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Plasma doping method with gate shutter
Grant 8,652,953 - Okumura , et al. February 18, 2 | 2014-02-18 |
Plasma Doping Method And Apparatus
App 20130323916 - OKUMURA; Tomohiro ; et al. | 2013-12-05 |
Plasma Doping Method With Gate Shutter
App 20120285818 - OKUMURA; Tomohiro ; et al. | 2012-11-15 |
Plasma doping device with gate shutter
Grant 8,257,501 - Okumura , et al. September 4, 2 | 2012-09-04 |
Plasma Doping Method And Apparatus
App 20120186519 - Okumura; Tomohiro ; et al. | 2012-07-26 |
Method for introducing impurities and apparatus for introducing impurities
Grant 8,222,128 - Sasaki , et al. July 17, 2 | 2012-07-17 |
Impurity introducing apparatus having feedback mechanism using optical characteristics of impurity introducing region
Grant 8,138,582 - Jin , et al. March 20, 2 | 2012-03-20 |
Plasma doping method and apparatus
Grant 8,129,202 - Okumura , et al. March 6, 2 | 2012-03-06 |
Method For Making Junction And Processed Material Formed Using The Same
App 20110237056 - SASAKI; Yuichiro ; et al. | 2011-09-29 |
Method for making junction and processed material formed using the same
Grant 7,981,779 - Sasaki , et al. July 19, 2 | 2011-07-19 |
Process for fabricating semiconductor device
Grant 7,932,185 - Kudo , et al. April 26, 2 | 2011-04-26 |
Method and apparatus of fabricating semiconductor device
Grant 7,858,479 - Mizuno , et al. December 28, 2 | 2010-12-28 |
Plasma processing method and plasma processing apparatus
Grant 7,858,155 - Okumura , et al. December 28, 2 | 2010-12-28 |
Method for forming impurity-introduced layer, method for cleaning object to be processed apparatus for introducing impurity and method for producing device
Grant 7,759,254 - Sasaki , et al. July 20, 2 | 2010-07-20 |
Method For Introducing Impurities And Apparatus For Introducing Impurities
App 20100167508 - Sasaki; Yuichiro ; et al. | 2010-07-01 |
Method for introducing impurities and apparatus for introducing impurities
Grant 7,741,199 - Sasaki , et al. June 22, 2 | 2010-06-22 |
Impurity Introducing Method Using Optical Characteristics To Determine Annealing Conditions
App 20100148323 - Jin; Cheng-Guo ; et al. | 2010-06-17 |
Method for introducing impurities and apparatus for introducing impurities
Grant 7,709,362 - Sasaki , et al. May 4, 2 | 2010-05-04 |
Plasma Doping Method And Apparatus
App 20100098837 - OKUMURA; Tomohiro ; et al. | 2010-04-22 |
Impurity introducing method using optical characteristics to determine annealing conditions
Grant 7,700,382 - Jin , et al. April 20, 2 | 2010-04-20 |
Method for introduction impurities and apparatus for introducing impurities
Grant 7,696,072 - Sasaki , et al. April 13, 2 | 2010-04-13 |
Plasma Doping Method And Apparatus
App 20100009469 - Kai; Takayuki ; et al. | 2010-01-14 |
Impurity introducing apparatus and impurity introducing method
Grant 7,626,184 - Mizuno , et al. December 1, 2 | 2009-12-01 |
Impurity introducing apparatus and impurity introducing method
Grant 7,622,725 - Mizuno , et al. November 24, 2 | 2009-11-24 |
Method for introducing impurities and apparatus for introducing impurities
Grant 7,618,883 - Sasaki , et al. November 17, 2 | 2009-11-17 |
Method and apparatus for plasma processing
Grant 7,601,619 - Okumura , et al. October 13, 2 | 2009-10-13 |
Plasma Doping Method and Apparatus
App 20090233383 - Okumura; Tomohiro ; et al. | 2009-09-17 |
Method of doping impurities, and electronic element using the same
Grant 7,582,492 - Jin , et al. September 1, 2 | 2009-09-01 |
Plasma Doping Method and Apparatus
App 20090181526 - Okumura; Tomohiro ; et al. | 2009-07-16 |
Plasma Doping Method and Plasma Processing Device
App 20090176355 - Okumura; Tomohiro ; et al. | 2009-07-09 |
Impurity Introducing Apparatus and Impurity Introducing Method
App 20090140174 - Mizuno; Bunji ; et al. | 2009-06-04 |
Asher, Ashing Method and Impurity Doping Apparatus
App 20090104783 - Jin; Cheng-Guo ; et al. | 2009-04-23 |
Method and Apparatus for Plasma Processing
App 20090068769 - Okumura; Tomohiro ; et al. | 2009-03-12 |
Method for fabricating semiconductor device
App 20090023262 - Jin; Cheng-Guo ; et al. | 2009-01-22 |
Method for introducing impurities
Grant 7,456,085 - Sasaki , et al. November 25, 2 | 2008-11-25 |
Plasma Processing Method and Plasma Processing Apparatus
App 20080258082 - Okumura; Tomohiro ; et al. | 2008-10-23 |
Impurity Introducing Apparatus And Impurity Introducing Method
App 20080210167 - Mizino; Bunji ; et al. | 2008-09-04 |
Method of Introducing Impurity
App 20080194086 - Sasaki; Yuichiro ; et al. | 2008-08-14 |
Impurity Introducing Method, Impurity Introducing Apparatus, and Electronic Device Produced by Using Those
App 20080182348 - Jin; Cheng-Guo ; et al. | 2008-07-31 |
Impurity Introducing Apparatus And Impurity Introducing Method
App 20080166861 - Mizuno; Bunji ; et al. | 2008-07-10 |
Method For Introducing Impurities And Apparatus For Introducing Impurities
App 20080160728 - SASAKI; Yuichiro ; et al. | 2008-07-03 |
Method for Introducing Impurities
App 20080146009 - Sasaki; Yuichiro ; et al. | 2008-06-19 |
Method for making junction and processed material formed using the same
App 20080135980 - Sasaki; Yuichiro ; et al. | 2008-06-12 |
Method for introduction impurities and apparatus for introducing impurities
App 20080124900 - Sasaki; Yuichiro ; et al. | 2008-05-29 |
Method of Doping Impurities, and Electronic Element Using the Same
App 20080061292 - Jin; Cheng-Guo ; et al. | 2008-03-13 |
Method for introducing impurities and apparatus for introducing impurities
App 20070254460 - Sasaki; Yuichiro ; et al. | 2007-11-01 |
Method And Apparatus Of Fabricating Semiconductor Device
App 20070212837 - Mizuno; Bunji ; et al. | 2007-09-13 |
Method for making junction and processed material formed using the same
App 20070042578 - Sasaki; Yuichiro ; et al. | 2007-02-22 |
Process for fabricating semiconductor device
App 20060183350 - Kudo; Toshio ; et al. | 2006-08-17 |
Method for introducing impurities and apparatus for introducing impurities
App 20050277273 - Sasaki, Yuichiro ; et al. | 2005-12-15 |
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