, 2 | 2010-05-04 |
| Plasma processing system for treating a substrate Grant 7,396,431 - Chen , et al. July 8, 2 | 2008-07-08 |
| Plasma processing system for treating a substrate App 20060065367 - Chen; Lee ; et al. | 2006-03-30 |
| Processing system and method for treating a substrate App 20050227494 - Higuchi, Fumihiko ; et al. | 2005-10-13 |
| Method and system for etching a high-k dielectric material App 20050164511 - Chen, Lee ; et al. | 2005-07-28 |
| Method and system for etching a high-k dielectric material App 20050118353 - Chen, Lee ; et al. | 2005-06-02 |
| Method of trimming a gate electrode structure Grant 6,852,584 - Chen , et al. February 8, 2 | 2005-02-08 |
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