Ji; Ho Chan

Patent Applications and Registrations

Patent applications and USPTO patent grants for Ji; Ho Chan.The latest application filed is for "polymer and photosensitive resin composition comprising the same".

Company Profile

1.13.10

Ji; Ho Chan - Daejeon KR
Ji; Ho-Chan - Daejeon Metropolitan City KR

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Photosensitive resin composition and photosensitive material comprising the same Grant 9,733,563 - Ji , et al. August 15, 2	2017-08-15
Polymer and photosensitive resin composition comprising the same Grant 8,829,068 - Kim , et al. September 9, 2	2014-09-09
Photosensitive resin composition for black matrix Grant 8,822,127 - Choi , et al. September 2, 2	2014-09-02
Colored dispersion, photoresist composition and black matrix Grant 8,822,132 - Choi , et al. September 2, 2	2014-09-02
Method for manufacturing color filter and color filter manufactured by using the same Grant 8,597,861 - Kim , et al. December 3, 2	2013-12-03
Fluorene-based polymer containing urethane groups, preparation method thereof and negative-type photosensitive resin composition comprising the same Grant 8,535,874 - Kim , et al. September 17, 2	2013-09-17
Polymer And Photosensitive Resin Composition Comprising The Same App 20130030077 - Kim; Sunhwa ; et al.	2013-01-31
Photosensitive Resin Composition And Photosensitive Material Comprising The Same App 20120189961 - JI; Ho Chan ; et al.	2012-07-26
Multifunction urethane monomer, method of manufacturing the monomer and photosensitive resin composition including the monomer Grant 8,153,751 - Heo , et al. April 10, 2	2012-04-10
Black Matrix Composition With High Light-shielding And Improved Adhesion Properties App 20110151379 - Choi; Dong Chang ; et al.	2011-06-23
Photosensitive Resin Composition For Black Matrix App 20110101268 - Choi; Dong Chang ; et al.	2011-05-05
Multifunction Urethane Monomer, Method Of Manufacturing The Monomer And Photosensitive Resin Composition Including The Monomer App 20100331439 - Heo; Yoon Hee ; et al.	2010-12-30
Fluorene-based Polymer Containing Urethane Groups, Preparation Method Thereof And Negative-type Photosensitive Resin Composition Comprising The Same App 20100201925 - Kim; Han Soo ; et al.	2010-08-12
Colored Dispersion, Photoresist Composition And Black Matrix App 20100104981 - Choi; Dong Chang ; et al.	2010-04-29
Photo-sensitive Resin Composition For Black Matrix, Black Matrix Produced By The Composition And Liquid Crystal Display Including The Black Matrix App 20100085518 - Choi; Kyung-Soo ; et al.	2010-04-08
Patterning method using coatings containing ionic components App 20070048448 - Kim; Dae Hyun ; et al.	2007-03-01

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