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Patent applications and USPTO patent grants for Jeong; Hee Jong.The latest application filed is for "radio frequency (rf) power monitoring device and plasma enhanced (pe) system including the same".
Patent | Date |
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Electronic circuit for filtering signal received from plasma chamber Grant 11,233,494 - Kim , et al. January 25, 2 | 2022-01-25 |
Radio frequency (RF) power monitoring device and plasma enhanced (PE) system including the same Grant 10,971,335 - Kim , et al. April 6, 2 | 2021-04-06 |
Radio Frequency (rf) Power Monitoring Device And Plasma Enhanced (pe) System Including The Same App 20200343075 - KIM; Hyungjoon ;   et al. | 2020-10-29 |
Baffle, Showerhead Assembly, Apparatus For Processing A Substrate Including The Same, And Method Of Processing A Substrate Using App 20200199752 - KIM; MIN-JOON ;   et al. | 2020-06-25 |
Electronic Circuit For Filtering Signal Received From Plasma Chamber App 20200204143 - KIM; Hyungjoon ;   et al. | 2020-06-25 |
Apparatus for depositing a thin film Grant 10,208,397 - Ryu , et al. Feb | 2019-02-19 |
Apparatus For Depositing A Thin Film App 20170037537 - RYU; Seung-Min ;   et al. | 2017-02-09 |
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