Ji; Linan

Patent Applications and Registrations

Patent applications and USPTO patent grants for Ji; Linan.The latest application filed is for "supercritical drying method for semiconductor substrate".

Company Profile

0.13.17

Ji; Linan - Shanghai CH
Ji; Linan - Shanghai-shi CN
Ji; Linan - Yokohama N/A JP
Ji; Linan - Yokohama-Shi JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Supercritical drying method for semiconductor substrate and supercritical drying apparatus Grant 9,583,330 - Ji , et al. February 28, 2	2017-02-28
Supercritical drying method for semiconductor substrate Grant 9,570,286 - Sato , et al. February 14, 2	2017-02-14
Supercritical Drying Method For Semiconductor Substrate App 20150135549 - Sato; Yohei ; et al.	2015-05-21
Method and device for cleaning semiconductor substrate Grant 8,961,696 - Tomita , et al. February 24, 2	2015-02-24
Supercritical drying method for semiconductor substrate Grant 8,950,082 - Sato , et al. February 10, 2	2015-02-10
Supercritical Drying Method For Semiconductor Substrate And Supercritical Drying Apparatus App 20140250714 - JI; Linan ; et al.	2014-09-11
Supercritical drying method for semiconductor substrate and supercritical drying apparatus Grant 8,771,429 - Ji , et al. July 8, 2	2014-07-08
Cleaning apparatus for semiconductor wafer Grant 8,567,420 - Inukai , et al. October 29, 2	2013-10-29
Method And Device For Cleaning Semiconductor Substrate App 20130068257 - TOMITA; Hiroshi ; et al.	2013-03-21
Supercritical Drying Method And Supercritical Drying Apparatus For Semiconductor Substrate App 20130061492 - OKUCHI; Hisashi ; et al.	2013-03-14
SUPERCRlTICAL DRYING METHOD FOR SEMICONDUCTOR SUBSTRATE App 20130055584 - Sato; Yohei ; et al.	2013-03-07
Supercritical Drying Method For Semiconductor Substrate And Supercritical Drying Apparatus App 20130019905 - JI; Linan ; et al.	2013-01-24
Method of treating a semiconductor substrate Grant 7,985,683 - Tomita , et al. July 26, 2	2011-07-26
Method of treating surface of semiconductor substrate Grant 7,838,425 - Tomita , et al. November 23, 2	2010-11-23
Method of treating a semiconductor substrate App 20100240219 - Tomita; Hiroshi ; et al.	2010-09-23
Method of treating a semiconductor substrate Grant 7,749,909 - Tomita , et al. July 6, 2	2010-07-06
Method Of Treating A Semiconductor Substrate App 20100075504 - Tomita; Hiroshi ; et al.	2010-03-25
Substrate Treatment Apparatus And Substrate Treatment Method App 20100044343 - Tomita; Hiroshi ; et al.	2010-02-25
Method Of Treating Surface Of Semiconductor Substrate App 20090311874 - Tomita; Hiroshi ; et al.	2009-12-17
Cleaning Apparatus For Semiconductor Wafer And Cleaning Method For Semiconductor Wafer App 20090255558 - Inukai; Minako ; et al.	2009-10-15
Substrate Processing Apparatus And Substrate Processing Method App 20090250431 - INUKAI; Minako ; et al.	2009-10-08

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