Jeong; Tae-Moon

Patent Applications and Registrations

Patent applications and USPTO patent grants for Jeong; Tae-Moon.The latest application filed is for "photomask, method for manufacturing the same, and method for measuring optical characteristics of wafer exposure system using the photomask during operation".

Company Profile

0.5.5

Jeong; Tae-Moon - Yongin KR
Jeong; Tae-moon - Yongin-city KR
Jeong; Tae-moon - Kyungki-Do KR

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Mask for use in measuring flare, method of manufacturing the mask, method of identifying flare-affected region on wafer, and method of designing new mask to correct for flare Grant 7,393,615 - Ki , et al. July 1, 2	2008-07-01
Photomask, method for manufacturing the same, and method for measuring optical characteristics of wafer exposure system using the photomask during operation Grant 7,341,809 - Jeong , et al. March 11, 2	2008-03-11
Photomask, method for manufacturing the same, and method for measuring optical characteristics of wafer exposure system using the photomask during operation App 20060204864 - Jeong; Tae-moon ; et al.	2006-09-14
Photomask, method for manufacturing the same, and method for measuring optical characteristics of wafer exposure system using the photomask during operation Grant 7,070,891 - Jeong , et al. July 4, 2	2006-07-04
Wave guided alternating phase shift mask and fabrication method thereof Grant 6,919,149 - Kim , et al. July 19, 2	2005-07-19
Mask for use in measuring flare, method of manufacturing the mask, method of identifying flare-affected region on wafer, and method of designing new mask to correct for flare App 20050083518 - Ki, Won-Tai ; et al.	2005-04-21
Mask for use in measuring flare, method of manufacturing the mask, method of identifying flare-affected region on wafer, and method of designing new mask to correct for flare Grant 6,835,507 - Ki , et al. December 28, 2	2004-12-28
Wave guided alternating phase shift mask and fabrication method thereof App 20030198875 - Kim, Seong-Hyuck ; et al.	2003-10-23
Photomask, method for manufacturing the same, and method for measuring optical characteristics of wafer exposure system using the photomask during operation App 20030175600 - Jeong, Tae-moon ; et al.	2003-09-18
Mask for use in measuring flare, method of manufacturing the mask, method of identifying flare-affected region on wafer, and method of designing new mask to correct for flare App 20030068565 - Ki, Won-Tai ; et al.	2003-04-10

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