loadpatents
name:-0.013820171356201
name:-0.016339063644409
name:-0.003331184387207
Kadlec; Stanislav Patent Filings

Kadlec; Stanislav

Patent Applications and Registrations

Patent applications and USPTO patent grants for Kadlec; Stanislav.The latest application filed is for "reactive sputtering with hipims".

Company Profile
3.24.17
  • Kadlec; Stanislav - Prague CZ
  • Kadlec; Stanislav - Praha CZ
  • Kadlec; Stanislav - Praha 5 CZ
  • Kadlec; Stanislav - Buchs CH
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Reactive sputtering with HIPIMS
Grant 11,380,530 - Weichart , et al. July 5, 2
2022-07-05
Arc suppression and pulsing in high power impulse magnetron sputtering (HIPIMS)
Grant 11,211,234 - Kadlec , et al. December 28, 2
2021-12-28
Reactive Sputtering With Hipims
App 20200388474 - Weichart; Juergen ;   et al.
2020-12-10
Reactive sputtering with HIPIMs
Grant 10,784,092 - Weichart , et al. Sept
2020-09-22
RF substrate bias with high power impulse magnetron sputtering (HIPIMS)
Grant 10,692,707 - Weichart , et al.
2020-06-23
Target shaping
Grant 9,611,537 - Kadlec , et al. April 4, 2
2017-04-04
Method for producing a directional layer by cathode sputtering, and device for implementing the method
Grant 9,587,306 - Rohrmann , et al. March 7, 2
2017-03-07
Arc Suppression And Pulsing In High Power Impulse Magnetron Sputtering (hipims)
App 20160237554 - Kadlec; Stanislav ;   et al.
2016-08-18
Arc suppression and pulsing in high power impulse magnetron sputtering (HIPIMS)
Grant 9,355,824 - Kadlec , et al. May 31, 2
2016-05-31
Method of magnetron sputtering and a method for determining a power modulation compensation function for a power supply applied to a magnetron sputtering source
Grant 8,574,409 - Kadlec , et al. November 5, 2
2013-11-05
Rf Substrate Bias With High Power Impulse Magnetron Sputtering (hipims)
App 20130220802 - Weichart; Jurgen ;   et al.
2013-08-29
Application of HIPIMS to through silicon via metallization in three-dimensional wafer packaging
Grant 8,475,634 - Weichart , et al. July 2, 2
2013-07-02
RF substrate bias with high power impulse magnetron sputtering (HIPIMS)
Grant 8,435,389 - Kadlec , et al. May 7, 2
2013-05-07
Method Of Magnetron Sputtering And A Method For Determining A Power Modulation Compensation Function For A Power Supply Applied To A Magnetron Sputtering Source
App 20120279851 - Kadlec; Stanislav ;   et al.
2012-11-08
Method of magnetron sputtering and a method for determining a power modulation compensation function for a power supply applied to a magnetron sputtering source
Grant 8,246,794 - Kadlec , et al. August 21, 2
2012-08-21
Target Shaping
App 20110203920 - Kadlec; Stanislav ;   et al.
2011-08-25
Method for manufacturing sputter-coated substrates, magnetron source and sputtering chamber with such source
Grant 7,718,042 - Kadlec , et al. May 18, 2
2010-05-18
Method Of Magnetron Sputtering And A Method For Determining A Power Modulation Compensation Function For A Power Supply Applied To A Magnetron Sputtering Source
App 20090173621 - Kadlec; Stanislav ;   et al.
2009-07-09
Reactive Sputtering With Hipims
App 20090173622 - Weichart; Juergen ;   et al.
2009-07-09
Method for producing a directional layer by cathode sputtering, and device for implementing the method
App 20090134011 - Rohrmann; Hartmut ;   et al.
2009-05-28
Application Of Hipims To Through Silicon Via Metallization In Three-dimensional Wafer Packaging
App 20090111216 - Weichart; Jurgen ;   et al.
2009-04-30
Method for the production of a substrate
Grant 7,429,543 - Kadlec , et al. September 30, 2
2008-09-30
Arc Suppression And Pulsing In High Power Impulse Magnetron Sputtering (hipims)
App 20080135400 - Kadlec; Stanislav ;   et al.
2008-06-12
Rf Substrate Bias With High Power Impulse Magnetron Sputtering (hipims)
App 20080135401 - Kadlec; Stanislav ;   et al.
2008-06-12
Method Of Manufacturing At Least One Sputter-coated Substrate And Sputter Source
App 20070175748 - Atamny; Fachri ;   et al.
2007-08-02
Method For The Production Of A Substrate
App 20070084715 - Kadlec; Stanislav ;   et al.
2007-04-19
Method of producing a substrate with a surface treated by a vacuum treatment process, use of said method for the production of coated workpieces and plasma treatment chamber
Grant 7,138,343 - Kadlec , et al. November 21, 2
2006-11-21
Method for the production of a substrate and unit for the same
App 20060054493 - Kadlec; Stanislav ;   et al.
2006-03-16
Method for manufacturing sputter-coated substrates, magnetron source and sputtering chamber with such source
App 20050199485 - Kadlec, Stanislav ;   et al.
2005-09-15
Method for manufacturing a workpiece using a magnetron sputter source
Grant 6,860,977 - Heinz , et al. March 1, 2
2005-03-01
Method for manufacturing a workpiece using a magnetron sputter source
App 20040149565 - Heinz, Bernd ;   et al.
2004-08-05
Magnetron sputter source
Grant 6,682,637 - Heinz , et al. January 27, 2
2004-01-27
Magnetron sputter source
App 20030136671 - Heinz, Bernd ;   et al.
2003-07-24
Method and device for sputtering of films
Grant 5,234,560 - Kadlec , et al. August 10, 1
1993-08-10

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