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Patent applications and USPTO patent grants for Jung; MinHwa.The latest application filed is for "gas injection apparatus and substrate treating apparatus including the same".
Patent | Date |
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Gas supply unit and substrate processing system Grant 10,844,491 - Chung , et al. November 24, 2 | 2020-11-24 |
Gas Injection Apparatus And Substrate Treating Apparatus Including The Same App 20180135177 - LEE; JongCheol ;   et al. | 2018-05-17 |
Semiconductor device manufacturing apparatus having plurality of gas exhausting pipes and gas sensors Grant 9,951,422 - Shin , et al. April 24, 2 | 2018-04-24 |
Semiconductor Device Manufacturing Apparatus Having Plurality Of Gas Exhausting Pipes And Gas Sensors App 20170218515 - Shin; Jaechul ;   et al. | 2017-08-03 |
Gas Supply Unit And Substrate Processing System App 20170121820 - Chung; Sukjin ;   et al. | 2017-05-04 |
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