loadpatents
name:-0.012934923171997
name:-0.011612176895142
name:-0.0018758773803711
Ji; Chunhai Patent Filings

Ji; Chunhai

Patent Applications and Registrations

Patent applications and USPTO patent grants for Ji; Chunhai.The latest application filed is for "chamber-accumulation extension via in-situ passivation".

Company Profile
1.7.8
  • Ji; Chunhai - Portland OR
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Chamber-accumulation Extension Via In-situ Passivation
App 20220267900 - Fang; ZhiYuan ;   et al.
2022-08-25
Carrier ring wall for reduction of back-diffusion of reactive species and suppression of local parasitic plasma ignition
Grant 10,475,627 - Qi , et al. Nov
2019-11-12
Image reversal with AHM gap fill for multiple patterning
Grant 10,192,759 - Shamma , et al. Ja
2019-01-29
Systems and methods for using electrical asymmetry effect to control plasma process space in semiconductor fabrication
Grant 9,941,113 - Keil , et al. April 10, 2
2018-04-10
Systems and Methods for Using Electrical Asymmetry Effect to Control Plasma Process Space in Semiconductor Fabrication
App 20170330744 - Keil; Douglas ;   et al.
2017-11-16
Carrier Ring Wall For Reduction Of Back-diffusion Of Reactive Species And Suppression Of Local Parasitic Plasma Ignition
App 20170278681 - Qi; Chengzhu ;   et al.
2017-09-28
Systems and methods for using electrical asymmetry effect to control plasma process space in semiconductor fabrication
Grant 9,644,271 - Keil , et al. May 9, 2
2017-05-09
High selectivity and low stress carbon hardmask by pulsed low frequency RF power
Grant 9,589,799 - Reddy , et al. March 7, 2
2017-03-07
Image Reversal With Ahm Gap Fill For Multiple Patterning
App 20160254171 - Shamma; Nader ;   et al.
2016-09-01
Method for forming a mask by etching conformal film on patterned ashable hardmask
Grant 9,362,133 - Shamma , et al. June 7, 2
2016-06-07
Carbon deposition-etch-ash gap fill process
Grant 9,023,731 - Ji , et al. May 5, 2
2015-05-05
High Selectivity And Low Stress Carbon Hardmask By Pulsed Low Frequency Rf Power
App 20150093908 - Reddy; Sirish K. ;   et al.
2015-04-02
Image Reversal With Ahm Gap Fill For Multiple Patterning
App 20140170853 - Shamma; Nader ;   et al.
2014-06-19
Carbon Deposition-etch-ash Gap Fill Process
App 20140094035 - Ji; Chunhai ;   et al.
2014-04-03
Increasing Etch Selectivity Of Carbon Films With Lower Absorption Co-efficient And Stress
App 20120258261 - Reddy; Sirish ;   et al.
2012-10-11

uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.

While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.

All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.

© 2024 USPTO.report | Privacy Policy | Resources | RSS Feed of Trademarks | Trademark Filings Twitter Feed