loadpatents
name:-0.00472092628479
name:-0.013152837753296
name:-0.00060606002807617
Jeng; Shwangming Patent Filings

Jeng; Shwangming

Patent Applications and Registrations

Patent applications and USPTO patent grants for Jeng; Shwangming.The latest application filed is for "solution to black diamond film delamination problem".

Company Profile
0.10.2
  • Jeng; Shwangming - Hsin-chiu TW
  • Jeng; Shwangming - Hsin-Chu TW
  • Jeng; Shwangming - Taiwan TW
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Method of cleaning a copper/porous low-k dual damascene etch
Grant 6,457,477 - Young , et al. October 1, 2
2002-10-01
Method for making low-resistance silicide contacts between closely spaced electrically conducting lines for field effect transistors
Grant 6,451,701 - Wang , et al. September 17, 2
2002-09-17
Solution to black diamond film delamination problem
App 20020094698 - Li, Lain-Jong ;   et al.
2002-07-18
Multiple chamber vacuum processing system configuration for improving the stability of mark shielding process
App 20020084032 - Jeng, Shwangming ;   et al.
2002-07-04
Solution to black diamond film delamination problem
Grant 6,358,839 - Li , et al. March 19, 2
2002-03-19
Method for monitoring alignment mark shielding
Grant 6,277,658 - Jeng , et al. August 21, 2
2001-08-21
Method of protecting a low-K dielectric material
Grant 6,268,294 - Jang , et al. July 31, 2
2001-07-31
Process for low-k dielectric with dummy plugs
Grant 6,258,715 - Yu , et al. July 10, 2
2001-07-10
Thermal annealing method for forming metal silicide layer
Grant 6,251,777 - Jeng , et al. June 26, 2
2001-06-26
Method for forming gap filling silicon oxide intermetal dielectric (IMD) layer formed employing ozone-tEOS
Grant 6,143,673 - Jang , et al. November 7, 2
2000-11-07
Method of removing tungsten near the wafer edge after CMP
Grant 6,121,111 - Jang , et al. September 19, 2
2000-09-19
Formation of thin spacer at corner of shallow trench isolation (STI)
Grant 6,080,638 - Lin , et al. June 27, 2
2000-06-27

uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.

While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.

All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.

© 2024 USPTO.report | Privacy Policy | Resources | RSS Feed of Trademarks | Trademark Filings Twitter Feed