| Patent | Date |
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Cd Dependent Gap Fill And Conformal Films
App 20220223410 - Lee; Jung Chan ; et al. | 2022-07-14 |
Plasma enhanced chemical vapor deposition of films for improved vertical etch performance in 3D NAND memory devices
Grant 11,365,476 - Jha , et al. June 21, 2 | 2022-06-21 |
Surface roughness for flowable CVD film
Grant 11,367,614 - Guo , et al. June 21, 2 | 2022-06-21 |
CD dependent gap fill and conformal films
Grant 11,170,994 - Lee , et al. November 9, 2 | 2021-11-09 |
Cyclic flowable deposition and high-density plasma treatment processes for high quality gap fill solutions
Grant 11,152,248 - Liang , et al. October 19, 2 | 2021-10-19 |
Low Temperature Steam Free Oxide Gapfill
App 20210280451 - Lee; Jung Chan ; et al. | 2021-09-09 |
Method to enable high temperature processing without chamber drifting
Grant 11,060,189 - Tsiang , et al. July 13, 2 | 2021-07-13 |
SiBN film for conformal hermetic dielectric encapsulation without direct RF exposure to underlying structure material
Grant 11,011,371 - Gadre , et al. May 18, 2 | 2021-05-18 |
Surface Roughness for Flowable CVD Film
App 20210028013 - Guo; Jinrui ; et al. | 2021-01-28 |
Cyclic Flowable Deposition And High-density Plasma Treatment Processes For High Quality Gap Fill Solutions
App 20200286773 - LIANG; Jingmei ; et al. | 2020-09-10 |
Cyclic flowable deposition and high-density plasma treatment processes for high quality gap fill solutions
Grant 10,707,116 - Liang , et al. | 2020-07-07 |
Method and system for high temperature clean
Grant 10,612,135 - Baluja , et al. | 2020-04-07 |
Method To Enable High Temperature Processing Without Chamber Drifting
App 20200095677 - TSIANG; Michael Wenyoung ; et al. | 2020-03-26 |
Oxide with higher utilization and lower cost
Grant 10,595,477 - Guo , et al. | 2020-03-24 |
Method of depositing doped amorphous silicon films with enhanced defect control, reduced substrate sensitivity to in-film defects and bubble-free film growth
Grant 10,593,543 - Gadre , et al. | 2020-03-17 |
Enhanced Lift Pin Design To Eliminate Local Thickness Non-uniformity In Teos Oxide Films
App 20200058538 - GHOSH; Kalyanjit ; et al. | 2020-02-20 |
Enhanced lift pin design to eliminate local thickness non-uniformity in teos oxide films
Grant 10,490,436 - Ghosh , et al. Nov | 2019-11-26 |
VNAND tensile thick TEOS oxide
Grant 10,483,282 - Tsiang , et al. Nov | 2019-11-19 |
Sibn Film For Conformal Hermetic Dielectric Encapsulation Without Direct Rf Exposure To Underlying Structure Material
App 20190326110 - GADRE; Milind ; et al. | 2019-10-24 |
Borane mediated dehydrogenation process from silane and alkylsilane species for spacer and hardmask application
Grant 10,410,872 - Cheng , et al. Sept | 2019-09-10 |
Gas flow profile modulated control of overlay in plasma CVD films
Grant 10,373,822 - Kulshreshtha , et al. | 2019-08-06 |
Treatment Methods For Silicon Nitride Thin Films
App 20190233940 - GUO; Jinrui ; et al. | 2019-08-01 |
Vnand Tensile Thick Teos Oxide
App 20190229128 - TSIANG; Michael Wenyoung ; et al. | 2019-07-25 |
Plasma Enhanced Chemical Vapor Deposition Of Films For Improved Vertical Etch Performance In 3d Nand Memory Devices
App 20190185996 - JHA; Praket P. ; et al. | 2019-06-20 |
Dual-channel showerhead for formation of film stacks
Grant 10,276,353 - Alayavalli , et al. | 2019-04-30 |
Plasma enhanced chemical vapor deposition of films for improved vertical etch performance in 3D NAND memory devices
Grant 10,246,772 - Jha , et al. | 2019-04-02 |
Oxide With Higher Utilization And Lower Cost
App 20190074176 - GUO; Lei ; et al. | 2019-03-07 |
VNAND tensile thick TEOS oxide
Grant 10,199,388 - Tsiang , et al. Fe | 2019-02-05 |
Method Of Depositing Doped Amorphous Silicon Films With Enhanced Defect Control, Reduced Substrate Sensitivity To In-film Defects And Bubble-free Film Growth
App 20180350596 - GADRE; Milind ; et al. | 2018-12-06 |
Cyclic Flowable Deposition And High-density Plasma Treatment Processes For High Quality Gap Fill Solutions
App 20180330980 - LIANG; Jingmei ; et al. | 2018-11-15 |
Gas Flow Profile Modulated Control Of Overlay In Plasma Cvd Films
App 20180096843 - Kulshreshtha; Prashant Kumar ; et al. | 2018-04-05 |
Borane Mediated Dehydrogenation Process From Silane And Alkylsilane Species For Spacer And Hardmask Application
App 20180076042 - CHENG; Rui ; et al. | 2018-03-15 |
A Method And System For High Temperature Clean
App 20180023193 - BALUJA; Sanjeev ; et al. | 2018-01-25 |
Gas flow profile modulated control of overlay in plasma CVD films
Grant 9,837,265 - Kulshreshtha , et al. December 5, 2 | 2017-12-05 |
Enhanced Lift Pin Design To Eliminate Local Thickness Non-uniformity In Teos Oxide Films
App 20170125280 - GHOSH; Kalyanjit ; et al. | 2017-05-04 |
Low Temperature Conformal Deposition Of Silicon Nitride On High Aspect Ratio Structures
App 20170084448 - BARMAN; Soumendra Narayan ; et al. | 2017-03-23 |
Vnand Tensile Thick Teos Oxide
App 20170062469 - TSIANG; Michael Wenyoung ; et al. | 2017-03-02 |
Gate stack materials for semiconductor applications for lithographic overlay improvement
Grant 9,490,116 - Tsiang , et al. November 8, 2 | 2016-11-08 |
Dual-channel Showerhead For Formation Of Film Stacks
App 20160322200 - ALAYAVALLI; Kaushik ; et al. | 2016-11-03 |
Gas Flow Profile Modulated Control Of Overlay In Plasma Cvd Films
App 20160307752 - KULSHRESHTHA; Prashant Kumar ; et al. | 2016-10-20 |
Plasma Enhanced Chemical Vapor Deposition Of Films For Improved Vertical Etch Performance In 3d Nand Memory Devices
App 20160293609 - JHA; Praket P. ; et al. | 2016-10-06 |
Gate Stack Materials For Semiconductor Applications For Lithographic Overlay Improvement
App 20160203971 - TSIANG; Michael ; et al. | 2016-07-14 |
Gas flow profile modulated control of overlay in plasma CVD films
Grant 9,390,910 - Kulshreshtha , et al. July 12, 2 | 2016-07-12 |
Gas Flow Profile Modulated Control Of Overlay In Plasma Cvd Films
App 20160099147 - KULSHRESHTHA; Prashant Kumar ; et al. | 2016-04-07 |
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