| Patent | Date |
|---|
Semiconductor apparatus having stacked gates and method of manufacture thereof
Grant 11,444,082 - Smith , et al. September 13, 2 | 2022-09-13 |
Forming a semiconductor feature using atomic layer etch
Grant 11,424,123 - Liu , et al. August 23, 2 | 2022-08-23 |
Gas phase etching system and method
Grant 11,380,554 - Kal , et al. July 5, 2 | 2022-07-05 |
Non-plasma etch of titanium-containing material layers with tunable selectivity to alternate metals and dielectrics
Grant 11,322,350 - Ito , et al. May 3, 2 | 2022-05-03 |
Reverse contact and silicide process for three-dimensional semiconductor devices
Grant 11,322,401 - Smith , et al. May 3, 2 | 2022-05-03 |
Reverse contact and silicide process for three-dimensional logic devices
Grant 11,264,274 - Smith , et al. March 1, 2 | 2022-03-01 |
Methods For Euv Inverse Patterning In Processing Of Microelectronic Workpieces
App 20210296125 - Liu; Eric Chih-Fang ; et al. | 2021-09-23 |
Forming A Semiconductor Feature Using Atomic Layer Etch
App 20210265164 - Liu; Eric Chih-Fang ; et al. | 2021-08-26 |
GAS PHASE ETCH WITH CONTROLLABLE ETCH SELECTIVITY OF Si-CONTAINING ARC OR SILICON OXYNITRIDE TO DIFFERENT FILMS OR MASKS
App 20210217628 - KAL; Subhadeep ; et al. | 2021-07-15 |
3d Complementary Metal Oxide Semiconductor (cmos) Device And Method Of Forming The Same
App 20210202481 - FULFORD; H. Jim ; et al. | 2021-07-01 |
Method for controlling transistor delay of nanowire or nanosheet transistor devices
Grant 10,991,626 - Smith , et al. April 27, 2 | 2021-04-27 |
Gas phase etch with controllable etch selectivity of Si-containing arc or silicon oxynitride to different films or masks
Grant 10,971,372 - Kal , et al. April 6, 2 | 2021-04-06 |
Reverse Contact And Silicide Process For Three-dimensional Semiconductor Devices
App 20210098294 - SMITH; Jeffrey ; et al. | 2021-04-01 |
Reverse Contact And Silicide Process For Three-dimensional Logic Devices
App 20210098306 - Smith; Jeffrey ; et al. | 2021-04-01 |
Non-plasma Etch Of Titanium-containing Material Layers With Tunable Selectivity To Alternate Metals And Dielectrics
App 20210057213 - Ito; Daisuke ; et al. | 2021-02-25 |
Gas phase etch with controllable etch selectivity of silicon-germanium alloys
Grant 10,923,356 - Kal , et al. February 16, 2 | 2021-02-16 |
Semiconductor Apparatus Having Stacked Gates And Method Of Manufacture Thereof
App 20210028169 - Smith; Jeffrey ; et al. | 2021-01-28 |
Gas Phase Etch With Controllable Etch Selectivity Of Metals
App 20210020454 - Kal; Subhadeep ; et al. | 2021-01-21 |
Semiconductor apparatus having stacked gates and method of manufacture thereof
Grant 10,833,078 - Smith , et al. November 10, 2 | 2020-11-10 |
Method For Controlling Transistor Delay Of Nanowire Or Nanosheet Transistor Devices
App 20200303256 - SMITH; Jeffrey ; et al. | 2020-09-24 |
Method for controlling transistor delay of nanowire or nanosheet transistor devices
Grant 10,714,391 - Smith , et al. | 2020-07-14 |
Method for incorporating multiple channel materials in a complimentary field effective transistor (CFET) device
Grant 10,685,887 - Smith , et al. | 2020-06-16 |
Gas Phase Etching System And Method
App 20200176266 - KAL; Subhadeep ; et al. | 2020-06-04 |
Gas phase etching system and method
Grant 10,580,660 - Kal , et al. | 2020-03-03 |
Method for fabricating NFET and PFET nanowire devices
Grant 10,573,564 - Mosden , et al. Feb | 2020-02-25 |
Gas Phase Etch With Controllable Etch Selectivity Of Silicon-germanium Alloys
App 20200027741 - Kal; Subhadeep ; et al. | 2020-01-23 |
Selective deposition with surface treatment
Grant 10,378,105 - Yu , et al. A | 2019-08-13 |
Method For Controlling Transistor Delay Of Nanowire Or Nanosheet Transistor Devices
App 20190172751 - SMITH; Jeffrey ; et al. | 2019-06-06 |
Method For Incorporating Multiple Channel Materials In A Complimentary Field Effective Transistor (cfet) Device
App 20190172755 - SMITH; Jeffrey ; et al. | 2019-06-06 |
Semiconductor Apparatus Having Stacked Gates And Method Of Manufacture Thereof
App 20190172828 - SMITH; Jeffrey ; et al. | 2019-06-06 |
Method For Fabricating Nfet And Pfet Nanowire Devices
App 20180315665 - Mosden; Aelan ; et al. | 2018-11-01 |
Three-dimensional semiconductor device and method of fabrication
Grant 9,997,598 - Smith , et al. June 12, 2 | 2018-06-12 |
Isotropic silicon and silicon-germanium etching with tunable selectivity
Grant 9,984,890 - Kal , et al. May 29, 2 | 2018-05-29 |
Three-dimensional Semiconductor Device And Method Of Fabrication
App 20180040695 - Smith; Jeffrey ; et al. | 2018-02-08 |
Selective Deposition With Surface Treatment
App 20170342553 - Yu; Kai-Hung ; et al. | 2017-11-30 |
Isotropic Silicon And Silicon-germanium Etching With Tunable Selectivity
App 20170271165 - Kal; Subhadeep ; et al. | 2017-09-21 |
Method and system for selective spacer etch for multi-patterning schemes
Grant 9,748,110 - Kal , et al. August 29, 2 | 2017-08-29 |
Gas Phase Etch Of Amorphous And Poly-crystalline Silicon From High Aspect Ratio Features With High Selectivity Towards Various Films
App 20170207103 - Kal; Subhadeep ; et al. | 2017-07-20 |
Method And System For Selective Spacer Etch For Multi-patterning Schemes
App 20170069510 - Kal; Subhadeep ; et al. | 2017-03-09 |
Gas Phase Etching System And Method
App 20160379835 - Kal; Subhadeep ; et al. | 2016-12-29 |
GAS PHASE ETCH WITH CONTROLLABLE ETCH SELECTIVITY OF Si-CONTAINING ARC OR SILICON OXYNITRIDE TO DIFFERENT FILMS OR MASKS
App 20160379842 - Kal; Subhadeep ; et al. | 2016-12-29 |
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