Patent | Date |
---|
Reactive sputtering with HIPIMS Grant 11,380,530 - Weichart , et al. July 5, 2 | 2022-07-05 |
Arc suppression and pulsing in high power impulse magnetron sputtering (HIPIMS) Grant 11,211,234 - Kadlec , et al. December 28, 2 | 2021-12-28 |
Reactive Sputtering With Hipims App 20200388474 - Weichart; Juergen ;   et al. | 2020-12-10 |
Reactive sputtering with HIPIMs Grant 10,784,092 - Weichart , et al. Sept | 2020-09-22 |
RF substrate bias with high power impulse magnetron sputtering (HIPIMS) Grant 10,692,707 - Weichart , et al. | 2020-06-23 |
Target shaping Grant 9,611,537 - Kadlec , et al. April 4, 2 | 2017-04-04 |
Method for producing a directional layer by cathode sputtering, and device for implementing the method Grant 9,587,306 - Rohrmann , et al. March 7, 2 | 2017-03-07 |
Arc Suppression And Pulsing In High Power Impulse Magnetron Sputtering (hipims) App 20160237554 - Kadlec; Stanislav ;   et al. | 2016-08-18 |
Arc suppression and pulsing in high power impulse magnetron sputtering (HIPIMS) Grant 9,355,824 - Kadlec , et al. May 31, 2 | 2016-05-31 |
Method of magnetron sputtering and a method for determining a power modulation compensation function for a power supply applied to a magnetron sputtering source Grant 8,574,409 - Kadlec , et al. November 5, 2 | 2013-11-05 |
Rf Substrate Bias With High Power Impulse Magnetron Sputtering (hipims) App 20130220802 - Weichart; Jurgen ;   et al. | 2013-08-29 |
Application of HIPIMS to through silicon via metallization in three-dimensional wafer packaging Grant 8,475,634 - Weichart , et al. July 2, 2 | 2013-07-02 |
RF substrate bias with high power impulse magnetron sputtering (HIPIMS) Grant 8,435,389 - Kadlec , et al. May 7, 2 | 2013-05-07 |
Method Of Magnetron Sputtering And A Method For Determining A Power Modulation Compensation Function For A Power Supply Applied To A Magnetron Sputtering Source App 20120279851 - Kadlec; Stanislav ;   et al. | 2012-11-08 |
Method of magnetron sputtering and a method for determining a power modulation compensation function for a power supply applied to a magnetron sputtering source Grant 8,246,794 - Kadlec , et al. August 21, 2 | 2012-08-21 |
Target Shaping App 20110203920 - Kadlec; Stanislav ;   et al. | 2011-08-25 |
Method for manufacturing sputter-coated substrates, magnetron source and sputtering chamber with such source Grant 7,718,042 - Kadlec , et al. May 18, 2 | 2010-05-18 |
Method Of Magnetron Sputtering And A Method For Determining A Power Modulation Compensation Function For A Power Supply Applied To A Magnetron Sputtering Source App 20090173621 - Kadlec; Stanislav ;   et al. | 2009-07-09 |
Reactive Sputtering With Hipims App 20090173622 - Weichart; Juergen ;   et al. | 2009-07-09 |
Method for producing a directional layer by cathode sputtering, and device for implementing the method App 20090134011 - Rohrmann; Hartmut ;   et al. | 2009-05-28 |
Application Of Hipims To Through Silicon Via Metallization In Three-dimensional Wafer Packaging App 20090111216 - Weichart; Jurgen ;   et al. | 2009-04-30 |
Method for the production of a substrate Grant 7,429,543 - Kadlec , et al. September 30, 2 | 2008-09-30 |
Arc Suppression And Pulsing In High Power Impulse Magnetron Sputtering (hipims) App 20080135400 - Kadlec; Stanislav ;   et al. | 2008-06-12 |
Rf Substrate Bias With High Power Impulse Magnetron Sputtering (hipims) App 20080135401 - Kadlec; Stanislav ;   et al. | 2008-06-12 |
Method Of Manufacturing At Least One Sputter-coated Substrate And Sputter Source App 20070175748 - Atamny; Fachri ;   et al. | 2007-08-02 |
Method For The Production Of A Substrate App 20070084715 - Kadlec; Stanislav ;   et al. | 2007-04-19 |
Method of producing a substrate with a surface treated by a vacuum treatment process, use of said method for the production of coated workpieces and plasma treatment chamber Grant 7,138,343 - Kadlec , et al. November 21, 2 | 2006-11-21 |
Method for the production of a substrate and unit for the same App 20060054493 - Kadlec; Stanislav ;   et al. | 2006-03-16 |
Method for manufacturing sputter-coated substrates, magnetron source and sputtering chamber with such source App 20050199485 - Kadlec, Stanislav ;   et al. | 2005-09-15 |
Method for manufacturing a workpiece using a magnetron sputter source Grant 6,860,977 - Heinz , et al. March 1, 2 | 2005-03-01 |
Method for manufacturing a workpiece using a magnetron sputter source App 20040149565 - Heinz, Bernd ;   et al. | 2004-08-05 |
Magnetron sputter source Grant 6,682,637 - Heinz , et al. January 27, 2 | 2004-01-27 |
Magnetron sputter source App 20030136671 - Heinz, Bernd ;   et al. | 2003-07-24 |
Method and device for sputtering of films Grant 5,234,560 - Kadlec , et al. August 10, 1 | 1993-08-10 |