Jeong; Ukyo

Patent Applications and Registrations

Patent applications and USPTO patent grants for Jeong; Ukyo.The latest application filed is for "in situ surface contamination removal for ion implanting".

Company Profile

0.4.9

Jeong; Ukyo - Eugene OR
Jeong; Ukyo - Andover MA
Jeong; Ukyo - Eugene Oregon KR

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Techniques for temperature controlled ion implantation Grant 7,993,698 - Blake , et al. August 9, 2	2011-08-09
In situ surface contamination removal for ion implanting Grant 7,544,959 - Walther , et al. June 9, 2	2009-06-09
Ion implant beam angle integrity monitoring and adjusting Grant 7,459,703 - Walther , et al. December 2, 2	2008-12-02
In Situ Surface Contamination Removal For Ion Implanting App 20080185537 - Walther; Steve ; et al.	2008-08-07
Plasma implantation of deuterium for passivation of semiconductor-device interfaces Grant 7,378,335 - Walther , et al. May 27, 2	2008-05-27
Techniques for temperature controlled ion implantation App 20080076194 - Blake; Julian ; et al.	2008-03-27
Plasma implantation of deuterium for passivation of semiconductor-device interfaces App 20070123012 - Walther; Steven R. ; et al.	2007-05-31
Methods and apparatus for plasma implantation with improved dopant profile App 20070069157 - Mehta; Sandeep ; et al.	2007-03-29
Ion implant beam angle integrity monitoring and adjusting App 20070045569 - Walther; Steven ; et al.	2007-03-01
Metal work function adjustment by ion implantation App 20070048984 - Walther; Steven ; et al.	2007-03-01
Shallow-junction fabrication in semiconductor devices via plasma implantation and deposition App 20060205192 - Walther; Steven R. ; et al.	2006-09-14
Reduction of source and drain parasitic capacitance in CMOS devices App 20060043531 - Erokhin; Yuri ; et al.	2006-03-02
In situ surface contaminant removal for ion implanting App 20060040499 - Walther; Steve ; et al.	2006-02-23

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