loadpatents
name:-0.049991846084595
name:-0.028743982315063
name:-0.0079531669616699
Kabe; Yoshiro Patent Filings

Kabe; Yoshiro

Patent Applications and Registrations

Patent applications and USPTO patent grants for Kabe; Yoshiro.The latest application filed is for "methods of manufacturing acoustic wave device with anti-reflection layer".

Company Profile
6.22.39
  • Kabe; Yoshiro - Kobe JP
  • Kabe; Yoshiro - Kobe-Shi JP
  • Kabe; Yoshiro - Yamanashi JP
  • KABE; Yoshiro - Nirasaki City JP
  • Kabe; Yoshiro - Amagasaki JP
  • Kabe; Yoshiro - Hyogo-ken JP
  • KABE; Yoshiro - Amagasaki-shi JP
  • Kabe; Yoshiro - Hyogo JP
  • Kabe; Yoshiro - Amagasaki-City JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Acoustic wave device with anti-reflection layer
Grant 11,394,364 - Matsuda , et al. July 19, 2
2022-07-19
Methods Of Manufacturing Acoustic Wave Device With Anti-reflection Layer
App 20220224308 - Matsuda; Satoru ;   et al.
2022-07-14
Spinning forming method
Grant 10,882,094 - Kabe , et al. January 5, 2
2021-01-05
Acoustic Wave Device With Anti-reflection Layer
App 20200266796 - Matsuda; Satoru ;   et al.
2020-08-20
Method of manufacturing preliminary formed body and axisymmetrical component
Grant 10,632,522 - Imamura , et al.
2020-04-28
Methods of manufacturing axisymmetric body and axisymmetric product
Grant 10,413,999 - Tsuji , et al. Sept
2019-09-17
Spinning forming device
Grant 10,259,030 - Mikami , et al.
2019-04-16
Spinning forming device
Grant 10,259,029 - Sakane , et al.
2019-04-16
Acoustic Wave Device Including Interdigital Electrodes Covered By Silicon Oxynitride Film
App 20180269848 - Matsuda; Satoru ;   et al.
2018-09-20
Surface Acoustic Wave Elements With Protective Films
App 20180041186 - Yamaji; Toru ;   et al.
2018-02-08
Spinning Forming Method
App 20170304885 - MIKAMI; Kohei ;   et al.
2017-10-26
Spinning Forming Device
App 20170144208 - MIKAMI; Kohei ;   et al.
2017-05-25
Methods Of Manufacturing Axisymmetric Body And Axisymmetric Product
App 20170120385 - TSUJI; Toshiro ;   et al.
2017-05-04
Method Of Manufacturing Preliminary Formed Body And Axisymmetrical Component
App 20170043389 - IMAMURA; Yoshihide ;   et al.
2017-02-16
Spinning Forming Device
App 20170036257 - SAKANE; Yuto ;   et al.
2017-02-09
Spinning Forming Method
App 20170021405 - KABE; Yoshiro ;   et al.
2017-01-26
Microwave Heating Apparatus And Processing Method
App 20150090708 - Tanaka; Sumi ;   et al.
2015-04-02
Microwave Heat Treatment Method
App 20140283734 - MONDEN; Taichi ;   et al.
2014-09-25
Microwave Processing Method And Microwave Processing Apparatus
App 20140042153 - Shimomura; Kouji ;   et al.
2014-02-13
Method For Cleaning Microwave Processing Apparatus
App 20140041682 - MONDEN; Taichi ;   et al.
2014-02-13
Method For Processing Object
App 20140038430 - Kabe; Yoshiro ;   et al.
2014-02-06
Method and apparatus for forming silicon oxide film
Grant 8,389,420 - Kabe , et al. March 5, 2
2013-03-05
Plasma oxidation processing method, plasma processing apparatus and storage medium
Grant 8,372,761 - Kabe , et al. February 12, 2
2013-02-12
Silicon Oxide Film Forming Method And Plasma Oxidation Apparatus
App 20130012033 - Kabe; Yoshiro ;   et al.
2013-01-10
Method and apparatus for forming silicon oxide film
Grant 8,318,267 - Kabe , et al. November 27, 2
2012-11-27
Plasma Processing Method
App 20120252226 - KABE; Yoshiro ;   et al.
2012-10-04
Method For Forming Germanium Oxide Film And Material For Electronic Device
App 20120248583 - KABE; Yoshiro ;   et al.
2012-10-04
Plasma Nitriding Method, Plasma Nitriding Apparatus And Method Of Manufacturing Semiconductor Device
App 20120252209 - Kabe; Yoshiro ;   et al.
2012-10-04
Method For Selective Oxidation, Device For Selective Oxidation, And Computer-readable Memory Medium
App 20120094505 - Nakamura; Hideo ;   et al.
2012-04-19
Pattern forming method and semiconductor device manufacturing method
Grant 8,119,530 - Hori , et al. February 21, 2
2012-02-21
Semiconductor device manufacturing method and plasma oxidation treatment method
Grant 8,105,958 - Kabe , et al. January 31, 2
2012-01-31
Plasma oxidizing method, storage medium, and plasma processing apparatus
Grant 8,043,979 - Kobayashi , et al. October 25, 2
2011-10-25
Method for insulating film formation, storage medium from which information is readable with computer, and processing system
Grant 8,034,179 - Kabe , et al. October 11, 2
2011-10-11
Method of forming silicon oxide film and method of production of semiconductor memory device using this method
Grant 8,026,187 - Kabe , et al. September 27, 2
2011-09-27
Method for forming silicon oxide film, plasma processing apparatus and storage medium
Grant 8,003,484 - Kabe , et al. August 23, 2
2011-08-23
Plasma oxidation processing method
Grant 7,989,364 - Hori , et al. August 2, 2
2011-08-02
Plasma Processing Apparatus, Plasma Processing Method And End Point Detection Method
App 20110174776 - Kabe; Yoshiro ;   et al.
2011-07-21
Method for manufacturing semiconductor device and plasma oxidation method
Grant 7,981,785 - Sasaki , et al. July 19, 2
2011-07-19
Method And Apparatus For Forming Silicon Oxide Film
App 20110171835 - KABE; Yoshiro ;   et al.
2011-07-14
Plasma oxidizing method, plasma processing apparatus, and storage medium
Grant 7,910,495 - Shiozawa , et al. March 22, 2
2011-03-22
Method For Insulating Film Formation, Storage Medium From Which Information Is Readable With Computer, And Treatment System
App 20110039418 - Kabe; Yoshiro ;   et al.
2011-02-17
Method for cleaning treatment chamber in substrate treating apparatus and method for detecting endpoint of cleaning
Grant 7,887,637 - Ozaki , et al. February 15, 2
2011-02-15
Plasma Processing Apparatus
App 20110024048 - Nakamura; Hideo ;   et al.
2011-02-03
Method for forming silicon oxide film, storage medium, and plasma processing apparatus
App 20110017586 - Nakamura; Hideo ;   et al.
2011-01-27
Plasma Processing Apparatus And Plasma Processing Method
App 20100291319 - Yamashita; Jun ;   et al.
2010-11-18
Method And Apparatus For Forming Silicon Oxide Film
App 20100247805 - Kabe; Yoshiro ;   et al.
2010-09-30
Method Of Forming Silicon Oxide Film And Method Of Production Of Semiconductor Memory Device Using This Method
App 20100184267 - Kabe; Yoshiro ;   et al.
2010-07-22
Plasma Oxidation Processing Method, Plasma Processing Apparatus And Storage Medium
App 20100136797 - Kabe; Yoshiro ;   et al.
2010-06-03
Plasma Oxidizing Method, Storage Medium, And Plasma Processing Apparatus
App 20100105216 - Kobayashi; Takashi ;   et al.
2010-04-29
Method For Forming Silicon Oxide Film, Plasma Processing Apparatus And Storage Medium
App 20100093185 - Kabe; Yoshiro ;   et al.
2010-04-15
Pattern Forming Method And Semiconductor Device Manufacturing Method
App 20100093179 - Hori; Masaru ;   et al.
2010-04-15
Plasma Oxidizing Method, Plasma Processing Apparatus, And Storage Medium
App 20100029093 - Shiozawa; Toshihiko ;   et al.
2010-02-04
Plasma Oxidizing Method, Plasma Processing Apparatus, And Storage Medium
App 20100015815 - Shiozawa; Toshihiko ;   et al.
2010-01-21
Plasma Oxidation Processing Method
App 20090263919 - Hori; Masaru ;   et al.
2009-10-22
Manufacturing method of semiconductor device, semiconductor manufacturing apparatus, plasma nitridation method, computer recording medium, and program
Grant 7,524,774 - Sasaki , et al. April 28, 2
2009-04-28
Semiconductor Device Manufacturing Method and Plasma Oxidation Treatment Method
App 20080032511 - Kabe; Yoshiro ;   et al.
2008-02-07
Method for Manufacturing Semiconductor Device and Plasma Oxidation Method
App 20070224836 - Sasaki; Masaru ;   et al.
2007-09-27
Method for cleaning treatment chamber iIn substrate treating apparatus and method for detecting endpoint of cleaning
App 20070163617 - Ozaki; Shigenori ;   et al.
2007-07-19
Manufacturing method of semiconductor device, semiconductor manufacturing apparatus, plasma nitridation method, computer recording medium, and program
App 20060166446 - Sasaki; Masaru ;   et al.
2006-07-27

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