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name:-0.010765075683594
name:-0.0035059452056885
name:-0.0018789768218994
Jacobson; Gunilla Patent Filings

Jacobson; Gunilla

Patent Applications and Registrations

Patent applications and USPTO patent grants for Jacobson; Gunilla.The latest application filed is for "removal of residues for low-k dielectric materials in wafer processing".

Company Profile
0.3.10
  • Jacobson; Gunilla - Menlo Park CA
  • Jacobson; Gunilla - Gilbert AZ
  • Jacobson; Gunilla - Palo Alto CA
  • Jacobson; Gunilla - Upsala SE
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Treatment of a dielectric layer using supercritical CO.sub.2
Grant 7,387,868 - Jacobson , et al. June 17, 2
2008-06-17
System and method for processing a substrate using supercritical carbon dioxide processing
Grant 7,250,374 - Gale , et al. July 31, 2
2007-07-31
Removal of residues for low-k dielectric materials in wafer processing
App 20070000519 - Jacobson; Gunilla ;   et al.
2007-01-04
Removal Of Particles From Substrate Surfaces Using Supercritical Processing
App 20060255012 - Jacobson; Gunilla ;   et al.
2006-11-16
Neutralization of systemic poisoning in wafer processing
App 20060219268 - Jacobson; Gunilla
2006-10-05
Etching and cleaning BPSG material using supercritical processing
App 20060186088 - Jacobson; Gunilla ;   et al.
2006-08-24
Removal Of Post Etch Residue For A Substrate With Open Metal Surfaces
App 20060180572 - Jacobson; Gunilla ;   et al.
2006-08-17
Method and system for treating a substrate using a supercritical fluid
App 20060102591 - Jacobson; Gunilla ;   et al.
2006-05-18
Method for removing a residue from a substrate using supercritical carbon dioxide processing
App 20060102204 - Jacobson; Gunilla ;   et al.
2006-05-18
System for removing a residue from a substrate using supercritical carbon dioxide processing
App 20060102208 - Jacobson; Gunilla ;   et al.
2006-05-18
System and method for processing a substrate using supercritical carbon dioxide processing
App 20060003592 - Gale; Glenn ;   et al.
2006-01-05
Treatment of a dielectric layer using supercritical CO2
App 20050191865 - Jacobson, Gunilla ;   et al.
2005-09-01
Microfluidic structure and process for its manufacture
Grant 5,376,252 - Ekstrom , et al. December 27, 1
1994-12-27

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