Kakuchi; Osamu

Patent Applications and Registrations

Patent applications and USPTO patent grants for Kakuchi; Osamu.The latest application filed is for "measurement method, measurement apparatus, exposure apparatus, and device fabrication method".

Company Profile

0.12.11

Kakuchi; Osamu - Kasama JP
Kakuchi; Osamu - Mito JP
Kakuchi; Osamu - Kasama-shi JP
Kakuchi; Osamu - Mito-shi JP
Kakuchi; Osamu - Utsunomiya JP
Kakuchi; Osamu - Ibaraki JP
Kakuchi; Osamu - Utsunomiya-shi JP
Kakuchi; Osamu - Kawasaki JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Measurement method, measurement apparatus, exposure apparatus, and device fabrication method Grant 7,995,213 - Kakuchi , et al. August 9, 2	2011-08-09
Apparatuses and methods using measurement of a flare generated in an optical system Grant 7,907,263 - Aizawa , et al. March 15, 2	2011-03-15
Measurement Method, Measurement Apparatus, Exposure Apparatus, And Device Fabrication Method App 20100265515 - Kakuchi; Osamu ; et al.	2010-10-21
Method of measuring wavefront retardance aberration based on wavefront and birefringent characteristics Grant 7,773,233 - Kakuchi , et al. August 10, 2	2010-08-10
Apparatuses And Methods Using Measurement Of A Flare Generated In An Optical System App 20100002243 - Aizawa; Michiko ; et al.	2010-01-07
Evaluation Method, Evaluation Apparatus, And Exposure Apparatus App 20090219494 - Kakuchi; Osamu	2009-09-03
Measurement Method, Measurement Apparatus, Exposure Apparatus, And Device Fabrication Method App 20080273200 - Kakuchi; Osamu ; et al.	2008-11-06
Measuring apparatus, exposure apparatus and device manufacturing method Grant 7,276,717 - Kakuchi , et al. October 2, 2	2007-10-02
Exposure apparatus with interferometer Grant 7,236,254 - Kakuchi , et al. June 26, 2	2007-06-26
Aberration measuring method for projection optical system with a variable numerical aperture in an exposure apparatus App 20060227334 - Kakuchi; Osamu	2006-10-12
Aberration measuring method for projection optical system with a variable numerical aperture in an exposure apparatus Grant 7,095,509 - Kakuchi August 22, 2	2006-08-22
Exposure apparatus with interferometer App 20060114476 - Kakuchi; Osamu ; et al.	2006-06-01
Measuring apparatus, exposure apparatus and device manufacturing method App 20060097205 - Kakuchi; Osamu ; et al.	2006-05-11
Exposure apparatus with interferometer Grant 7,023,561 - Kakuchi , et al. April 4, 2	2006-04-04
Projection exposure apparatus Grant 6,924,881 - Murakami , et al. August 2, 2	2005-08-02
Exposure apparatus with interferometer App 20050099635 - Kakuchi, Osamu ; et al.	2005-05-12
Aberration measuring method App 20040223163 - Kakuchi, Osamu	2004-11-11
Projection exposure apparatus App 20040036883 - Murakami, Eiichi ; et al.	2004-02-26
Projection exposure apparatus Grant 6,633,362 - Murakami , et al. October 14, 2	2003-10-14
Exposure apparatus with interferometer Grant 6,614,535 - Kakuchi , et al. September 2, 2	2003-09-02
Projection Exposure Apparatus App 20030128346 - Murakami, Eiichi ; et al.	2003-07-10
Depth/height measuring device Grant 5,087,121 - Kakuchi , et al. February 11, 1	1992-02-11
Fabri-perot spectroscopy method and apparatus utilizing the same Grant 4,850,709 - Ban , et al. July 25, 1	1989-07-25

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