Jung; Myoung-ho

Patent Applications and Registrations

Patent applications and USPTO patent grants for Jung; Myoung-ho.The latest application filed is for "wafer transfer robot, method of controlling the same, and method of manufacturing a semiconductor device using the same".

Company Profile

0.4.12

Jung; Myoung-ho - Suwon-si KR
Jung; Myoung-Ho - Yonging-si KR
Jung; Myoung-Ho - Yongin KR
Jung, Myoung-Ho - Yongin-si KR
Jung, Myoung-Ho - Yongin-city KR

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Wafer Transfer Robot, Method Of Controlling The Same, And Method Of Manufacturing A Semiconductor Device Using The Same App 20160133502 - Won; Jung-min ; et al.	2016-05-12
Method of forming pattern Grant 7,842,451 - Koh , et al. November 30, 2	2010-11-30
E-beam lithography system for synchronously irradiating a plurality of photomasks and method of fabricating photomasks using the same Grant 7,723,702 - Yoon , et al. May 25, 2	2010-05-25
Method Of Forming Pattern App 20090291561 - Koh; Cha-Won ; et al.	2009-11-26
Method of forming pattern Grant 7,575,855 - Koh , et al. August 18, 2	2009-08-18
Method of forming an underlayer of a bi-layer resist film and method of fabricating a semiconductor device using the same Grant 7,335,455 - Kim , et al. February 26, 2	2008-02-26
E-beam lithography system for synchronously irradiating a plurality of photomasks and method of fabricating photomasks using the same App 20070181828 - Yoon; Je-bum ; et al.	2007-08-09
Mask having balance pattern and method of patterning photoresist using the same App 20070178391 - Kim; Tae-Young ; et al.	2007-08-02
Method of forming semiconductor patterns App 20060003268 - Hong; Jin ; et al.	2006-01-05
Method of forming pattern App 20050282092 - Koh, Cha-Won ; et al.	2005-12-22
Cleaning solution and method of cleaning semiconductor devices using the same App 20050233922 - Jung, Myoung-Ho ; et al.	2005-10-20
Pattern formation method App 20050214694 - Hong, Jin ; et al.	2005-09-29
Method of forming an underlayer of a bi-layer resist film and method of fabricating a semiconductor device using the same App 20040259024 - Kim, Hyun-Woo ; et al.	2004-12-23
Cleaning solution used in process of fabricating semiconductor device App 20040248752 - Jung, Myoung-Ho ; et al.	2004-12-09
Photosensitive polymer and chemically amplified resist composition comprising the same App 20030215758 - Kim, Hyun-Woo ; et al.	2003-11-20

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