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Patent applications and USPTO patent grants for Johnston; Steven H..The latest application filed is for "chemical oxide removal of plasma damaged sicoh low k dielectrics".
Patent | Date |
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Chemical oxide removal of plasma damaged SiCOH low k dielectrics Grant 8,106,485 - America , et al. January 31, 2 | 2012-01-31 |
Chemical Oxide Removal Of Plasma Damaged Sicoh Low K Dielectrics App 20080224273 - AMERICA; William G. ;   et al. | 2008-09-18 |
Chemical oxide removal of plasma damaged SiCOH low k dielectrics Grant 7,368,393 - America , et al. May 6, 2 | 2008-05-06 |
Chemical Oxide Removal Of Plasma Damaged Sicoh Low K Dielectrics App 20070246442 - America; William G. ;   et al. | 2007-10-25 |
Integrated dual damascene RIE process with organic patterning layer Grant 7,129,159 - America , et al. October 31, 2 | 2006-10-31 |
Integrated dual damascene RIE process with organic patterning layer App 20060040501 - America; William G. ;   et al. | 2006-02-23 |
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