loadpatents
name:-0.028511047363281
name:-0.014001131057739
name:-0.00059700012207031
Johns; Timothy P. Patent Filings

Johns; Timothy P.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Johns; Timothy P..The latest application filed is for "vertical bowl mill for producing coarse ground particles".

Company Profile
0.12.12
  • Johns; Timothy P. - Naperville IL
  • Johns; Timothy P. - Aurora IL US
  • Johns; Timothy P - Aurora IL
  • Johns; Timothy P. - Montgomery IL
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Vertical bowl mill for producing coarse ground particles
Grant 10,016,762 - Chen , et al. July 10, 2
2018-07-10
Vertical Bowl Mill For Producing Coarse Ground Particles
App 20160367997 - Chen; Michael M. ;   et al.
2016-12-22
Polishing composition containing polyether amine
Grant 8,741,009 - Dysard , et al. June 3, 2
2014-06-03
Method of polishing a silicon-containing dielectric
Grant 8,486,169 - Carter , et al. July 16, 2
2013-07-16
Polishing composition and method for high silicon nitride to silicon oxide removal rate ratios
Grant 8,138,091 - Dysard , et al. March 20, 2
2012-03-20
Compositions and methods for dielectric CMP
Grant 7,677,956 - Carter , et al. March 16, 2
2010-03-16
Polishing composition containing polyether amine
App 20090289033 - Dysard; Jeffrey M. ;   et al.
2009-11-26
Polishing composition containing polyether amine
Grant 7,585,340 - Dysard , et al. September 8, 2
2009-09-08
Polishing composition and method for high silicon nitride to silicon oxide removal rate ratios
App 20090215271 - Dysard; Jeffrey M. ;   et al.
2009-08-27
Polishing Composition And Method For High Silicon Nitride To Silicon Oxide Removal Rate Ratios
App 20090137124 - Carter; Phillip W. ;   et al.
2009-05-28
Polishing composition and method for high silicon nitride to silicon oxide removal rate ratios
Grant 7,531,105 - Dysard , et al. May 12, 2
2009-05-12
Polishing composition and method for high silicon nitride to silicon oxide removal rate ratios
Grant 7,504,044 - Carter , et al. March 17, 2
2009-03-17
Method Of Polishing A Silicon-containing Dielectric
App 20090029633 - Carter; Phillip W. ;   et al.
2009-01-29
Method of polishing a silicon-containing dielectric
Grant 7,442,645 - Carter , et al. October 28, 2
2008-10-28
Polishing composition containing polyether amine
App 20070251155 - Dysard; Jeffrey M. ;   et al.
2007-11-01
Readily deinkable toners
App 20060196848 - Carter; Phillip W. ;   et al.
2006-09-07
Method of polishing a silicon-containing dielectric
App 20060144824 - Carter; Phillip W. ;   et al.
2006-07-06
Method of polishing a silicon-containing dielectric
Grant 7,071,105 - Carter , et al. July 4, 2
2006-07-04
Polishing composition and method for high silicon nitride to silicon oxide removal rate ratios
App 20060108326 - Dysard; Jeffrey M. ;   et al.
2006-05-25
Polishing composition and method for high silicon nitride to silicon oxide removal rate ratios
App 20060099814 - Carter; Phillip W. ;   et al.
2006-05-11
Method of polishing a silicon-containing dielectric
App 20040152309 - Carter, Phillip W. ;   et al.
2004-08-05
Compositions and methods for dielectric CMP
App 20030211815 - Carter, Phillip ;   et al.
2003-11-13

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