Kamarthy; Gowri

Patent Applications and Registrations

Patent applications and USPTO patent grants for Kamarthy; Gowri.The latest application filed is for "controlling ion energy within a plasma chamber".

Company Profile

2.16.23

Kamarthy; Gowri - Pleasanton CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Controlling ion energy within a plasma chamber Grant 10,424,461 - Lill , et al. Sept	2019-09-24
Controlling Ion Energy Within A Plasma Chamber App 20190103253 - Lill; Thorsten ; et al.	2019-04-04
Internal plasma grid for semiconductor fabrication Grant 10,224,221 - Singh , et al.	2019-03-05
Controlling ion energy within a plasma chamber Grant 10,141,163 - Lill , et al. Nov	2018-11-27
Internal plasma grid applications for semiconductor fabrication Grant 9,633,846 - Paterson , et al. April 25, 2	2017-04-25
Method of planarizing an upper surface of a semiconductor substrate in a plasma etch chamber Grant 9,589,853 - Titus , et al. March 7, 2	2017-03-07
Controlling Ion Energy Within A Plasma Chamber App 20160379804 - Lill; Thorsten ; et al.	2016-12-29
Controlling ion energy within a plasma chamber Grant 9,460,894 - Lill , et al. October 4, 2	2016-10-04
Internal Plasma Grid For Semiconductor Fabrication App 20160203990 - Singh; Harmeet ; et al.	2016-07-14
Residue free systems and methods for isotropically etching silicon in tight spaces Grant 9,385,003 - Kuo , et al. July 5, 2	2016-07-05
Internal Plasma Grid For Semiconductor Fabrication App 20160181130 - Singh; Harmeet ; et al.	2016-06-23
Internal Plasma Grid Applications For Semiconductor Fabrication App 20160086795 - Paterson; Alex ; et al.	2016-03-24
Semiconductor Structures With Coplanar Recessed Gate Layers And Fabrication Methods App 20160049495 - TREVINO; Kristina ; et al.	2016-02-18
Semiconductor structures with coplanar recessed gate layers and fabrication methods Grant 9,252,238 - Trevino , et al. February 2, 2	2016-02-02
Internal plasma grid for semiconductor fabrication Grant 9,245,761 - Singh , et al. January 26, 2	2016-01-26
Internal plasma grid applications for semiconductor fabrication in context of ion-ion plasma processing Grant 9,230,819 - Paterson , et al. January 5, 2	2016-01-05
Method Of Planarizing An Upper Surface Of A Semiconductor Substrate In A Plasma Etch Chamber App 20150249016 - Titus; Monica ; et al.	2015-09-03
Controlling CD and CD uniformity with trim time and temperature on a wafer by wafer basis Grant 9,012,243 - Kimura , et al. April 21, 2	2015-04-21
Method for providing vias Grant 8,999,184 - Kuo , et al. April 7, 2	2015-04-07
Controlling Cd And Cd Uniformity With Trim Time And Temperature On A Wafer By Wafer Basis App 20150053347 - Kimura; Yoshie ; et al.	2015-02-26
Controlling Ion Energy Within A Plasma Chamber App 20150002018 - Lill; Thorsten ; et al.	2015-01-01
Internal Plasma Grid Applications For Semiconductor Fabrication App 20140302678 - Paterson; Alex ; et al.	2014-10-09
Internal Plasma Grid For Semiconductor Fabrication App 20140302680 - Singh; Harmeet ; et al.	2014-10-09
Controlling CD and CD uniformity with trim time and temperature on a wafer by wafer basis Grant 8,852,964 - Kimura , et al. October 7, 2	2014-10-07
Controlling Cd And Cd Uniformity With Trim Time And Temperature On A Wafer By Wafer Basis App 20140220709 - Kimura; Yoshie ; et al.	2014-08-07
In-situ Metal Residue Clean App 20140179106 - ZHONG; Qinghua ; et al.	2014-06-26
Profile and CD uniformity control by plasma oxidation treatment Grant 8,671,878 - Zhong , et al. March 18, 2	2014-03-18
Etch With Mixed Mode Pulsing App 20140051256 - ZHONG; Qinghua ; et al.	2014-02-20
Method For Providing Vias App 20140038419 - KUO; Ming-Shu ; et al.	2014-02-06
Method For Shrink And Tune Trench/via Cd App 20140030893 - KUO; Ming-Shu ; et al.	2014-01-30
Method And Apparatus For Forming Features With Plasma Pre-etch Treatment On Photoresist App 20130267097 - SRIVASTAVA; Ratndeep ; et al.	2013-10-10
Profile And Cd Uniformity Control By Plasma Oxidation Treatment App 20130025785 - Zhong; Qinghua ; et al.	2013-01-31
Profile and CD uniformity control by plasma oxidation treatment Grant 8,298,949 - Zhong , et al. October 30, 2	2012-10-30
Profile And Cd Uniformity Control By Plasma Oxidation Treatment App 20100173496 - Zhong; Qinghua ; et al.	2010-07-08

uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.

While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.

All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.