loadpatents
Patent applications and USPTO patent grants for JALLEPALLY; Ravi.The latest application filed is for "multiple-channel showerhead design and methods in manufacturing".
Patent | Date |
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Multiple-channel Showerhead Design And Methods In Manufacturing App 20220010431 - DAITO; Kazuya ;   et al. | 2022-01-13 |
Apparatus and method for providing a uniform flow of gas Grant 10,519,546 - Jallepally , et al. Dec | 2019-12-31 |
Apparatus And Method For Providing A Uniform Flow Of Gas App 20190078205 - Jallepally; Ravi ;   et al. | 2019-03-14 |
Apparatus and method for providing a uniform flow of gas Grant 10,167,553 - Rasheed , et al. J | 2019-01-01 |
Apparatus And Method For Providing A Uniform Flow Of Gas App 20170283947 - Rasheed; Muhammad M. ;   et al. | 2017-10-05 |
Chamber components with increased pyrometry visibility Grant 7,921,803 - Yudovsky , et al. April 12, 2 | 2011-04-12 |
Temperature Uniformity Measurement During Thermal Processing App 20100124249 - ADERHOLD; WOLFGANG ;   et al. | 2010-05-20 |
Chamber Components With Increased Pyrometry Visibility App 20090078198 - YUDOVSKY; JOSEPH ;   et al. | 2009-03-26 |
Lamp array for thermal processing exhibiting improved radial uniformity Grant 7,509,035 - Ranish , et al. March 24, 2 | 2009-03-24 |
Controlled Annealing Method App 20080090309 - RANISH; JOSEPH MICHAEL ;   et al. | 2008-04-17 |
Tailored temperature uniformity Grant 7,127,367 - Ramachandran , et al. October 24, 2 | 2006-10-24 |
Lamp array for thermal processing exhibiting improved radial uniformity App 20060066193 - Ranish; Joseph M. ;   et al. | 2006-03-30 |
Advances in spike anneal processes for ultra shallow junctions Grant 6,897,131 - Ramachandran , et al. May 24, 2 | 2005-05-24 |
Tailored temperature uniformity App 20050102108 - Ramachandran, Balasubramanian ;   et al. | 2005-05-12 |
Apparatus and method for fast-cycle atomic layer deposition Grant 6,773,507 - Jallepally , et al. August 10, 2 | 2004-08-10 |
Advances in spike anneal processes for ultra shallow junctions App 20040126999 - Ramachandran, Balasubramanian ;   et al. | 2004-07-01 |
Process Conditions And Precursors For Atomic Layer Deposition (ald) Of Al2o3 App 20030139005 - Song, Kevin ;   et al. | 2003-07-24 |
Apparatus and method for fast-cycle atomic layer deposition App 20030106490 - Jallepally, Ravi ;   et al. | 2003-06-12 |
Apparatus for exposing a substrate to plasma radicals Grant 6,450,116 - Noble , et al. September 17, 2 | 2002-09-17 |
Apparatus And Method For Exposing A Substrate To Plasma Radicals App 20020073925 - NOBLE, DAVID B. ;   et al. | 2002-06-20 |
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