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Patent applications and USPTO patent grants for JHENG; Ren-Hao.The latest application filed is for "chemical mechanical polishing apparatus using a magnetically coupled pad conditioning disk".
Patent | Date |
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Chemical Mechanical Polishing Apparatus Using A Magnetically Coupled Pad Conditioning Disk App 20220234165 - HO; Wen-Pin ;   et al. | 2022-07-28 |
Method and apparatus for monitoring chemical mechanical polishing process Grant 11,279,001 - Huang , et al. March 22, 2 | 2022-03-22 |
Semiconductor Wafer Storage Device App 20210257229 - CHEN; Yu Ju- ;   et al. | 2021-08-19 |
Semiconductor wafer storage device Grant 10,978,326 - Chen , et al. April 13, 2 | 2021-04-13 |
Apparatus and methods for chemical mechanical polishing Grant 10,967,480 - Tseng , et al. April 6, 2 | 2021-04-06 |
Method And Apparatus For Monitoring Chemical Mechanical Polishing Process App 20200269382 - HUANG; Chung-Wei ;   et al. | 2020-08-27 |
Apparatus And Methods For Chemical Mechanical Polishing App 20200156205 - TSENG; YA-HSIN ;   et al. | 2020-05-21 |
Semiconductor Wafer Storage Device App 20200135500 - CHEN; Yu Ju- ;   et al. | 2020-04-30 |
Chemical Mechanical Polishing Apparatus App 20200043746 - TSENG; Yu-Ping ;   et al. | 2020-02-06 |
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